公开(公告)号：NL2007453A

公开(公告)日：2012-04-19

申请号：NL2007453

申请日：2011-09-21

Applicant: ASML NETHERLANDS BV

Inventor： BESSEMS DAVID ,  CORTIE ROGIER ,  ZANDEN MARCUS ,  ROPS CORNELIUS ,  WILLEMS PAUL ,  EUMMELEN ERIK ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2006389A

公开(公告)日：2011-10-18

申请号：NL2006389

申请日：2011-03-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY ,  DIRECKS DANIEL ,  DUNGEN CLEMENS ,  SCHEPERS MAIKEL ,  BERKVENS PAUL ,  ZANDEN MARCUS ,  MULDER PIETER

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

公开(公告)号：NL2003914A

公开(公告)日：2010-06-09

申请号：NL2003914

申请日：2009-12-07

Applicant: ASML NETHERLANDS BV

Inventor： KNAAPEN THIJS ,  PELLENS RUDY ,  HOEVEN JAN ,  ANSTOTZ DAVID ,  BRANDS GERT-JAN ,  BADAM VIJAY ,  ZANDEN MARCUS ,  GROOT CASPER ,  BRULS RICHARD ,  DOMMELEN YOURI ,  JACOBS JOHANNES ,  KAMPHUIS MARTIJN ,  LIEBREGTS PAULUS ,  MAAS RUDOLF ,  STAVENGA MARCO ,  VERSPAGET COEN

IPC: G03F7/20

Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.