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    Apparatus for measuring optical characteristics including position detection
    12.
    发明授权
    Apparatus for measuring optical characteristics including position detection 失效
    用于测量包括位置检测在内的光学特性的装置

    公开(公告)号：US08786844B2

    公开(公告)日：2014-07-22

    申请号：US13604420

    申请日：2012-09-05

    Applicant: Wayne D. Jung ,  Russell W. Jung ,  Alan R. Loudermilk

    Inventor： Wayne D. Jung ,  Russell W. Jung ,  Alan R. Loudermilk

    IPC: G01N21/00

    CPC classification number: G01J3/02 ,  G01J3/0205 ,  G01J3/0216 ,  G01J3/0218 ,  G01J3/0229 ,  G01J3/027 ,  G01J3/0272 ,  G01J3/0278 ,  G01J3/04 ,  G01J3/508 ,  G01J3/51 ,  G01J3/513 ,  G01J2003/2866 ,  G01N21/03

    Abstract: An apparatus measuring optical characteristics including position detection is disclosed. A processor is coupled to a display. A first optical sensor makes a first measurement and a second optical sensor makes a second measurement. A source of illumination provides illumination in the IR range it and the first optical sensor determine a minimal distance between the apparatus and an external object such that illumination emitted by the source is not received by the first optical sensor when the apparatus is less than the minimal distance from the external object. A position of the apparatus with respect to an object and an optical property of light received by the apparatus are determined. A transparent member having a thickness less than the minimal distance may be provided through which the source provides illumination and receives illumination external to the apparatus.

    Abstract translation: 公开了一种测量包括位置检测在内的光学特性的装置。 处理器耦合到显示器。 第一光学传感器进行第一测量，第二光学传感器进行第二测量。 照明源在IR范围内提供照明，并且第一光学传感器确定设备和外部物体之间的最小距离，使得当设备小于最小值时，由源发射的照明不被第一光学传感器接收 距外部物体的距离。 确定装置相对于物体的位置和由该装置接收的光的光学特性。 可以提供具有小于最小距离的厚度的透明构件，源提供照明并且接收设备外部的照明。

    Color measurement apparatus and color measurement method
    13.
    发明授权
    Color measurement apparatus and color measurement method 失效
    色彩测量装置和色彩测量方法

    公开(公告)号：US08780349B2

    公开(公告)日：2014-07-15

    申请号：US13745498

    申请日：2013-01-18

    Applicant: Yoshio Okumura

    Inventor： Yoshio Okumura

    IPC: G01J3/46 ,  G01J3/02 ,  G01N21/57 ,  G01J3/50

    CPC classification number: G01J3/02 ,  G01J3/0278 ,  G01J3/46 ,  G01J3/504 ,  G01N21/57 ,  H04N1/54 ,  H04N1/6033 ,  H04N1/6088

    Abstract: A color measurement apparatus that performs color measurement on a printout includes a measurement unit that can perform color measurement on a target by changing a light-receiving angle, and a controller that causes the measurement unit to perform color measurement at the light-receiving angle corresponding to an index value representing unique luster of the printout.

    Abstract translation: 在打印输出上执行颜色测量的颜色测量装置包括：测量单元，其可以通过改变受光角度来对目标进行颜色测量;以及控制器，其使测量单元以对应的受光角执行颜色测量 指示代表打印输出的唯一光泽的索引值。

    System and Method for Drug Detection Using SWIR
    14.
    发明申请
    System and Method for Drug Detection Using SWIR 审中-公开
    使用SWIR进行药物检测的系统和方法

    公开(公告)号：US20140043488A1

    公开(公告)日：2014-02-13

    申请号：US14055509

    申请日：2013-10-16

    Applicant: ChemImage Corporation

    Inventor： Patrick Treado ,  Matthew Nelson ,  Charles Gardner

    IPC: G01N33/15

    CPC classification number: G01N33/15 ,  G01J3/02 ,  G01J3/0218 ,  G01J3/027 ,  G01J3/0278 ,  G01J3/44 ,  G01N21/359 ,  G01N33/0057

    Abstract: A method for detecting unknown materials, such as drugs. A first location is surveyed using a video capture device to identify a second location comprising an unknown material. The second location is interrogated using SWIR spectroscopic and/or imaging methods to generate a SWIR hyperspectral image. The SWIR hyperspectral image is analyzed to associate the unknown material with a known drug material. A system for detecting unknown materials, such as drugs comprising a first collection lens for collecting interacted photons from a first location and a visible imaging device for generating a visible image. A second collection lens may collect a plurality of interacted photons from a second location and a tunable filter may filter the interacted photons. A spectroscopic imaging device may detect the interacted photons and generate a SWIR hyperspectral image. A processor may analyze the SWIR hypespectral image to associate an unknown material with a known material.

    Abstract translation: 检测未知物质如药物的方法。 使用视频捕获设备来测量第一位置以识别包括未知材料的第二位置。 使用SWIR光谱和/或成像方法询问第二个位置以产生SWIR高光谱图像。 分析SWIR高光谱图像以将未知材料与已知药物材料相关联。 一种用于检测未知材料的系统，例如药物，其包括用于从第一位置收集相互作用的光子的第一收集透镜和用于产生可见图像的可见成像装置。 第二采集透镜可以从第二位置收集多个相互作用的光子，并且可调谐滤光器可以过滤相互作用的光子。 光谱成像装置可以检测相互作用的光子并产生SWIR高光谱图像。 处理器可以分析SWIR超光谱图像以将未知材料与已知材料相关联。

    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM
    16.
    发明申请
    LIGHT SOURCE TRACKING IN OPTICAL METROLOGY SYSTEM 有权
    光学系统系统中的光源跟踪

    公开(公告)号：US20130033704A1

    公开(公告)日：2013-02-07

    申请号：US13285712

    申请日：2011-10-31

    Applicant: Guorong V. Zhuang ,  Shankar Krishnan ,  Johannes D. de Veer ,  Klaus Flock ,  David Y. Wang ,  Lawrence D. Rotter

    Inventor： Guorong V. Zhuang ,  Shankar Krishnan ,  Johannes D. de Veer ,  Klaus Flock ,  David Y. Wang ,  Lawrence D. Rotter

    IPC: G01C1/00

    CPC classification number: G01J3/0264 ,  G01B2210/56 ,  G01J3/0208 ,  G01J3/0278 ,  G01J3/06 ,  G01J3/10 ,  G01N21/4785

    Abstract: The present invention may include loading a diagnostic sample onto a sample stage, focusing light from an illumination source disposed on a multi-axis stage onto the diagnostic sample, collecting a portion of light reflected from a surface of the diagnostic sample utilizing a detector, wherein the illumination source and the detector are optically direct-coupled via an optical system, acquiring a set of diagnostic parameters indicative of illumination source position drift from the diagnostic sample, determining a magnitude of the illumination source position drift by comparing the acquired set of diagnostic parameters to an initial set of parameters obtained from the diagnostic sample at a previously measured alignment condition, determining a direction of the illumination source position drift; and providing illumination source position adjustment parameters configured to correct the determined magnitude and direction of the illumination source position drift to the multi-axis actuation control system of the multi-axis stage.

    Abstract translation: 本发明可以包括将诊断样本加载到样本台上，将来自设置在多轴平台上的照明源的光聚焦到诊断样本上，利用检测器收集从诊断样品的表面反射的一部分光，其中 照明源和检测器通过光学系统光学直接耦合，获取指示来自诊断样本的照明源位置漂移的一组诊断参数，通过比较所获取的诊断参数集合来确定照明源位置漂移的大小 到在先前测量的对准条件下从诊断样本获得的初始参数集合，确定照明源位置漂移的方向; 以及提供照明源位置调整参数，其被配置为校正所确定的照明源位置漂移的大小和方向到所述多轴平台的多轴致动控制系统。

    Apparatus for Measuring Optical Characteristics Including Position Detection
    17.
    发明申请
    Apparatus for Measuring Optical Characteristics Including Position Detection 失效
    包括位置检测在内的光学特性测量装置

    公开(公告)号：US20130020485A1

    公开(公告)日：2013-01-24

    申请号：US13604420

    申请日：2012-09-05

    Applicant: Wayne D. Jung ,  Russell W. Jung ,  Alan R. Loudermilk

    Inventor： Wayne D. Jung ,  Russell W. Jung ,  Alan R. Loudermilk

    IPC: G01J5/10

    CPC classification number: G01J3/02 ,  G01J3/0205 ,  G01J3/0216 ,  G01J3/0218 ,  G01J3/0229 ,  G01J3/027 ,  G01J3/0272 ,  G01J3/0278 ,  G01J3/04 ,  G01J3/508 ,  G01J3/51 ,  G01J3/513 ,  G01J2003/2866 ,  G01N21/03

    Abstract: An apparatus measuring optical characteristics including position detection is disclosed. A processor is coupled to a display. A first optical sensor makes a first measurement and a second optical sensor makes a second measurement. A source of illumination provides illumination in the IR range it and the first optical sensor determine a minimal distance between the apparatus and an external object such that illumination emitted by the source is not received by the first optical sensor when the apparatus is less than the minimal distance from the external object. A position of the apparatus with respect to an object and an optical property of light received by the apparatus are determined. A transparent member having a thickness less than the minimal distance may be provided through which the source provides illumination and receives illumination external to the apparatus.

    Abstract translation: 公开了一种测量包括位置检测在内的光学特性的装置。 处理器耦合到显示器。 第一光学传感器进行第一测量，第二光学传感器进行第二测量。 照明源在IR范围内提供照明，并且第一光学传感器确定设备和外部物体之间的最小距离，使得当设备小于最小值时，由源发射的照明不被第一光学传感器接收 距外部物体的距离。 确定装置相对于物体的位置和由该装置接收的光的光学特性。 可以提供具有小于最小距离的厚度的透明构件，源提供照明并且接收设备外部的照明。

    Charged Particle Beam Processing System with Visual and Infrared Imaging
    19.
    发明申请
    Charged Particle Beam Processing System with Visual and Infrared Imaging 有权
    带有视觉和红外成像的带电粒子束处理系统

    公开(公告)号：US20120006987A1

    公开(公告)日：2012-01-12

    申请号：US13179109

    申请日：2011-07-08

    Applicant: Chad Rue ,  Enrique Agorio ,  Daniel Crowley

    Inventor： Chad Rue ,  Enrique Agorio ,  Daniel Crowley

    IPC: G01J5/10

    CPC classification number: G01J3/0262 ,  G01J3/0208 ,  G01J3/0278 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/8825 ,  G01N2021/95653 ,  H01J37/226 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/31749

    Abstract: A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.

    Abstract translation: 公开了一种用于处理衬底的带电粒子束系统，包括带电粒子柱，组合红外辐射和可见光照明和成像子系统，真空内光学器件，以及精确级，用于在充电粒子柱下方交替地支撑和定位衬底， 成像系统。 带电粒子柱和成像系统的轴线偏移，以使成像和光束处理的工作距离远远大于单个集成组件中可能的距离。 公开了一种用于非常精确校准柱和成像系统之间的偏移的方法，使得能够在基板上的精确确定的位置处进行光束处理。 成像系统能够将基底上的子表面特征定位为使用带电粒子束不能看到的。 公开了两种照明模式，使得能够在红外辐射和可见光下进行亮场和暗场成像。

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