公开(公告)号：NL2004837A

公开(公告)日：2011-01-10

申请号：NL2004837

申请日：2010-06-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI ,  GRAAF DENNIS ,  STAMM UWE

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

公开(公告)号：NL2004816A

公开(公告)日：2011-01-10

申请号：NL2004816

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  STAMM UWE

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004303A

公开(公告)日：2010-09-06

申请号：NL2004303

申请日：2010-02-25

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  INGEN SCHENAU KOEN ,  SCHOOT JAN ,  WAGNER CHRISTIAN ,  VRIES GOSSE

IPC: G03F7/20

公开(公告)号：NL2003470A

公开(公告)日：2010-04-08

申请号：NL2003470

申请日：2009-09-11

Applicant: ASML NETHERLANDS BV

Inventor： COMPEN RENE ,  LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS ,  VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS ,  JEUNINK ANDRE ,  LOOPSTRA ERIK ,  OTTENS JOOST ,  SMITS PETER ,  ABEELEN HENDRIKUS ,  MEULENDIJKS ANTONIUS ,  HOUBEN MARTIJN

IPC: G03F7/20

公开(公告)号：NL2003252A

公开(公告)日：2010-03-16

申请号：NL2003252

申请日：2009-07-21

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREY ,  BANINE VADIM ,  IVANOV VLADIMIR ,  LOOPSTRA ERIK ,  KRIVTSUN VLADIMIR

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.