公开(公告)号：US20020112963A1

公开(公告)日：2002-08-22

申请号：US10080885

申请日：2002-02-22

Applicant: Nikon Corporation

Inventor： Katsushi Nakano ,  Ichiro Ono ,  Masami Masuko ,  Akira Okada

IPC: B05D005/12 ,  C25D005/02 ,  C23C028/00

CPC classification number: H01J9/236 ,  C25D5/02 ,  H01F41/041 ,  H01J2237/152 ,  H01J2237/3175 ,  H05K1/165 ,  H05K3/048 ,  H05K3/244

Abstract: Methods are disclosed for manufacturing coils for use in a charged-particle-beam (CPB) optical system such as would be used in a CPB imaging apparatus or CPB lithography apparatus. In an embodiment, on a surface of a coil substrate is formed a mask layer defining channels corresponding to a coil pattern. Using the mask layer as a mask, a pattern of conductive coil-forming material is applied to the substrate surface in the channels. Coil elements formed on the substrate surface by this method exhibit steep sides and a desired aspect ratio. To such end, the depth of the channels desirably is greater than the desired thickness of the coil elements. Alternatively, a metal layer (for use as an electroplating electrode) is formed on a surface of the substrate. The metal layer is coated with a resist at a thickness of at least 0.1 mm. The resist is removed by lithography from regions where coil elements are to be formed. In the regions, conductive metal is grown by electroplating to form the coil elements.

Abstract translation: 公开了用于制造用于例如将用于CPB成像设备或CPB光刻设备的带电粒子束（CPB）光学系统中的线圈的方法。 在一个实施例中，在线圈基板的表面上形成了限定对应于线圈图案的通道的掩模层。 使用掩模层作为掩模，将导电线圈形成材料的图案施加到沟道中的衬底表面。 通过该方法在基板表面上形成的线圈元件具有陡峭的侧面和期望的纵横比。 为此，通道的深度理想地大于线圈元件的期望厚度。 或者，在基板的表面上形成金属层（用作电镀电极）。 金属层以至少0.1mm的厚度涂覆抗蚀剂。 抗蚀剂通过光刻从要形成线圈元件的区域去除。 在这些区域中，通过电镀生长导电金属以形成线圈元件。

公开(公告)号：US20010009267A1

公开(公告)日：2001-07-26

申请号：US09810589

申请日：2001-03-19

Applicant: Hitachi, Ltd.

Inventor： Masahiro Tadokoro ,  Junichi Hirota ,  Kazuo Hiramoto ,  Masumi Umezawa ,  Yoshihisa Iwashita

IPC: H01J049/30 ,  B01D059/44

CPC classification number: H01F7/20 ,  H01J37/1472 ,  H01J2237/152 ,  H05H7/04

Abstract: An electromagnet comprises a pair of magnetic pole 1a and 1b, a return yoke 3, exciting coils 4 and 5, etc. In an interior portion of a magnetic pole, plural spacers 2a-2g are provided putting side by side in a horizontal direction. Each of the spaces 2a-2g is an air layer and a longitudinal cross-section is a substantially rectangular shape and the space has a lengthily extending slit shape in a vertical direction against a paper face in FIG. 1. The plural spaces are mainly arranged toward a right side from a beam orbit center O and an interval formed between adjacent spaces is narrower toward the right side. The electromagnet having a simple magnetic pole structure and a wide effective magnetic field area in a case where a maximum magnetic field strength is increased can be secured.

公开(公告)号：US5382800A

公开(公告)日：1995-01-17

申请号：US39

申请日：1993-01-04

Applicant: Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

Inventor： Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

IPC: G03F7/20 ,  H01J37/147 ,  H01L21/027 ,  H01L21/30 ,  H01J3/32

CPC classification number: H01J37/1472 ,  H01J2237/002 ,  H01J2237/14 ,  H01J2237/152 ,  H01J2237/3175

Abstract: A charged particle beam exposure method for deflecting a charged particle beam in a deflection system which includes electromagnetic deflection coils, includes the steps of (a) controlling the deflection system based on deflection data, and (b) generating heat at least a vicinity of the electromagnetic deflection coils so as to compensate for a change in heat generated from the electromagnetic deflection coils.

Abstract translation: 一种用于使包含电磁偏转线圈的偏转系统中的带电粒子束偏转的带电粒子束曝光方法包括以下步骤：（a）基于偏转数据控制偏转系统，以及（b）至少产生热量 电磁偏转线圈，以补偿由电磁偏转线圈产生的热量变化。

公开(公告)号：US5264706A

公开(公告)日：1993-11-23

申请号：US874138

申请日：1992-04-27

Applicant: Yoshihisa Oae ,  Akio Yamada ,  Hiroshi Yasuda

Inventor： Yoshihisa Oae ,  Akio Yamada ,  Hiroshi Yasuda

IPC: H01J37/147 ,  H01J3/32

CPC classification number: H01J37/1471 ,  H01J2237/002 ,  H01J2237/152 ,  H01J2237/3175

Abstract: An electron beam exposure system comprises a beam source for producing and directing an electron beam along an optical axis, an evacuated column for accommodating the beam source and extending along the optical axis, an electron lens for focusing the electron beam on a substrate; and an electromagnetic deflector supplied with a control signal for deflecting the electron beam in response to the control signal. The electromagnetic deflector comprises an inner sleeve surrounding the evacuated column, first and second mutually separate windings provided on an outer surface of the inner sleeve in opposed relationship with respect to each other across the optical axis, an outer sleeve surrounding the inner sleeve with a separation therebetween defining a passageway for the flow of a coolant therethrough; third and fourth, mutually separate windings provided on an inner surface of the outer sleeve in opposed relationship with respect to each other across the optical axis, an inlet for introducing the coolant into the passageway, and an outlet for exiting the coolant from the passageway.

Abstract translation: 电子束曝光系统包括用于沿光轴产生和引导电子束的光束源，用于容纳光束源并沿光轴延伸的抽真空柱，用于将电子束聚焦在衬底上的电子透镜; 以及电磁偏转器，其被提供有用于响应于控制信号偏转电子束的控制信号。 电磁偏转器包括围绕真空柱的内套筒，第一和第二相互独立的绕组，其设置在内套筒的外表面上，相对于彼此跨越光轴的对置关系，包围内套筒的外套筒具有分离 其间限定用于冷却剂流过其的通道; 第三和第四，互相分离的绕组设置在外套筒的内表面上，相对于彼此跨越光轴的相对关系，用于将冷却剂引入通道的入口和用于从冷却剂离开通道的出口。

公开(公告)号：US11717584B2

公开(公告)日：2023-08-08

申请号：US17681668

申请日：2022-02-25

Applicant: FERMI RESEARCH ALLIANCE, LLC

Inventor： Thomas Kroc

IPC: A61L2/08 ,  H01J37/14 ,  H01J37/147

CPC classification number: A61L2/087 ,  A61L2/082 ,  H01J37/1475 ,  H01J2237/152

Abstract: A magnetic apparatus and a method of operating the magnetic apparatus can include a scanning electromagnet that redirects a beam of charged particles, a vacuum chamber that prevents the atmosphere from interfering with the charged particles, and, a parallelizing permanent magnet array for parallelizing the beam of charged particles. The parallelizing permanent magnet array can be located proximate to a target comprising a Bremsstrahlung target or an object that is being irradiated. The magnetic field of the scanning electromagnet can be variable to produce all angles necessary to sweep the beam of charged particles across the target and the parallelizing permanent magnet array can be configured from a magnetic material that does not require an electric current.

公开(公告)号：US20180374673A1

公开(公告)日：2018-12-27

申请号：US15780678

申请日：2016-01-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Shuhei YABU

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/28 ,  H01J37/147 ,  H01J37/21 ,  H01J37/141

CPC classification number: H01J37/263 ,  H01J37/12 ,  H01J37/141 ,  H01J37/1471 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/152

Abstract: A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam in the downstream of the condenser lens system.

公开(公告)号：US20180301314A1

公开(公告)日：2018-10-18

申请号：US15890585

申请日：2018-02-07

Applicant: JEOL Ltd.

Inventor： Kazuya Omoto

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: There is provided an energy filter capable of being simplified in structure and of achieving low aberrations. The energy filter (100) includes a first sector magnet (10) and a second sector magnet (20). The first and second magnets (10, 20) are configured mirror-symmetrically with respect to a symmetry plane (M). There are one focal point of crossover in the X direction and one focal point of crossover in the Y direction. The focal point of crossover in the X direction and the focal point of crossover in the Y direction are at an energy dispersive plane (S2). There are two focal points of image in the X direction and two focal points of image in the Y direction. The focal points of image in the X direction and the focal points of image in the Y direction are at the symmetry plane (M) and at an achromatic plane (A2).

公开(公告)号：US20180151326A1

公开(公告)日：2018-05-31

申请号：US15364163

申请日：2016-11-29

Applicant: FEI Company

Inventor： Erik René Kieft

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/147 ,  H01J37/22

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/152 ,  H01J2237/2802

Abstract: A method of investigating a specimen using charged particle microscopy, comprising the following steps: Using a primary source to produce a pulsed beam of charged particles that propagate along a beam path; Providing a specimen at an irradiation position in said beam path; Using a secondary source to produce repetitive excitations of the specimen; Using a detector to register charged particles in said beam that traverse the specimen after each said excitation, wherein: Said primary source is configured to produce a train of multiple pulses per excitation by said secondary source; Said detector is configured to comprise an integrated array of pixels, each with an individual readout circuit, to register a time-of-arrival of individual particles in said train.

公开(公告)号：US20170323760A1

公开(公告)日：2017-11-09

申请号：US15461829

申请日：2017-03-17

Applicant: ADVANTEST CORPORATION

Inventor： Masaki Kurokawa ,  Takamasa Sato ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/141 ,  H01J2237/1504 ,  H01J2237/152 ,  H01J2237/1526 ,  H01J2237/20285

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

公开(公告)号：US09767985B2

公开(公告)日：2017-09-19

申请号：US14895708

申请日：2014-10-17

Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

Inventor： Jiang Huang ,  Mingwu Fan ,  Tiaoqin Yu ,  Lige Zhang ,  Chen Zuo ,  Jun Yang ,  Yongqian Xiong ,  Kaifeng Liu ,  Gerald F. Wu ,  Lei Cao

IPC: H01J37/143 ,  H01J3/12 ,  G21K1/093 ,  G21K5/04

CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window.