公开(公告)号：NL2006054A

公开(公告)日：2011-08-10

申请号：NL2006054

申请日：2011-01-24

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  ROPS CORNELIUS ,  VERDONCK ADRIANUS MARINUS ,  EUMMELEN ERIK ,  GRAAF SANDRA ,  CORTIE ROGIER HENDRIKUS MAGDALENA ,  KANEKO TAKESHI ,  DZIOMKINA NINA ,  BOKHOVEN LAURENTIUS ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID

IPC: G03F7/20

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2003363A

公开(公告)日：2010-03-15

申请号：NL2003363

申请日：2009-08-20

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KATE NICOLAAS ,  GRAAF SANDRA ,  CASTELIJNS HENRICUS

IPC: G03F7/20