公开(公告)号：NL2009284A

公开(公告)日：2013-10-31

申请号：NL2009284

申请日：2012-08-06

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  GRAAF ROELOF ,  ROSET NIEK ,  MARTENS ARJAN ,  ZDRAVKOV ALEXANDER ,  HOEKERD KORNELIS ,  DZIOMKINA NINA

IPC: G03F7/20

公开(公告)号：NL2005478A

公开(公告)日：2011-05-18

申请号：NL2005478

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KRUIJF NIEK ,  GRAAF ROELOF ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

公开(公告)号：NL2008186A

公开(公告)日：2012-09-17

申请号：NL2008186

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  GRAAF ROELOF ,  NET ANTONIUS ,  UIJTREGT JOHANNES ,  HEUVEL LEONARDA

IPC: G03F7/20

公开(公告)号：NL2005479A

公开(公告)日：2011-05-18

申请号：NL2005479

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF ,  DZIOMKINA NINA ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET ,  KRUIJF NIEK

IPC: G03F7/20

Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.