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    Tubular permanent magnet used in a multi-electron beam device
    12.
    发明授权
    Tubular permanent magnet used in a multi-electron beam device 有权
    管状永久磁铁用于多电子束装置

    公开(公告)号：US09418815B2

    公开(公告)日：2016-08-16

    申请号：US14271940

    申请日：2014-05-07

    Applicant: PARAM CORPORATION

    Inventor： Hiroshi Yasuda

    IPC: H01J37/30 ,  H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/143 ,  H01J37/317 ,  H01J3/20

    CPC classification number: H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/143 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/1405

    Abstract: There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 201 composed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnet 202 located inside the outer cylinder and polarized along the Z axis direction, a correction coil 204 located inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passage 203 located in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.

    Abstract translation: 提供了一种用于使用永磁体有效地绘制精细图案的装置。 该装置具有由Z轴作为中心轴的圆柱形铁磁体构成的外筒201，位于外筒内部并沿着Z轴方向极化的圆柱形永磁体202，位于筒状永久磁铁内部的校正线圈204， 用于调整由圆柱形永磁体沿Z轴方向产生的磁场强度的圆柱形永磁体的间隙和位于圆柱形永磁体和校正线圈之间的间隙中的冷却剂通道203，用于允许冷却剂 流过其中并控制圆筒形永磁体的温度变化。

    Apparatus with permanent magnetic lenses
    13.
    发明申请
    Apparatus with permanent magnetic lenses 有权
    带永久磁性镜片的设备

    公开(公告)号：US20050236568A1

    公开(公告)日：2005-10-27

    申请号：US11111078

    申请日：2005-04-21

    Applicant: Bart Buijsse ,  Theodorus Bisschops ,  Mark Meuwese

    Inventor： Bart Buijsse ,  Theodorus Bisschops ,  Mark Meuwese

    IPC: H01J37/143 ,  H01J37/147 ,  H01J37/26

    CPC classification number: H01J37/143

    Abstract: The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).

    Abstract translation: 本发明描述了一种粒子光学装置，其被布置成借助于两个粒子光学透镜系统（10,20）来聚焦带电粒子的束（1）。 透镜作用是通过磁场实现的，这些磁场由永磁材料（13,23）产生。 与配备有线圈的磁性透镜相比，在配备永磁材料的透镜的情况下，为了改变光焦度来改变聚焦磁场是不容易的。 在根据本发明的装置中，通过改变光束（1）穿过透镜系统（10,20）的能量来改变透镜系统的光焦度。 这可以通过改变电源的电压来容易地发生（14,24）。

    MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM
    16.
    发明公开
    MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM 审中-公开

    公开(公告)号：US20230207251A1

    公开(公告)日：2023-06-29

    申请号：US18167991

    申请日：2023-02-13

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Stefan Schubert

    IPC: H01J37/147 ,  H01J37/244 ,  H01J37/143

    CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/143 ,  H01J2237/1035 ,  H01J2237/152 ,  H01J2237/153 ,  H01J2237/1502

    Abstract: A multiple particle beam system comprises a magnetic immersion lens and a detection system. A cross-over of the second individual particle beams is provided in the secondary path between the beam switch and the detection system, and a contrast aperture with a central cutout for cutting out the secondary beams is arranged in the region of the cross-over. A contrast correction lens system with a first magnetic contrast correction lens is arranged between the objective lens and the contrast aperture. The contrast correction lens system is configured to generate a magnetic field with an adjustable strength and correct beam tilts of the secondary beams in the cross-over in relation to the optical axis of the multiple particle beam system. It is possible to obtain a more uniform contrast for different individual images and the contrast can be improved overall.

    Counter pole with permanent magnets
    17.
    发明授权
    Counter pole with permanent magnets 有权

    公开(公告)号：US11417493B2

    公开(公告)日：2022-08-16

    申请号：US17127749

    申请日：2020-12-18

    Applicant: FEI Company

    Inventor： Lubomír Tůma

    IPC: H01J37/14 ,  H01J37/143 ,  H01J37/21 ,  H01J37/20 ,  H01J37/145 ,  H01J37/28

    Abstract: A charged particle beam system can include a vacuum chamber, a specimen holder for holding a specimen within the vacuum chamber, and a charged particle column. The charged particle column can include a charged particle source for producing a beam of charged particles along an optical axis and a magnetic immersion lens for focusing the beam of charged particles. The magnetic immersion lens can include a first lens pole disposed adjacent a first surface of the specimen, an excitation coil surrounding the first lens pole, and a counterpole disposed adjacent a second surface of the specimen, the counterpole including one or more magnets disposed on the counterpole.

    CHARGED PARTICLE SOURCE
    18.
    发明申请
    CHARGED PARTICLE SOURCE 有权

    公开(公告)号：US20220068589A1

    公开(公告)日：2022-03-03

    申请号：US17383353

    申请日：2021-07-22

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai LI

    IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/09

    Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

    Charged particle source
    19.
    发明授权
    Charged particle source 有权

    公开(公告)号：US10468227B2

    公开(公告)日：2019-11-05

    申请号：US16042871

    申请日：2018-07-23

    Applicant: Hermes Microvision, Inc.

    Inventor： Shuai Li

    IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/14 ,  H01J37/09

    Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

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