公开(公告)号：US09390936B2

公开(公告)日：2016-07-12

申请号：US14527039

申请日：2014-10-29

Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY ,  Stephanie Tombrello

Inventor： Michael D. Henry ,  Andrew P. Homyk ,  Axel Scherer ,  Thomas A. Tombrello ,  Sameer Walavalkar

IPC: G01N1/18 ,  H01L21/308 ,  B81C1/00 ,  H01L21/3065 ,  G01N1/40

CPC classification number: B81C1/00111 ,  B01J19/0046 ,  B01J2219/00504 ,  B01J2219/00664 ,  B81B1/006 ,  B81B2203/0361 ,  B81B2207/056 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/0159 ,  G01N1/405 ,  H01L21/3065 ,  H01L21/30655 ,  H01L21/3081 ,  H01L21/3086 ,  Y10T436/25375

Abstract: Methods for fabricating of high aspect ratio probes and deforming micropillars and nanopillars are described. Use of polymers in deforming nanopillars and micropillars is also described.

公开(公告)号：US20160062239A1

公开(公告)日：2016-03-03

申请号：US14713551

申请日：2015-05-15

Applicant: University of Southampton

Inventor： Hywel Morgan ,  Sumit Kalsi ,  Maurits de Planque ,  Kian Shen Kiang

IPC: G03F7/20 ,  G03F7/16

CPC classification number: G03F7/11 ,  B81B2201/0214 ,  B81B2203/0127 ,  B81B2203/0384 ,  B81C1/00103 ,  B81C2201/0159 ,  G03F1/50 ,  G03F7/038 ,  G03F7/039

Abstract: A method for fabricating at least one aperture (60, 64) with shaped sidewalls in a layer (52) of a light sensitive photopolymer (54), which method comprises: (i) providing the layer (52) of the photopolymer (54); (ii) providing a mask (56); (iii) exposing the photopolymer (54) to light (58); (iv) utilising the mask (56) to control the intensity of the light (58) falling on the photopolymer (54); and (v) forming the mask (56) such that its control of the intensity of the light (58) falling on the photopolymer (54) causes the aperture (60, 64) to have the shaped sidewalls.

Abstract translation: 一种用于在光敏光聚合物（54）的层（52）中制造具有成形侧壁的至少一个孔（60,64）的方法，所述方法包括：（i）提供光聚合物（54）的层（52） ; （ii）提供掩模（56）; （iii）将光聚合物（54）暴露于光（58）; （iv）利用所述掩模（56）来控制落在光聚合物（54）上的光（58）的强度; 和（v）形成掩模（56），使得其对落在光聚合物（54）上的光（58）的强度的控制导致孔径（60,64）具有成形侧壁。

公开(公告)号：US20150234270A1

公开(公告)日：2015-08-20

申请号：US14702648

申请日：2015-05-01

Applicant: Patrick Seamus Doyle ,  Daniel Colin Pregibon ,  Dhananjay Dendukuri

Inventor： Patrick Seamus Doyle ,  Daniel Colin Pregibon ,  Dhananjay Dendukuri

IPC: G03F7/00 ,  H01B1/20 ,  H01F1/42 ,  G02B1/04

CPC classification number: G03F7/0037 ,  B81C99/0095 ,  B81C2201/0159 ,  G02B1/04 ,  G03F7/2012 ,  G03F7/2035 ,  G03F7/2053 ,  H01B1/20 ,  H01F1/42 ,  Y10T428/1352 ,  Y10T428/24 ,  Y10T428/24273 ,  Y10T428/24298

Abstract: In a method for synthesizing polymeric microstructures, a monomer stream is flowed, at a selected flow rate, through a fluidic channel. At least one shaped pulse of illumination is projected to the monomer stream, defining in the monomer stream a shape of at least one microstructure corresponding to the illumination pulse shape while polymerizing that microstructure shape in the monomer stream by the illumination pulse. An article of manufacture includes a non-spheroidal polymeric microstructure that has a plurality of distinct material regions.

Abstract translation: 在合成聚合物微结构的方法中，单体流以选定的流速通过流体通道流动。 将至少一个成形的照明脉冲投射到单体流，在单体流中限定与照明脉冲形状对应的至少一个微结构的形状，同时通过照射脉冲聚合单体流中的微结构形状。 制品包括具有多个不同材料区域的非球形聚合物微结构。

公开(公告)号：US08790863B2

公开(公告)日：2014-07-29

申请号：US13881504

申请日：2011-10-26

Applicant: Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

Inventor： Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

IPC: G03F7/38 ,  B82B3/00 ,  G03F7/16

CPC classification number: G03F7/2059 ,  B81C1/00531 ,  B81C2201/0143 ,  B81C2201/0159 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/2251 ,  H01J37/3174 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/2002 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31796 ,  H01L21/0331 ,  H01L22/12 ,  H01L51/0014 ,  H01L51/0048

Abstract: In a method for imaging a solid state substrate, a vapor is condensed to an amorphous solid water condensate layer on a surface of a solid state substrate. Then an image of at least a portion of the substrate surface is produced by scanning an electron beam along the substrate surface through the water condensate layer. The water condensate layer integrity is maintained during electron beam scanning to prevent electron-beam contamination from reaching the substrate during electron beam scanning. Then one or more regions of the layer can be locally removed by directing an electron beam at the regions. A material layer can be deposited on top of the water condensate layer and any substrate surface exposed at the one or more regions, and the water condensate layer and regions of the material layer on top of the layer can be removed, leaving a patterned material layer on the substrate.

Abstract translation: 在固态基板成像方法中，将蒸气冷凝成固态基板表面的无定形固体水凝结物层。 然后通过沿着衬底表面扫描电子束通过水凝结层产生衬底表面的至少一部分的图像。 在电子束扫描期间维持水凝结层的完整性，以防止电子束扫描期间电子束污染到达衬底。 然后可以通过在该区域处引导电子束来局部地去除该层的一个或多个区域。 材料层可以沉积在水冷凝物层的顶部和在一个或多个区域暴露的任何基底表面，并且水凝结物层和该层顶部上的材料层的区域可以被去除，留下图案化的材料层 在基板上。

公开(公告)号：US20140197501A1

公开(公告)日：2014-07-17

申请号：US13743300

申请日：2013-01-16

Applicant: INFINEON TECHNOLOGIES AG

Inventor： Alfons Dehe

IPC: B81B3/00 ,  B81C1/00

CPC classification number: B81C1/00325 ,  B81B3/0072 ,  B81B2201/0257 ,  B81C1/00158 ,  B81C1/00182 ,  B81C2201/013 ,  B81C2201/0159 ,  B81C2201/0198

Abstract: A MEMS device, a method of making a MEMS device and a system of a MEMS device are shown. In one embodiment, a MEMS device includes a first polymer layer, a MEMS substrate disposed on the first polymer layer and a MEMS structure supported by the MEMS substrate. The MEMS device further includes a first opening disposed in the MEMS substrate and a second opening disposed in the first polymer layer.

Abstract translation: 示出了MEMS器件，制造MEMS器件的方法和MEMS器件的系统。 在一个实施例中，MEMS器件包括第一聚合物层，设置在第一聚合物层上的MEMS衬底和由MEMS衬底支撑的MEMS结构。 MEMS器件还包括设置在MEMS衬底中的第一开口和设置在第一聚合物层中的第二开口。

公开(公告)号：US08778195B2

公开(公告)日：2014-07-15

申请号：US12715801

申请日：2010-03-02

Applicant: Stéfan Landis

Inventor： Stéfan Landis

IPC: B44C1/22 ,  B82Y40/00

CPC classification number: G03F7/2059 ,  B81C99/009 ,  B81C2201/0159 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

Abstract: A method to fabricate an imprint mould in three dimensions including at least: a) forming at least one trench, of width W and depth h, in a substrate, thereby forming three surfaces including, a bottom of the at least one trench, sidewalls of the at least one trench, and a remaining surface of the substrate, called top of the substrate; b) forming alternate layers in the at least one trench, each having at least one portion perpendicular to the substrate, in a first material and in a second material which can be selectively etched relative to the first material; and c) selectively etching said portions of the layers perpendicular to the substrate.

Abstract translation: 一种在三维中制造压印模具的方法，至少包括：a）在衬底中形成宽度为W和深度为h的至少一个沟槽，从而形成三个表面，包括至少一个沟槽的底部， 所述至少一个沟槽和所述衬底的剩余表面称为所述衬底的顶部; b）在所述至少一个沟槽中形成交替层，每个沟槽具有至少一部分垂直于所述衬底的第一材料和第二材料，所述第二材料可相对于所述第一材料选择性地蚀刻; 和c）选择性地刻蚀垂直于衬底的层的所述部分。

公开(公告)号：US20140193580A1

公开(公告)日：2014-07-10

申请号：US14122576

申请日：2012-05-18

Applicant: Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

Inventor： Raluca Tiron ,  Stéphanie Gaugiran ,  Xavier Chevalier ,  Serge Tedesco

IPC: B05D5/00

CPC classification number: B05D5/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0159 ,  H01L21/0273 ,  H01L21/0337

Abstract: A method for making patterns on the surface of a substrate by graphoepitaxy, includes depositing a layer of resin on the surface of the substrate; making patterns in the resin on the surface of a substrate; curing the patterns in the resin by producing a layer of amorphous carbon on the surface of the patterns in the resin; depositing a layer of statistical copolymer after curing the patterns in the resin; grafting the layer of statistical copolymer onto the patterns in the resin by annealing; and depositing a layer of a block copolymer into the spaces defined by the patterns in the resin after curing the patterns and the grafting of the layer of statistical copolymer.

Abstract translation: 一种用于通过石刻电泳法在衬底表面上制作图案的方法，包括在衬底的表面上沉积一层树脂; 在基板表面上的树脂中形成图案; 通过在树脂中的图案的表面上产生无定形碳层来固化树脂中的图案; 在固化树脂中的图案之后沉积一层统计共聚物; 通过退火将统计共聚物层接枝到树脂上的图案上; 以及在固化图案和统计共聚物层的接枝之后，将一层嵌段共聚物沉积在由树脂中的图案限定的空间中。

公开(公告)号：US20130288182A1

公开(公告)日：2013-10-31

申请号：US13881504

申请日：2011-10-26

Applicant: Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

Inventor： Daniel Branton ,  Anpan Han ,  Jene A. Golovchenko

IPC: G03F7/20

CPC classification number: G03F7/2059 ,  B81C1/00531 ,  B81C2201/0143 ,  B81C2201/0159 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/2251 ,  H01J37/3174 ,  H01J2237/004 ,  H01J2237/022 ,  H01J2237/2002 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/31796 ,  H01L21/0331 ,  H01L22/12 ,  H01L51/0014 ,  H01L51/0048

Abstract: In a method for imaging a solid state substrate, a vapor is condensed to an amorphous solid water condensate layer on a surface of a solid state substrate. Then an image of at least a portion of the substrate surface is produced by scanning an electron beam along the substrate surface through the water condensate layer. The water condensate layer integrity is maintained during electron beam scanning to prevent electron-beam contamination from reaching the substrate during electron beam scanning. Then one or more regions of the layer can be locally removed by directing an electron beam at the regions. A material layer can be deposited on top of the water condensate layer and any substrate surface exposed at the one or more regions, and the water condensate layer and regions of the material layer on top of the layer can be removed, leaving a patterned material layer on the substrate.

Abstract translation: 在固态基板成像方法中，将蒸气冷凝成固态基板表面的无定形固体水凝结物层。 然后通过沿着衬底表面扫描电子束通过水凝结层产生衬底表面的至少一部分的图像。 在电子束扫描期间维持水凝结层的完整性，以防止电子束扫描期间电子束污染到达衬底。 然后可以通过在该区域处引导电子束来局部地去除该层的一个或多个区域。 材料层可以沉积在水冷凝物层的顶部和在一个或多个区域暴露的任何基底表面，并且水凝结物层和该层顶部上的材料层的区域可以被去除，留下图案化的材料层 在基板上。

公开(公告)号：US20130207315A1

公开(公告)日：2013-08-15

申请号：US13800428

申请日：2013-03-13

Applicant: SNU R&DB FOUNDATION

Inventor： Sunghoon KWON ,  Ji Yun KIM ,  Wook PARK ,  Hyun Sung PARK ,  Seung Ah LEE ,  Su Eun CHUNG

IPC: B29C39/22

CPC classification number: B29C39/22 ,  B81C99/0095 ,  B81C2201/0159 ,  G03F7/2035

Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.

Abstract translation: 提供流体通道系统。 流体通道系统包括光投射装置，流体通道和轨道。 光投射装置提供光。 由光选择性固化的光固化流体在流体通道内流动。 通过固化可光固化流体而形成的精细结构沿轨道移动。

公开(公告)号：US20130176543A1

公开(公告)日：2013-07-11

申请号：US13554288

申请日：2012-07-20

Applicant: Sunghoon KWON ,  SeungAh LEE ,  Wook PARK ,  Su Eun CHUNG

Inventor： Sunghoon KWON ,  SeungAh LEE ,  Wook PARK ,  Su Eun CHUNG

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  B29C64/106 ,  B29L2031/756 ,  B33Y30/00 ,  B81C99/0095 ,  B81C2201/0159 ,  F15B7/08 ,  F15B15/10 ,  G03B27/54 ,  G03F7/20 ,  G03F7/70416

Abstract: An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.

Abstract translation: 提供了包括膜，微流体通道和气动室的光流体光刻系统。 膜可以位于气动室和微流体通道之间。 微流体通道可以具有对应于膜的位移的高度并且具有在其中流动的流体，流体由从底部照射的光固化以形成微结构。 气动室可以根据其内部大气压力而引起膜的移位。