公开(公告)号：US09997326B2

公开(公告)日：2018-06-12

申请号：US15006721

申请日：2016-01-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideto Dohi ,  Akira Ikegami ,  Hideyuki Kazumi

IPC: H01J37/141 ,  H01J37/21 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/1478 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/04922 ,  H01J2237/1506 ,  H01J2237/1534 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2809

Abstract: In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

公开(公告)号：US20180076001A1

公开(公告)日：2018-03-15

申请号：US15696445

申请日：2017-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA

IPC: H01J37/02 ,  H05H3/00 ,  H01J37/29 ,  H01J37/141 ,  H01J37/305

CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

公开(公告)号：US09916962B2

公开(公告)日：2018-03-13

申请号：US15466333

申请日：2017-03-22

Applicant: NuFlare Technology, Inc.

Inventor： Shinsuke Nishimura ,  Munehiro Ogasawara ,  Takanao Touya ,  Hirofumi Morita

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492 ,  H01J2237/153

Abstract: A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through a corresponding one of the plural openings; and a plurality of stages of lenses, arranged such that a reduction ratio of multi-beams by at least one lens of a stage before the last stage lens is larger than that of the multi-beams by the last stage lens, to correct distortion of a formed image obtained by forming an image of the aperture array by the multi-beams, and to form the image of the aperture array by the multi-beams at a height position between the last stage lens and a last-but-one stage lens, and at the surface of a target object.

公开(公告)号：US20170213689A1

公开(公告)日：2017-07-27

申请号：US15335448

申请日：2016-10-27

Applicant: ADVANTEST CORPORATION

Inventor： Tomohiko ABE ,  Shinichi KOJIMA

IPC: H01J37/14 ,  H01J37/317

CPC classification number: H01J37/14 ,  H01J37/141 ,  H01J37/3174 ,  H01J2237/002 ,  H01J2237/20285 ,  H01J2237/31774

Abstract: Provided is a charged particle beam lens apparatus having a small size and high resolution, and a charged particle beam column and a charged particle beam exposure apparatus.A charged particle beam lens apparatus includes a lens unit positioned around a through hole through which a charged particle beam travels, where the lens unit is configured to converge or diffuse the charged particle beam, and a supporting unit surrounding the lens unit. Here, at least one of an outer peripheral portion of the lens unit that is in contact with the supporting unit and an inner peripheral portion of the supporting unit that is in contact with the lens unit includes a groove through which a coolant fluid flows along an outer periphery of the lens unit.In this way, the charged particle beam lens apparatus can achieve a small size and high resolution.

公开(公告)号：US20170133198A1

公开(公告)日：2017-05-11

申请号：US15309748

申请日：2015-04-23

Applicant: Technische Universiteit Delft

Inventor： Pieter KRUIT ,  Aernout Christiaan ZONNEVYLLE ,  Yan REN

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/141 ,  H01J37/20

CPC classification number: H01J37/244 ,  H01J37/141 ,  H01J37/20 ,  H01J37/222 ,  H01J37/224 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/24495 ,  H01J2237/2802 ,  H01J2237/2808

Abstract: An apparatus for inspecting a sample includes a sample holder for holding the sample; a multi beam charged particle generator for generating an array of primary charged particle beams; an electro-magnetic lens system for directing the array of primary charged particle beams into an array of separate focused primary charged particle beams on the sample; a multi-pixel photon detector arranged for detecting photons created by the focused primary charged particle beams when the primary charged particle beams impinge on the sample or after transmission of said primary charged particle beams through the sample; and an optical assembly for conveying photons created by at least two adjacent focused primary charged particle beams of the array of separate focused primary charged particle beams to distinct and/or separate pixels or to distinct and/or separate groups of pixels of the multi-pixel photon detector.

公开(公告)号：US09620327B2

公开(公告)日：2017-04-11

申请号：US14978776

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner

IPC: H01J37/00 ,  H01J37/141 ,  H01J37/08 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/141 ,  H01J37/05 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/3171 ,  H01J2237/04922 ,  H01J2237/1415 ,  H01J2237/152

Abstract: A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.

公开(公告)号：US09595359B2

公开(公告)日：2017-03-14

申请号：US14333174

申请日：2014-07-16

Applicant: FEI Company

Inventor： Ondrej Shanel

IPC: H01J37/00 ,  G21K1/093 ,  H01J37/26 ,  H01J37/141 ,  H01F3/10

CPC classification number: G21K1/093 ,  H01F2003/106 ,  H01J37/141 ,  H01J37/26 ,  H01J2237/1415 ,  H01J2237/26 ,  Y10T29/4978

Abstract: A magnetic lens for focusing a beam of charged particles traveling along an optical axis includes an axial bore disposed around said optical axis; magnetic field generating means; and magnetic yoke, to guide and concentrate said magnetic field toward said optical axis so as to form a focusing region, wherein Said yoke has a composite structure, comprising an outer primary portion and an inner secondary portion; Said secondary portion is mounted as a monolithic insert within said primary portion so as to be disposed around said focusing region; Said secondary portion comprises a waist region surrounding said bore and acting as a magnetic constriction, configured such that said magnetic field undergoes saturation in said waist region, thereby causing magnetic flux to exit the waist region and form a focusing field in said focusing region.

Abstract translation: 现有技术的磁性带电粒子透镜显示轭和气隙。 气隙限定了在透镜的光轴上存在磁场的位置。 根据本发明的透镜（10）没有气隙，而是使用饱和的轭（13 + 16）的一部分（15）。 这导致由于磁场的逐渐断开而具有较低球面像差的透镜。 这也消除了现有技术透镜在上部和下部极片之间显示的对准问题。 优选地，饱和的轭的部分是插入件（16），由于较小的尺寸，导致更好的公差，更好的机加工性和更低的成本。 此外，插入件（16）可以显示与磁轭（13）的其余部分不同的磁性。

公开(公告)号：US09543115B2

公开(公告)日：2017-01-10

申请号：US14552607

申请日：2014-11-25

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Gerd Benner ,  Marko Matijevic

IPC: H01J37/00 ,  H01J37/26 ,  H01J37/244 ,  H01J37/141

CPC classification number: H01J37/26 ,  H01J37/141 ,  H01J37/244

Abstract: An electron microscope includes an electron beam source, a first electromagnet, a second electromagnet and a detector. The field generated by the first electromagnet has an effect of three lenses subsequently arranged along the beam path. A first lens of these lenses is arranged upstream of the object plane and focuses the beam at the object plane. The second lens of these three lenses is arranged downstream of the object plane. The third lens of these three lenses generates an image of a diffraction plane of the second lens at the detector. The magnetic field generated by the second electromagnet has an effect of a fourth lens and can be changed in order to change a size of the image of the diffraction plane of the second lens on the detector.

Abstract translation: 电子显微镜包括电子束源，第一电磁体，第二电磁体和检测器。 由第一电磁体产生的场具有随后沿光束路径布置的三个透镜的效果。 这些透镜的第一透镜布置在物平面的上游，并将光束聚焦在物平面处。 这三个透镜的第二透镜布置在物平面的下游。 这三个透镜的第三透镜在检测器处产生第二透镜的衍射平面的图像。 由第二电磁体产生的磁场具有第四透镜的效果，并且可以改变以改变检测器上的第二透镜的衍射平面的图像的尺寸。

公开(公告)号：US20160379797A1

公开(公告)日：2016-12-29

申请号：US14902436

申请日：2014-06-25

Applicant: HITACHI HIGH-TECNOLOGIES CORPORATION

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA ,  Zulihuma YASENJIANG

IPC: H01J37/244 ,  H01J37/141 ,  H01J37/285 ,  H01J37/22

CPC classification number: H01J37/244 ,  H01J37/141 ,  H01J37/145 ,  H01J37/1471 ,  H01J37/22 ,  H01J37/226 ,  H01J37/285 ,  H01J2237/12 ,  H01J2237/14

Abstract: Disclosed is a charged particle beam apparatus wherein charged particles emitted from a sample are efficiently acquired at a position as close as possible to the sample, said position being in the objective lens. This charged particle beam apparatus is provided with: a charged particle beam receiving surface that is provided with a scintillator that emits light by means of charged particles; a photodetector that detects light emitted from the scintillator; a mirror that guides, to the photodetector, the light emitted from the scintillator; and an objective lens for focusing the charged particle beam to a sample. A distance (Lsm) between the charged particle beam receiving surface and the mirror is longer than a distance (Lpm) between the photodetector and the mirror, and the charged particle beam receiving surface, the mirror, and the photodetector are stored in the objective lens.

Abstract translation: 公开了一种带电粒子束装置，其中从样品发射的带电粒子在尽可能靠近样品的位置被有效地获取，所述位置在物镜中。 该带电粒子束装置具有：带电粒子束接收面，其具有通过带电粒子发光的闪烁器; 检测从闪烁体发出的光的光检测器; 向所述光电检测器引导从所述闪烁体发射的光的反射镜; 以及用于将带电粒子束聚焦到样品的物镜。 带电粒子束接收表面和反射镜之间的距离（Lsm）长于光电检测器和反射镜之间的距离（Lpm），并且带电粒子束接收表面，反射镜和光电检测器被存储在物镜 。

公开(公告)号：US20160233049A1

公开(公告)日：2016-08-11

申请号：US15022662

申请日：2014-05-02

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko SASAKI ,  Hiroyuki ITO

IPC: H01J37/153 ,  H01J37/12

CPC classification number: H01J37/153 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J2237/103 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: Provided is a multifunctional charged particle beam device capable of inclining a beam with little aberration. The aberration is corrected by forming a local divergent field with a multipole, parallel current lines, or the like, matching the beam axis with the local divergent field via a conventional rotationally symmetric lens, deflector or astigmatism corrector, and counteracting an aberration occurring from another rotationally symmetric convex lens field.

Abstract translation: 提供了一种能够使几乎没有像差的光束倾斜的多功能带电粒子束装置。 通过用多极，平行电流线等形成局部发散场，通过常规旋转对称透镜，偏转器或像散校正器将光束轴与局部发散场匹配并抵消从另一个发生的像差来校正像差 旋转对称凸透镜场。