公开(公告)号：US20180261425A1

公开(公告)日：2018-09-13

申请号：US15918464

申请日：2018-03-12

Applicant: Hitachi, Ltd.

Inventor： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Kaori SHIRAHATA ,  Makoto SAKAKIBARA

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/28

Abstract: A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.

公开(公告)号：US20180240644A1

公开(公告)日：2018-08-23

申请号：US15902251

申请日：2018-02-22

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/244 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/2443

Abstract: A scanning electron microscope includes: a liner tube which transmits an electron beam; a scintillator having a through-hole into which the liner tube is inserted; a light guide which guides light generated by the scintillator; a conductive layer provided on a sensitive surface of the scintillator; and a conductive member provided in the scintillator, wherein the shortest distance between the liner tube and the conductive member is shorter than the shortest distance between the liner tube and the conductive layer, a voltage for accelerating electrons is applied to the conductive layer, and the conductive layer and the conductive member have a same potential.

公开(公告)号：US20180226220A1

公开(公告)日：2018-08-09

申请号：US15867275

申请日：2018-01-10

Applicant: Howard Hughes Medical Institute

Inventor： Tamir Gonen ,  Igor Negrashov ,  Dan Shi ,  Tanya Tabachnik

IPC: H01J37/15 ,  H01J37/18 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/09 ,  H01J37/10 ,  H01J37/18 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0455 ,  H01J2237/0456 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/1502

Abstract: An apparatus for a transmission electron microscope includes a housing configured to be attached to the transmission electron microscope; a plunger received in the housing and movable relative to the housing; a first set of pieces coupled to the plunger, the first piece being configured to move relative to the housing in response to the plunger moving relative to the housing; and a second set of pieces positioned in a fixed spatial relationship relative to each other, the second set of pieces and the first set of pieces forming a perimeter of an opening, an extent of the opening being continuously variable by moving the first set of piece relative to the second set of pieces.

公开(公告)号：US09911575B2

公开(公告)日：2018-03-06

申请号：US15207150

申请日：2016-07-11

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Shih-Chi Wang ,  Tsung-Chih Chien ,  Hui-Min Huang ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/10 ,  H01J37/04 ,  H01J37/12 ,  H01J37/20

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/10 ,  H01J37/12 ,  H01J37/20 ,  H01J2237/0435 ,  H01J2237/1205

Abstract: A charged particle multi-beam lithography system includes an illumination sub-system that is configured to generate a charged particle beam; and multiple plates with a first aperture through the plates. The plates and the first aperture are configured to form a charged particle doublet. The system further includes a blanker having a second aperture whose footprint is smaller than that of the first aperture. The charged particle doublet is configured to demagnify a portion of the charged particle beam passing through the first aperture, thereby producing a demagnified beamlet. The blanker is configured to receive the demagnified beamlet from the charged particle doublet, and is further configured to conditionally allow the demagnified beamlet to travel along a desired path.

公开(公告)号：US20180040454A1

公开(公告)日：2018-02-08

申请号：US15788338

申请日：2017-10-19

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Ingo Mueller ,  Nicole Rauwolf ,  Christof Riedesel ,  Thomas Kemen ,  Joerg Jacobi ,  Arne Thoma ,  Markus Doering ,  Dirk Zeidler ,  Juergen Kynast ,  Gerd Benner

IPC: H01J37/21 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/0492 ,  H01J2237/28 ,  H01J2237/31764 ,  H01J2237/31774

Abstract: A method for operating a multi-beam particle optical unit comprises includes providing a first setting of effects of particle-optical components, wherein a particle-optical imaging is characterizable by at least two parameters. The method also includes determining a matrix A, and determining a matrix S. The method further includes defining values of parameters which characterize a desired imaging, and providing a second setting of the effects of the components in such a way that the particle-optical imaging is characterizable by the parameters having the defined values.

公开(公告)号：US20170352520A1

公开(公告)日：2017-12-07

申请号：US15605343

申请日：2017-05-25

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/147 ,  H01J37/30 ,  H01J37/04 ,  H01J37/10

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/10 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/30455 ,  H01J2237/31774

Abstract: A multi charged particle beams exposure method includes assigning, with respect to plural times of shots of multi-beams using a charged particle beam, each shot to one of plural groups, depending on a total current value of beams becoming in an ON condition in a shot concerned in the multi-beams, changing the order of the plural times of shots so that shots assigned to the same group may be continuously emitted for each of the plural groups, correcting, for each group, a focus position of the multi-beams to a focus correction position for a group concerned corresponding to the total current value, and performing the plural times of shots of the multi-beams such that the shots assigned to the same group are continuously emitted in a state where the focus position of the multi-beams has been corrected to the focus correction position for the group concerned.

公开(公告)号：US20170229285A1

公开(公告)日：2017-08-10

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/065 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

公开(公告)号：US20160372304A1

公开(公告)日：2016-12-22

申请号：US15079046

申请日：2016-03-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Gabor Toth ,  David Trease ,  Rohit Bothra ,  Grace Hsiu-Ling Chen ,  Rainer Knippelmeyer

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  G01N23/203 ,  G01N2223/6116 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/057 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.

Abstract translation: 公开了一种具有改善的图像束稳定性的扫描电子显微镜系统。 该系统包括被配置为产生电子束的电子束源和一组电子 - 光学元件以将至少一部分电子束引导到样品的一部分上。 该系统包括发射体分析器组件。 该系统包括分配器元件，其被配置为将由样品的表面发射的至少一部分二次电子和/或反向散射电子引导到发射体分析器组件。 发射分析器组件被配置成对二次电子和/或后向散射电子中的至少一个进行成像。

公开(公告)号：US20160365221A1

公开(公告)日：2016-12-15

申请号：US15183061

申请日：2016-06-15

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Preikszas

IPC: H01J37/28 ,  H01J37/21 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/1475 ,  H01J37/21 ,  H01J37/244 ,  H01J2237/05 ,  H01J2237/24475 ,  H01J2237/24485 ,  H01J2237/2449

Abstract: An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.

Abstract translation: 可能具有静电和/或磁性透镜的分析装置分析带电粒子的能量，并且具有相反的场栅装置，以这样的方式施加电压，使得一部分带电粒子被相对场反射 网格设备。 带电粒子的另一部分通过相对的场栅装置并由检测器检测。 相对的栅格装置具有曲率。 曲率中心是光轴与相对的场格栅装置的交点。 曲率具有由曲率中心与光轴起始点之间的部分给出的曲率半径。 相对的栅格装置在从曲率中心观察时在起始点的方向上弯曲和/或被布置成沿着光轴可移位。

公开(公告)号：US09443696B2

公开(公告)日：2016-09-13

申请号：US14711607

申请日：2015-05-13

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Liqun Han

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/05 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/057

Abstract: One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及双维尼滤波器单色仪。 第一维恩滤波器将电子束聚焦在第一平面中，同时使电子束在第二平面中平行。 狭缝开口允许具有能量范围内的能量的电子束的电子通过，同时阻挡具有能量范围外的能量的电子束的电子。 第二维恩滤波器将电子束聚焦成在第一平面中平行，同时使电子束在第二平面中平行。 还公开了其它实施例，方面和特征。