公开(公告)号：WO2013189827A2

公开(公告)日：2013-12-27

申请号：PCT/EP2013062259

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  LABETSKI DZMITRY ,  MESTROM WILBERT ,  KAMPINGA WIM RONALD ,  NIEUWENKAMP JAN OKKE ,  BRINKERT JACOB ,  CASTELIJNS HENRICUS ,  TEN KATE NICOLAAS ,  SCHIMMEL HENDRIKUS ,  JANSEN HANS ,  PAULUSSEN DENNIS ,  VIRGO BRIAN ,  JILISEN REINIER ,  BADIE RAMIN ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  VAN PUTTEN PETER ,  VAN DER STRAATEN GERRIT

IPC: G03F7/20

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：NL2008980A

公开(公告)日：2013-01-14

申请号：NL2008980

申请日：2012-06-12

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER ,  KATE NICOLAAS ,  ROSET NIEK ,  RIEPEN MICHEL ,  CASTELIJNS HENRICUS ,  ROPS CORNELIUS ,  OVERKAMP JIM

IPC: G03F7/20

公开(公告)号：NL2005717A

公开(公告)日：2011-06-21

申请号：NL2005717

申请日：2010-11-18

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  JANSEN ALBERT ,  KATE NICOLAAS ,  STAVENGA MARCO ,  STEFFENS KOEN ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS ,  CUYPERS KOEN

IPC: G03F7/20

公开(公告)号：NL2004523A

公开(公告)日：2010-11-09

申请号：NL2004523

申请日：2010-04-08

Applicant: ASML NETHERLANDS BV

Inventor： BOKHOVEN LAURENTIUS ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  CASTELIJNS HENRICUS ,  ARTS PETRUS

IPC: G03F7/20

公开(公告)号：NL2003363A

公开(公告)日：2010-03-15

申请号：NL2003363

申请日：2009-08-20

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KATE NICOLAAS ,  GRAAF SANDRA ,  CASTELIJNS HENRICUS

IPC: G03F7/20

公开(公告)号：NL2010965A

公开(公告)日：2013-12-24

申请号：NL2010965

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  JANSEN HANS ,  KATE NICOLAAS ,  PAULUSSEN DENNIS ,  SCHIMMEL HENDRIKUS ,  LABETSKI DZMITRY ,  CASTELIJNS HENRICUS ,  MESTROM WILBERT ,  BADIE RAMIN ,  KAMPINGA WIM ,  NIEUWENKAMP JAN ,  BRINKERT JACOB ,  VIRGO BRAIN ,  JILISEN REINIER ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  PUTTEN PETER ,  STRAATEN GERRIT

IPC: H01L21/02

公开(公告)号：NL2005126A

公开(公告)日：2011-03-22

申请号：NL2005126

申请日：2010-07-22

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS

IPC: G03F7/20

公开(公告)号：NL2005120A

公开(公告)日：2011-03-22

申请号：NL2005120

申请日：2010-07-21

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  KATE NICOLAAS ,  CASTELIJNS HENRICUS ,  BOKHOVEN LAURENTIUS

IPC: G03F7/20

Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.