公开(公告)号：US09646803B2

公开(公告)日：2017-05-09

申请号：US15073296

申请日：2016-03-17

Applicant: The United States of America, as represented by the Secretary of the Navy

Inventor： David A. Kidwell

IPC: H01J37/20 ,  H01J37/26 ,  C23C16/01 ,  C23C16/40 ,  G01N1/28

CPC classification number: H01J37/26 ,  C23C16/01 ,  C23C16/403 ,  C23C16/45555 ,  G01N1/28 ,  H01J37/20

Abstract: A method of making a Transmission Electron Microscopy support comprising depositing a sacrificial layer to the top side of a lacey or holey carbon structure or support or wire mesh, depositing an Atomic Layer Deposition layer to the bottom side of the sacrificial layer, removing the sacrificial layer, forming a Transmission Electron Microscopy support. The Transmission Electron Microscopy support comprises an Atomic Layer Deposition layer which is carbon-less, thin, flexible, can be thermally cleaned, can be plasma cleaned, and contains chemical functionalities to immobilize particles.

公开(公告)号：US20170076910A1

公开(公告)日：2017-03-16

申请号：US15364060

申请日：2016-11-29

Applicant: ICT Integrated Circuit Testing Gesellscaft für Halbleiterprüftechnik mbH

Inventor： Matthias Firnkes ,  Stefan Lanio ,  Dieter Winkler

IPC: H01J37/244 ,  H01J37/12 ,  H01J37/145 ,  H01J37/09

CPC classification number: H01J37/244 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J37/09 ,  H01J37/12 ,  H01J37/145 ,  H01J37/222 ,  H01J37/26 ,  H01J2237/0453 ,  H01J2237/1202 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592

Abstract: A secondary charged particle imaging system for imaging a secondary charged particle beam emanating from a sample by impingement of a primary charged particle beam is provided. The system includes a detector arrangement, and an adaptive secondary charged particle optics. The detector arrangement comprises a first detection element for detecting a first secondary charged particle sub-beam of the secondary charged particle beam, and a second detection element for detecting a second secondary charged particle sub-beam of the secondary charged particle beam. The adaptive secondary charged particle optics comprises an aperture plate including a first opening for letting the first secondary charged particle sub-beam pass through and a second opening for letting the second secondary charged particle sub-beam pass through; a lens system for mapping the secondary charged particle beam onto the aperture plate, the lens system comprising a first lens and a second lens; and a controller for controlling the excitation of the first lens and the excitation of the second lens. The controller is configured to independently control the excitation of the first lens and of the second lens to map the secondary charged particle beam onto the aperture plate so that the first secondary charged particle sub-beam passes through the first opening and the second secondary charged particle sub-beam passes through the second opening independent of a variation of at least one first operating parameter selected from a group comprising: landing energy of the primary charged particle beam on the sample, extraction field strength for the secondary charged particle beam at the sample, magnetic field strength of an objective lens that focuses the primary charged particle beam onto the sample, and working distance of the objective lens from the sample.

Abstract translation: 提供了二次带电粒子成像系统，用于通过冲击一次带电粒子束来从样品发射的二次带电粒子束成像。 该系统包括检测器装置和自适应二次带电粒子光学器件。 检测器装置包括用于检测次级带电粒子束的第一次级带电粒子子光束的第一检测元件和用于检测次级带电粒子束的第二次级带电粒子子光束的第二检测元件。 自适应二次带电粒子光学器件包括孔板，该孔板包括用于使第一次级带电粒子子光束通过的第一开口和用于使第二次级带电粒子子光束通过的第二开口; 用于将二次带电粒子束映射到孔板上的透镜系统，所述透镜系统包括第一透镜和第二透镜; 以及用于控制第一透镜的激发和第二透镜的激发的控制器。 控制器被配置为独立地控制第一透镜和第二透镜的激发，以将次级带电粒子束映射到孔板上，使得第一次级带电粒子子光束穿过第一开口和第二次级带电粒子 子光束通过第二开口，独立于至少一个第一操作参数的变化，所述至少一个第一操作参数选自包括：样品上的初级带电粒子束的着陆能量，样品处的次级带电粒子束的提取场强度， 将初级带电粒子束聚焦到样品上的物镜的磁场强度以及物镜与样品的工作距离。

公开(公告)号：US20170025248A1

公开(公告)日：2017-01-26

申请号：US15151792

申请日：2016-05-11

Applicant: The University of Tokyo ,  JEOL Ltd.

Inventor： Naoya Shibata ,  Yuji Kohno ,  Hidetaka Sawada

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/09 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/226 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578 ,  H01J2237/2614 ,  H01J2237/2802

Abstract: An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).

Abstract translation: 提供了一种电子显微镜，其能够以高灵敏度和高位置分辨率测量当透射通过样品时发生的电子束的偏转量。 电子显微镜（100）适于测量电子束（EB）在透过样品（S）时的偏转量，并具有产生电子束（EB）的电子束源（10）， 用于将电子束（EB）聚焦到样品（S）上的照明透镜系统，具有用于在中心部分（EB1）和外周部分（EB2）之间提供屏蔽的电子束阻挡部分（32）的孔（30） （EB））和分段检测器（20），其具有用于检测通过样品（S）传输的电子束（EB）的检测表面（22）。 检测表面（22）被分成多个检测器段（D1-D4）。

公开(公告)号：US20160365224A1

公开(公告)日：2016-12-15

申请号：US15177242

申请日：2016-06-08

Applicant: FEI Company

Inventor： Pavel Potocek ,  Faysal Boughorbel ,  Mathijs Petrus Wilhelmus van den Boogaard ,  Emine Korkmaz

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/244 ,  H01J37/26 ,  H01J37/20

CPC classification number: H01J37/3005 ,  G01N1/286 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/304 ,  H01J37/3056 ,  H01J37/317 ,  H01J2237/2067 ,  H01J2237/221 ,  H01J2237/24495

Abstract: A method of investigating a specimen using a charged particle microscope, including: Producing and storing a first image, of a first, initial surface of the specimen; In a primary modification step, modifying said first surface, thereby yielding a second, modified surface; Producing and storing a second image, of said second surface; Using a mathematical Image Similarity Metric to perform pixel-wise comparison of said second and first images, so as to generate a primary figure of merit for said primary modification step.

公开(公告)号：US09508521B2

公开(公告)日：2016-11-29

申请号：US14328754

申请日：2014-07-11

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

IPC: H01J27/00 ,  H01J27/02 ,  H01J27/26 ,  H01J37/02 ,  H01J37/067 ,  H01J37/08 ,  H01J37/28 ,  H01J37/26

CPC classification number: H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

Abstract translation: 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

公开(公告)号：US20160343536A1

公开(公告)日：2016-11-24

申请号：US15112716

申请日：2015-01-21

Applicant: Ramot at Tel-Aviv University Ltd.

Inventor： Roy SHILOH ,  Yossi LEREAH ,  Ady ARIE

IPC: H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2614

Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.

Abstract translation: 公开了一种操纵电子束的方法。 该方法包括通过所选择的相位掩模发射光束以在其横截面上空间调制光束的相位。

公开(公告)号：US09484182B2

公开(公告)日：2016-11-01

申请号：US14422423

申请日：2013-08-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hisanao Akima ,  Takaho Yoshida

IPC: H01J37/00 ,  H01J37/153 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/216 ,  H01J2237/2614

Abstract: The present invention provides a method and apparatus for correcting an aberration in a charged-particle-beam device. The apparatus includes a charged-particle-beam source, a charged-particle optical system that irradiates a specimen with charged particles emitted from the charged-particle-beam source, an aberration corrector that corrects an aberration of the charged-particle optical system, a control unit that controls the charged-particle optical system and the aberration corrector, a through-focus imaging unit that obtains plural Ronchigrams in which a focal position of the charged-particle optical system is changed, and an aberration calculation unit that divides the obtained Ronchigram into plural local areas, and calculates the amount of the aberration based on line focuses detected in the local areas.

Abstract translation: 本发明提供了一种用于校正带电粒子束装置中的像差的方法和装置。 该装置包括带电粒子束源，从带电粒子束源发射的带电粒子照射样本的带电粒子光学系统，校正带电粒子光学系统的像差的像差校正器， 控制所述带电粒子光学系统的控制单元和所述像差校正器，获得所述带电粒子光学系统的焦点位置被改变的多个Ronchigram的通过焦点摄像单元，以及将获得的Ronchigram 进入多个局部区域，并且基于在局部区域中检测到的线焦点来计算像差量。

公开(公告)号：US09466460B2

公开(公告)日：2016-10-11

申请号：US14891494

申请日：2014-03-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Taku Sakazume ,  Sukehiro Ito

IPC: H01J37/26 ,  G01N23/04 ,  H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US09460889B2

公开(公告)日：2016-10-04

申请号：US14110758

申请日：2012-04-11

Applicant: Kenji Nakahira ,  Atsushi Miyamoto

Inventor： Kenji Nakahira ,  Atsushi Miyamoto

IPC: H01J37/00 ,  H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24495 ,  H01J2237/2809

Abstract: A specimen image capture method using a charged particle microscope device includes: a first image acquisition step in which the gain of a detector in a charged particle microscope is set to a first gain value, charged particle beam scanning is carried out on a specimen, and a first image is obtained; a second image acquisition step in which the gain of the detector is set to a second gain value, which is different to the first gain value, charged particle beam scanning is carried out on the specimen, and a second image is obtained; and an image combination step in which the first gain value and the second gain value are used and the first image and the second image are combined.

Abstract translation: 使用带电粒子显微镜装置的标本图像捕获方法包括：第一图像获取步骤，其中将带电粒子显微镜中的检测器的增益设置为第一增益值，对样本进行带电粒子束扫描， 获得第一个图像; 第二图像获取步骤，其中检测器的增益被设置为与第一增益值不同的第二增益值，对样本进行带电粒子束扫描，并获得第二图像; 以及其中使用第一增益值和第二增益值并且组合第一图像和第二图像的图像组合步骤。

公开(公告)号：US20160276126A1

公开(公告)日：2016-09-22

申请号：US15171913

申请日：2016-06-02

Applicant: Technische Universiteit Delft

Inventor： Hendrik Willem Zandbergen

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J2237/2001 ,  H01J2237/20207 ,  H01J2237/26 ,  H01J2237/2802

Abstract: A low specimen drift holder and cooler for use in microscopy, and a microscope comprising said holder. The present invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy (EM and FIB). However it application is extendable in principle to any field of microscopy, especially wherein a specimen is cooled or needs cooling.

Abstract translation: 用于显微镜的低试样漂移支架和冷却器，以及包括所述支架的显微镜。 本发明在显微镜领域，特别是在电子和聚焦离子束显微镜（EM和FIB）领域。 然而，其应用原则上可扩展到任何显微镜领域，特别是其中样品被冷却或需要冷却。