公开(公告)号：NL2007851A

公开(公告)日：2011-12-19

申请号：NL2007851

申请日：2011-11-24

Applicant: ASML NETHERLANDS BV

Inventor： HAJHOSSEINI NAGHMEH ,  SWINKELS GERARDUS ,  BRANDS GERT-JAN ,  BAATEN RICHARD

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2003914A

公开(公告)日：2010-06-09

申请号：NL2003914

申请日：2009-12-07

Applicant: ASML NETHERLANDS BV

Inventor： KNAAPEN THIJS ,  PELLENS RUDY ,  HOEVEN JAN ,  ANSTOTZ DAVID ,  BRANDS GERT-JAN ,  BADAM VIJAY ,  ZANDEN MARCUS ,  GROOT CASPER ,  BRULS RICHARD ,  DOMMELEN YOURI ,  JACOBS JOHANNES ,  KAMPHUIS MARTIJN ,  LIEBREGTS PAULUS ,  MAAS RUDOLF ,  STAVENGA MARCO ,  VERSPAGET COEN

IPC: G03F7/20

Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.