Abstract:
A charged particle emitting assembly comprises an emitter member (5) for emitting charged particles of one polarity. A tubular shield electrode (6) circumferentially surrounds the emitter member and is held in use at the same polarity as the charged particles. A tubular accelerating electrode (7) is positioned substantially coaxially with the shield electrode (6) and is held in use at the opposite polarity to the shield electrode. The arrangement is such that charged particles from the emitter member (5) initially spread laterally outwardly and then are focused into a beam which passes through the tubular accelerating electrode (7).
Abstract:
An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.
Abstract:
The invention concerns an electron gun for the production of an electron beam designed primarily for welding workpieces and including, in a frame, the mechanical facilities required for holding in a coaxial position and electrically insulating a cathode, a filament, a wehnelt and an anode.Gun featured by the fact that the cathode is held by mechanical systems in the coaxial position via several rods made of conductive material, one end of these rods being rigidly fixed with respect to the frame, the other end being applied against the outer wall of the disc shaped cathode, thus forming a positioning clamp for said cathode.The structure allows for the efficient cooling of the internal parts of the gun.
Abstract:
This invention relates to an electron beam generating source comprising a cathode and anode, the opposite and facing surfaces of the cathode and anode being flat and parallel so that the electrostatic field formed between the two electrodes is parallel and perpendicular to the surfaces of both electrodes, thereby preventing the electrons emitted from the electron emitter from being affected by lens effects, for example, spherical aberration.
Abstract:
A light emitting sealed body includes a housing which stores a discharge gas and is provided with a first opening to which first light is incident and a second opening from which second light is emitted, a first window portion which includes a first window member allowing the first light to be transmitted therethrough and hermetically seals the first opening, and a second window portion which includes a second window member allowing the second light to be transmitted therethrough and hermetically seals the second opening. Each of the first window member and the second window member is hermetically fixed to the housing by a joining material. A protection layer which covers the joining material is provided at at least one of a first joining position between the first window member and the housing and a second joining position between the second window member and the housing.
Abstract:
The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.
Abstract:
Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.
Abstract:
A metal 3D printer, a cathode holder system, a carrier for an electron emitter, and an electron source piece with a thermal break in a mechanical interface are provided. The metal 3D printer has an electron gun adapted to direct an electron beam generated by a back heated electron emitter of a cathode arrangement onto a metal material via an anode arrangement. The back heated electron emitter is capable of emitting electrons via thermionic emission from an emitting surface when heated on a back surface, and includes a side surface, essentially perpendicular to the emitting surface, between the emitting surface and the back surface. The metal 3D printer 100 includes: an electron source piece, including the electron emitter attached to a carrier in such a way that the carrier covers the side surface of the electron emitter adjoining the emitting surface; a cathode holder system including one or more cathode holder system members adapted to hold the electron source piece in a position in relation to an anode arrangement; and a first thermal break in a first mechanical interface adapted to mate an emitter holder of the cathode holder system with the electron source piece.
Abstract:
A permanently sealed vacuum tube is used to provide the electrons for an electron microscope. This advantageously allows use of low vacuum at the sample, which greatly simplifies the overall design of the system. There are two main variations. In the first variation, imaging is provided by mechanically scanning the sample. In the second variation, imaging is provided by point projection. In both cases, the electron beam is fixed and does not need to be scanned during operation of the microscope. This also greatly simplifies the overall system.