公开(公告)号：JP2005045265A

公开(公告)日：2005-02-17

申请号：JP2004215042

申请日：2004-07-23

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HENRICUS JANSEN ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection equipment with a sensor excellent in durability which is used in the immersion type lithography equipment capable of high resolution treatment by pouring liquid of comparatively high refraction index to fill spacing between the final component of the projection system and the substrate and by sinking the substrate into the immersion liquid. SOLUTION: The lithography projection equipment comprises a liquid feed system configured so that immersion liquid may be provided in spacing between the final component of the projection system and the foregoing substrate, and the sensor attached to a substrate table so that it may be exposed by radiation while it is immersed into the immersion liquid supplied by the liquid feed system. The sensor includes an external surface contacted by the immersion liquid while it is irradiated. The external surface of the sensor is formed by continuous layers of one metal format, while the sensor is formed by single or several metal formats. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种具有耐久性优异的传感器的光刻投影设备，该传感器用于能够通过倾倒具有较高折射率的液体的高分辨率处理的浸渍式光刻设备中填充最终成分之间的间距 投影系统和衬底以及将衬底沉入浸液中。 光刻投影设备包括液体供给系统，该液体供给系统构造成可以在投影系统的最终部件和前述基板之间设置浸没液体，并且将传感器附接到基板台，使其可以是 当它被浸入由液体供给系统供应的浸液中时被辐射暴露。 传感器包括在被照射时与浸没液接触的外表面。 传感器的外表面由一种金属格式的连续层形成，而传感器由单一或多种金属形式形成。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2012238877A

公开(公告)日：2012-12-06

申请号：JP2012163657

申请日：2012-07-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which reduces or eliminates deposition of contaminants on various components of an exposure apparatus.SOLUTION: A coating including a semiconductor, a photocatalyst, and/or a metal oxide is applied at least partly onto various components of an exposure apparatus, for example a sensor provided on a substrate table of a lithographic apparatus.

Abstract translation: 要解决的问题：提供减少或消除污染物沉积在曝光设备的各种部件上的光刻设备。 解决方案：包括半导体，光催化剂和/或金属氧化物的涂层至少部分地施加到曝光装置的各种部件上，例如设置在光刻设备的基板台上的传感器。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010232697A

公开(公告)日：2010-10-14

申请号：JP2010161717

申请日：2010-07-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithography exposure apparatus for reducing or eliminating adhesion of a pollution substance to various components of the exposure apparatus.
SOLUTION: A coating containing a semiconductor, a photocatalyst, and/or a metal oxide is imparted to at least a part of various components of the lithography exposure apparatus, such as a sensor arranged on a base table of the lithography exposure apparatus.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少或消除污染物质对曝光装置的各种部件的粘附的光刻曝光装置。 解决方案：将包含半导体，光催化剂和/或金属氧化物的涂层赋予光刻曝光设备的各种组分的至少一部分，例如布置在光刻曝光设备的基台上的传感器 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010016389A

公开(公告)日：2010-01-21

申请号：JP2009188713

申请日：2009-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBASTIANUS MARCUS ,  SPEE CAROLUS IDA MARIA ANTONIUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing or eliminating adhesion of contaminant for various components of the exposure apparatus. SOLUTION: The exposure apparatus includes a radiation system configured for supplying radiation beam, a patterning apparatus for patterning the radiation beam according to a required pattern, a substrate table for supporting a substrate, and a projection system for projecting a patterned radiation beam to the target on the substrate. At least a portion of the substrate table is covered with a coating. The coating includes a metal oxide, a photocatalyst, or a semiconductor material, or the combination thereof. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于减少或消除对曝光设备的各种部件的污染物的粘附的光刻设备。 解决方案：曝光装置包括被配置为提供辐射束的辐射系统，用于根据所需图案构图辐射束的图案形成装置，用于支撑衬底的衬底台，以及用于将图案化辐射束 到基底上的靶。 衬底台的至少一部分用涂层覆盖。 涂层包括金属氧化物，光催化剂或半导体材料，或其组合。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006196898A

公开(公告)日：2006-07-27

申请号：JP2006003343

申请日：2006-01-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBA ,  SPEE CAROLUS IDA MARIA ANTONIU

IPC: H01L21/027

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an lithography apparatus capable of reducing or eliminating attachments of contaminated materials to the various kinds of exposure apparatus components.
SOLUTION: The main features of this invention is that the coating, comprising semiconductor, photocatalyst, and/or metal oxide, is provided at least to various kinds of the exposure apparatus components, such as a sensor arranged for the base table of the lithography apparatus.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 解决的问题：提供能够减少或消除污染物质对各种曝光装置部件的附着物的光刻装置。 解决方案：本发明的主要特征在于，包括半导体，光催化剂和/或金属氧化物的涂层至少设置在各种曝光装置部件上，例如布置在基台的传感器 光刻设备。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：NL2010626A

公开(公告)日：2013-06-24

申请号：NL2010626

申请日：2013-04-11

Applicant: ASML NETHERLANDS BV

Inventor： HENDRIKS JIMI ,  BRUEBACH JOERG ,  HUIJBREGTSE JEROEN ,  BOOGAARD ARJEN ,  KEMPEN ANTONIUS ,  SINGH HARMEET ,  HUIJSER SASKIA

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG108997A1

公开(公告)日：2005-02-28

申请号：SG200404366

申请日：2004-07-22

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBER ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

Abstract: In a lithographic projection apparatus a liquid supply system maintains liquid in a space between a final element of the projection system and the substrate of the lithographic projection apparatus. A sensor positioned on a substrate table which holds the substrate is adapted for being imaged when immersed in immersion liquid (i.e. under the same conditions as the substrate will be imaged). By ensuring that a primary outer surface of an absorption element of the sensor is formed of one or fewer metal types, long life of the sensor can be expected.

公开(公告)号：DE602004032091D1

公开(公告)日：2011-05-19

申请号：DE602004032091

申请日：2004-07-12

Applicant: ASML NETHERLANDS BV

Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JANSEN HANS ,  BOOGAARD ARJEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL2011761A

公开(公告)日：2014-01-13

申请号：NL2011761

申请日：2013-11-08

Applicant: ASML NETHERLANDS BV

Inventor： KUZNETSOV ALEXEY ,  BOOGAARD ARJEN ,  HUIJBREGTSE JEROEN ,  NIKIPELOV ANDREY ,  KAMPEN MAARTEN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：CA2954307C

公开(公告)日：2022-08-30

申请号：CA2954307

申请日：2015-07-02

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ALEXANDROVICH ,  BANINE VADIM YEVGENYEVICH ,  BENSCHOP JOZEF PETRUS HENRICUS ,  BOOGAARD ARJEN ,  DHALLUIN FLORIAN DIDIER ALBIN ,  KUZNETSOV ALEXEY SERGEEVICH ,  PETER MARIA ,  SCACCABAROZZI LUIGI ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  YAKUNIN ANDREI MIKHAILOVICH

IPC: G03F1/62 ,  G03F7/20

Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.