公开(公告)号：US20170236684A1

公开(公告)日：2017-08-17

申请号：US15422936

申请日：2017-02-02

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

公开(公告)号：US20170146787A1

公开(公告)日：2017-05-25

申请号：US15243235

申请日：2016-08-22

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Bryan W. Reed

IPC: G02B21/36 ,  G06T11/00 ,  H01J37/22

CPC classification number: G02B21/365 ,  G01N23/225 ,  G06T11/003 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/24455 ,  H01J2237/262 ,  H01J2237/2802

Abstract: Methods and systems for temporal compressive sensing are disclosed, where within each of one or more sensor array data acquisition periods, one or more sensor array measurement datasets comprising distinct linear combinations of time slice data are acquired, and where mathematical reconstruction allows for calculation of accurate representations of the individual time slice datasets.

公开(公告)号：US09653257B2

公开(公告)日：2017-05-16

申请号：US15058062

申请日：2016-03-01

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears ,  Ben Clarke

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/004 ,  H01J2237/153 ,  H01J2237/226

Abstract: A scanning electron microscopy system for mitigating charging artifacts includes a scanning electron microscopy sub-system for acquiring multiple images from a sample. The images include one or more sets of complementary images. The one or more sets of complementary images include a first image acquired along a first scan direction and a second image acquired along a second scan direction opposite to the first scan direction. The system includes a controller communicatively coupled to the scanning electron microscopy sub-system. The controller is configured to receive images of the sample from the scanning electron microscopy sub-system. The controller is further configured to generate a composite image by combining the one or more sets of complementary images.

公开(公告)号：US20170125209A1

公开(公告)日：2017-05-04

申请号：US15243753

申请日：2016-08-22

Applicant: FEI Company

Inventor： Jeroen De Boeij ,  Johannes Antonius Maria Van den Oetelaar ,  Albert Visscher

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/24 ,  H01J37/20 ,  H01J37/226 ,  H01J37/244 ,  H01J37/265 ,  H01J37/268 ,  H01J2237/0216

Abstract: A method of using a Charged Particle Microscope comprising: A specimen holder, connected to a positioning stage, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation, comprising the following steps: Providing the microscope with an interferential optical position sensor for determining a position of said specimen holder relative to a reference; Providing an automatic controller with a time-dependent position signal from said optical position sensor; Invoking said controller to use said signal to produce a vibration profile for the microscope.

公开(公告)号：US20170018403A1

公开(公告)日：2017-01-19

申请号：US14801600

申请日：2015-07-16

Applicant: Applied Materials Israel Ltd.

Inventor： Dan Koronel

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/28 ,  H01J2237/2817

Abstract: A method, computer product and system for optimization of configurable parameters of inspection tools are provided. The method includes applying a heuristic that utilizes a prioritized sequence of selections of configurable parameters. For each configuration setting of the heuristic the method includes providing a set of local scan images of a list of DOIs, calculating an optimization target function and updating the configuration settings with the best value of each scanned parameter according to said prioritization heuristic. The method includes outputting the one or more updated configuration settings to a recipe file.

Abstract translation: 提供了一种优化检测工具可配置参数的方法，计算机产品和系统。 该方法包括应用启发式算法，其利用可配置参数的优先选择序列。 对于启发式的每个配置设置，该方法包括提供DOI列表的一组本地扫描图像，根据所述优先级启发式算法，利用每个扫描参数的最佳值来更新配置设置。 该方法包括将一个或多个更新的配置设置输出到配方文件。

公开(公告)号：US09536697B2

公开(公告)日：2017-01-03

申请号：US14716385

申请日：2015-05-19

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Jian Zhang ,  Yan Zhao

IPC: G01N23/00 ,  H01J37/02 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/026 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/024

Abstract: This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

Abstract translation: 本发明提供一种用于在真空环境中校准电荷调节模块的系统和方法。 用于安装充电调节模块的装置向充电调节模块提供运动，使得由样品表面上的充电调节模块照亮的束斑可以移动到由充电微粒照射的预定位置 光束。

公开(公告)号：US20160343534A1

公开(公告)日：2016-11-24

申请号：US14716385

申请日：2015-05-19

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Jian Zhang ,  Yan Zhao

IPC: H01J37/02 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/026 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0047 ,  H01J2237/024

Abstract: This invention provides a system and a method for calibrating charge-regulation module in vacuum environment. Means for mounting the charge-regulation module provides motions to the charge-regulation module such that a beam spot, illuminated by the charge-regulation module, on a sample surface can be moved to a pre-determined position which is irradiated by a charged particle beam.

Abstract translation: 本发明提供一种用于在真空环境中校准电荷调节模块的系统和方法。 用于安装充电调节模块的装置向充电调节模块提供运动，使得由样品表面上的充电调节模块照亮的束斑可以移动到由充电微粒照射的预定位置 光束。

公开(公告)号：US09502212B2

公开(公告)日：2016-11-22

申请号：US14760259

申请日：2014-01-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuzuru Mizuhara ,  Miki Isawa ,  Minoru Yamazaki ,  Hitoshi Tamura ,  Hideyuki Kazumi

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/268 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/265 ,  H01J37/266 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/24564 ,  H01J2237/28 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.

Abstract translation: 本发明的目的是提供一种能够通过使用带电粒子束来测量样品表面的电位或检测由于样品充电而发生变化的装置状态的变化的补偿值的方法和装置， 通过测量由带电粒子束的照射引起的样品电位。 为了实现该目的，提供了一种方法和装置，其中从样品（23）发射的带电粒子束（2（a），2（b））由带电粒子偏转器（33）在某种状态下偏转 其中样品（23）被带电粒子束（1）照射，并且通过使用当时获得的信号来检测关于样品电位的信息。

公开(公告)号：US09478389B2

公开(公告)日：2016-10-25

申请号：US14422374

申请日：2013-07-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/305 ,  H01J37/317 ,  H01J37/26 ,  H01J37/141 ,  H01J37/16 ,  H01J37/30

CPC classification number: H01J37/10 ,  H01J37/1413 ,  H01J37/1471 ,  H01J37/16 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0245 ,  H01J2237/032 ,  H01J2237/12 ,  H01J2237/31745

Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.

Abstract translation: 本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。 本发明具有以下结构。 复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置， 多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

公开(公告)号：US09466463B1

公开(公告)日：2016-10-11

申请号：US14085768

申请日：2013-11-20

Applicant: Mutibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Enden David Liu ,  Cong Tran ,  Theodore A. Prescop

IPC: H01J49/00 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/292 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30494 ,  H01J2237/31761

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

Abstract translation: 本申请公开了使用带电粒子束工具来使用矢量化的组合来检测和执行光刻的方法，系统和装置，以将光束移动到要成像的特征，以及光栅扫描以获得特征的图像 ）。 本发明人已经发现，使用额外的步骤是非常有利的，快速光栅扫描以较低的分辨率对衬底进行成像，以确定哪些特征接受检查的优先级; 这个额外的步骤可以减少总检查时间，增强检测结果，并提高光束对准和制造产量。 使用多个光束产生色谱柱，多个控制计算机在本地列，提供了各种协同作用。 优选地，使用微型，非磁性，静电驱动的列。