公开(公告)号：US08057146B2

公开(公告)日：2011-11-15

申请号：US12184521

申请日：2008-08-01

Applicant: Paul N. Zeytoonian

Inventor： Paul N. Zeytoonian

IPC: F16B13/04

CPC classification number: H01J37/3171 ,  F16B5/02 ,  F16B37/14 ,  H01J37/09 ,  H01J37/32458 ,  H01J2237/022 ,  H01J2237/032 ,  Y10S411/999 ,  Y10T403/15

Abstract: One embodiment of this fastening apparatus comprises a cap with a passage through the length of the cap. This cap is received by the upper panels of a body. The embodiments of this fastening apparatus may have two or more upper panels that form a recess. The body also has a lower region with a passage. The upper panels are flexible and can translate to retain the cap within the recess. A threaded member is disposed in the passage of the body. This cap may be fabricated of graphite in one instance.

Abstract translation: 该紧固装置的一个实施例包括具有穿过盖的长度的通道的盖。 这个帽子被身体的上部面板所接收。 该紧固装置的实施例可以具有形成凹部的两个或更多个上面板。 身体也有一个较低的区域与通道。 上面板是柔性的并且可以平移以将盖保持在凹部内。 螺纹构件设置在主体的通道中。 在一种情况下，该盖可以由石墨制成。

公开(公告)号：US20100024726A1

公开(公告)日：2010-02-04

申请号：US12184521

申请日：2008-08-01

Applicant: Paul N. ZEYTOONIAN

Inventor： Paul N. ZEYTOONIAN

IPC: C23C16/00 ,  F16B17/00

CPC classification number: H01J37/3171 ,  F16B5/02 ,  F16B37/14 ,  H01J37/09 ,  H01J37/32458 ,  H01J2237/022 ,  H01J2237/032 ,  Y10S411/999 ,  Y10T403/15

Abstract: One embodiment of this fastening apparatus comprises a cap with a passage through the length of the cap. This cap is received by the upper panels of a body. The embodiments of this fastening apparatus may have two or more upper panels that form a recess. The body also has a lower region with a passage. The upper panels are flexible and can translate to retain the cap within the recess. A threaded member is disposed in the passage of the body. This cap may be fabricated of graphite in one instance.

Abstract translation: 该紧固装置的一个实施例包括具有穿过盖的长度的通道的盖。 这个帽子被身体的上部面板所接收。 该紧固装置的实施例可以具有形成凹部的两个或更多个上面板。 身体也有一个较低的区域与通道。 上面板是柔性的并且可以平移以将盖保持在凹部内。 螺纹构件设置在主体的通道中。 在一种情况下，该盖可以由石墨制成。

公开(公告)号：US20050056794A1

公开(公告)日：2005-03-17

申请号：US10688076

申请日：2003-10-17

Applicant: Jonathon Simmons ,  John Shelley ,  Andrew Devaney

Inventor： Jonathon Simmons ,  John Shelley ,  Andrew Devaney

IPC: H01J37/02 ,  H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/023 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/061

Abstract: A kinematic electrode mount is provided for an ion implanter in which an electrode insert member having an electrode body portion which defines an aperture, is inserted into an electrode support frame. In one embodiment, a first kinematic alignment pin of the insert member engages a first, groove-shaped kinematic alignment surface of the electrode support frame to align the first alignment pin in two orthogonal directions relative to the electrode support frame. In addition, a second kinematic alignment pin of the insert member engages a second kinematic alignment surface of the electrode support frame to align the insert member in a rotational orientation relative to the electrode support frame. A plurality of flanges of the insert member engage the electrode support frame to retain the insert member in the aligned position and to electrically couple the electrode insert member to the electrode support frame. A spring positioned between the electrode insert member and the electrode support frame biases the electrode insert member in the aligned and retained position relative to the electrode support frame. In another embodiment, the electrode support frame has alignment pins and the insert member has alignment slots.

Abstract translation: 提供了一种用于离子注入机的运动电极座，其中具有限定孔的电极主体部分的电极插入件被插入到电极支撑框架中。 在一个实施例中，插入构件的第一运动学对准销接合电极支撑框架的第一槽形运动学对准表面，以使第一对准销相对于电极支撑框架在两个正交方向上对齐。 此外，插入构件的第二运动学对准销接合电极支撑框架的第二运动学对准表面，以使插入构件相对于电极支撑框架以旋转取向对准。 插入构件的多个凸缘接合电极支撑框架以将插入构件保持在对准位置并且将电极插入构件电耦合到电极支撑框架。 位于电极插入构件和电极支撑框架之间的弹簧将电极插入构件相对于电极支撑框架偏置在对准和保持位置。 在另一个实施例中，电极支撑框架具有对准销，插入件具有对准槽。

公开(公告)号：US5218262A

公开(公告)日：1993-06-08

申请号：US863640

申请日：1992-04-06

Applicant: Masami Taguchi ,  Charles A. Brantingham

Inventor： Masami Taguchi ,  Charles A. Brantingham

IPC: G01B7/34 ,  G01N27/00 ,  G01Q60/10 ,  G01Q60/16 ,  G01Q70/02 ,  G12B17/02 ,  H01J1/00 ,  H01J37/02 ,  H01J37/28

CPC classification number: G01Q60/16 ,  B82Y35/00 ,  G01Q70/02 ,  H01J1/00 ,  H01J37/02 ,  H01J37/067 ,  H01J2237/032

Abstract: In an electrode assembly, an electrode holder has a forward end thereof affixed coaxially to an electrode tip. An attachment member is affixed to the holder rearwardly of the electrode. A retaining assembly includes an outer cup component, an inner cup component and a magnet therein. An electrical lead is connected to the inner cup component. The electrode assembly fits coaxially into the retaining assembly with the attachment member adjacent to and retained by the magnet. The electrode holder is seated in electrical contact with the inner cup component. The holder, cup components and attachment member are magnetically permeable, and separated in each assembly by insulators, so as to effect an outer magnetic shielding loop and an inner magnetic shielding loop.

公开(公告)号：US11961627B2

公开(公告)日：2024-04-16

申请号：US18326935

申请日：2023-05-31

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: H01J37/30 ,  G21K1/02 ,  G21K5/04 ,  H01J37/12 ,  H01J37/16 ,  H01J37/317

CPC classification number: G21K5/04 ,  G21K1/02 ,  H01J37/12 ,  H01J37/16 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0213 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/0262 ,  H01J2237/032 ,  H01J2237/1207 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/30472

Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US20230402258A1

公开(公告)日：2023-12-14

申请号：US18136448

申请日：2023-04-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yunhwan KIM ,  Dougyong SUNG ,  Namkyun KIM ,  Minsung KIM ,  Youngjin NOH

IPC: H01J37/32 ,  H01L21/683 ,  B33Y80/00

CPC classification number: H01J37/32449 ,  H01J37/32724 ,  H01J37/32568 ,  H01J37/32082 ,  H01L21/6833 ,  B33Y80/00 ,  H01J2237/2007 ,  H01J2237/032 ,  H01J2237/334 ,  H01J2237/2001

Abstract: A plasma processing apparatus includes a process chamber in which a substrate processing process is performed; an electrostatic chuck having a microcavity; a lower electrode disposed to be in contact with a lower surface of the electrostatic chuck; a high-frequency power supply applying high-frequency power to the lower electrode; a conductive supporter disposed to be spaced apart from a lower portion of the lower electrode and grounded thereto; and a discharge suppressor located between the lower electrode and the conductive supporter, having a gas supply flow path forming a portion of a gas supply line, and molded by three dimensional printing, wherein the gas supply flow path has a space portion having a length of 5 mm or less in a direction of an electric field formed by the high-frequency power and connecting upper and lower surfaces of the discharge suppressor.

公开(公告)号：US20230197415A1

公开(公告)日：2023-06-22

申请号：US17993996

申请日：2022-11-25

Applicant: SEMES CO., LTD.

Inventor： In Seong LIM ,  Loung Sue CHANG ,  Jung Yoon YANG ,  Sun Ryum LEE ,  Seung Hoon JEON ,  Kyoung Rae LEE

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32449 ,  H01J37/32568 ,  H01J37/32082 ,  H01L21/6831 ,  H01J2237/032 ,  H01J2237/335

Abstract: The present disclosure relates to a process gas supplying unit configured to uniformly supply a process gas to each region of a substrate when a substrate is treated using plasma, and a substrate treating apparatus including the same. According to the present disclosure, the effect of improving the treating efficiency of the substrate may be obtained by uniformly supplying the process gas.

公开(公告)号：US09991099B2

公开(公告)日：2018-06-05

申请号：US14939659

申请日：2015-11-12

Applicant: Seagate Technology LLC

Inventor： Samuel Lewis Tanaka ,  Christopher L. Platt ,  Thomas Larson Greenberg

IPC: H01J37/32 ,  H01K1/18 ,  C23C16/26 ,  C23C16/50

CPC classification number: H01J37/32568 ,  C23C16/26 ,  C23C16/50 ,  H01J37/3233 ,  H01J37/32403 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32541 ,  H01J2237/032 ,  H01J2237/3321 ,  H01K1/18

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

公开(公告)号：US09966229B2

公开(公告)日：2018-05-08

申请号：US15273864

申请日：2016-09-23

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi Matsumoto

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/032 ,  H01J2237/2007 ,  H01J2237/317

Abstract: In one embodiment, a supporting case includes a lower case member and an upper case member. The mounting substrate is pinched between a lower cylindrical supporting portion and a upper cylindrical supporting portion. Peripheral regions of the mounting substrate that are on a peripheral side with respect to a part pinched between the lower cylindrical supporting portion and the upper cylindrical supporting portion are positioned in a space defined by a bottom plate portion, a lower peripheral-wall portion, and the lower cylindrical supporting portion of the lower case member and a top lid portion, an upper peripheral-wall portion, and the upper cylindrical supporting portion of the upper case member.

公开(公告)号：US09916959B2

公开(公告)日：2018-03-13

申请号：US14397557

申请日：2013-05-21

Applicant: KONINKLIJKE PHILIPS N.V.

Inventor： Marcus Walter Foellmer ,  Zoryana Terletska ,  Stefan Hauttmann

IPC: H01J35/06 ,  H01J35/16 ,  H01J37/06 ,  H01J9/04 ,  H01J1/18 ,  H01J37/065 ,  H01J1/92 ,  H01J35/14

CPC classification number: H01J35/06 ,  H01J1/18 ,  H01J1/92 ,  H01J9/042 ,  H01J35/14 ,  H01J35/165 ,  H01J37/065 ,  H01J2229/4824 ,  H01J2229/4831 ,  H01J2235/06 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2893/0006

Abstract: A cathode for an X-ray tube, an X-ray tube, a system for X-ray imaging, and a method for an assembly of a cathode for an X-ray tube include a filament, a support structure, a body structure, and a filament frame structure. The filament is provided to emit electrons towards an anode in an electron emitting direction, and the filament at least partially includes a helical structure. Further, the filament is held by the support structure which is fixedly connected to the body structure. The filament frame structure is provided for electron-optical focusing of the emitted electrons, and the filament frame structure is provided adjacent to the outer boundaries of the filament. The filament frame structure includes frame surface portions arranged transverse to the emitting direction, and the filament frame structure is held by the support structure.