公开(公告)号：US20030188683A1

公开(公告)日：2003-10-09

申请号：US10115879

申请日：2002-04-04

Applicant: DIELECTRIC SYSTEMS, INC.

Inventor： Chung J. Lee ,  Oanh Nguyen ,  Atul Kumar

IPC: C23F001/00 ,  C23C014/00

CPC classification number: B05D1/60 ,  B01J19/123 ,  B01J2219/0879 ,  B05D3/061

Abstract: An improved reactor to facilitate new precursor chemistries and transport polymerization processes that are useful for preparations of low null (dielectric constant) films. An improved TP Reactor that consists of UV source and a fractionation device for chemicals is provided to generate useful reactive intermediates from precursors. The reactor is useful for the deposition system.

Abstract translation: 改进的反应器以促进新的前体化学和运输聚合方法，其可用于制备低ε（介电常数）膜。 提供由UV源和用于化学品的分馏装置组成的改进的TP反应器以从前体产生有用的反应性中间体。 该反应器可用于沉积系统。

公开(公告)号：US20030035967A1

公开(公告)日：2003-02-20

申请号：US10171685

申请日：2002-06-17

Applicant: Roche Diagnostics GMBH

Inventor： Franz Effenberger

IPC: B05D003/06 ,  B32B015/04

CPC classification number: B82Y30/00 ,  B05D1/185 ,  B05D3/061 ,  B82Y40/00 ,  H01L21/31 ,  Y10T428/12007 ,  Y10T428/31678 ,  Y10T436/25

Abstract: The invention concerns a process for coating a metallic or semimetallic surface in which coating molecules containing reactive groups are bound covalently to the surface by irradiation with light and it also concerns a structured coated surface.

公开(公告)号：US06344244B1

公开(公告)日：2002-02-05

申请号：US09433547

申请日：1999-11-04

Applicant: Wolfgang Schrof ,  Reinhold Schwalm ,  Erich Beck ,  Uwe Meisenburg

Inventor： Wolfgang Schrof ,  Reinhold Schwalm ,  Erich Beck ,  Uwe Meisenburg

IPC: C08F248

CPC classification number: B05D3/061

Abstract: The present invention relates to a method of producing at cast one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.

Abstract translation: 本发明涉及一种在基材表面的至少一个区域上生产浇铸的一个涂膜的方法，该方法至少包括以下顺序的以下步骤：a）在至少一种反应性涂料中引发至少一种交联反应 制剂; b）在所述至少一个交联反应开始之前，在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。 本发明还涉及在衬底表面的至少一个区域上产生至少一个涂膜的相应方法，其至少具有以下元素：a）至少一个用于至少一种反应性涂料配方的储存容器，b） 至少一个曝光单元，优选UV曝光单元，更优选UV激光，以及c）至少一个具有喷嘴，特别是喷头的应用单元和/或用于静电应用的钟（ESTA钟）），其中 所述至少一个曝光单元被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个应用单元中的所述至少一个反应性涂料配方接触。 最后还要求的是可以通过本发明的方法生产的涂膜。

公开(公告)号：US4781942A

公开(公告)日：1988-11-01

申请号：US810810

申请日：1985-12-19

Applicant: Richard N. Leyden ,  James T. Hall

Inventor： Richard N. Leyden ,  James T. Hall

IPC: B05D3/06 ,  B05D7/24 ,  C09D4/00 ,  G03F7/16 ,  H01L21/312 ,  C08G77/12

CPC classification number: B05D1/60 ,  B05D3/061 ,  C09D4/00 ,  G03F7/167 ,  H01L21/3121 ,  Y10S522/914 ,  Y10T428/31663

Abstract: A process for forming on the surface of a substrate a layer of a siloxane polymer by exposing the substrate to a first vapor phase monomer precursor having the formula SiR.sub.x H.sub.4-x where x is 1 to 4 and R is alkyl or phenyl, and a second vapor phase oxygen-containing precursor in the presence of radiation of a predetermined wavelength to bring about the reaction to form the siloxane polymer which deposits on the surface of substrate. The monomer precursor may comprise a mixture, such as SiRH.sub.3 and SiR.sub.2 H.sub.2 with each other or with SiR.sub.3 H. By varying the composition of such mixtures, the composition of the siloxane polymer may be chosen to provide predetermined properties, and, further, may be varied throughout the thickness of the deposited layer.

Abstract translation: 通过将基底暴露于具有式SiRxH4-x的第一气相单体前体（其中x为1至4，R为烷基或苯基）和第二蒸气（第二蒸气），在基底表面上形成硅氧烷聚合物层 在预定波长的辐射存在下，使相含氧的前体进行反应以形成沉积在基材表面上的硅氧烷聚合物。 单体前体可以包含彼此或SiR 3 H的混合物，例如SiRH 3和SiR 2 H 2。 通过改变这种混合物的组成，可以选择硅氧烷聚合物的组成以提供预定的性质，并且还可以在沉积层的整个厚度上变化。

公开(公告)号：US4731255A

公开(公告)日：1988-03-15

申请号：US780205

申请日：1985-09-26

Applicant: Kazuo Maeda ,  Noboru Tokumasu ,  Toshihiko Fukuyama ,  Tsugiaki Hirata

Inventor： Kazuo Maeda ,  Noboru Tokumasu ,  Toshihiko Fukuyama ,  Tsugiaki Hirata

IPC: B05D3/06 ,  B05D7/24 ,  C23C16/44 ,  C23C16/455 ,  C23C16/48 ,  C30B25/10 ,  C30B25/14

CPC classification number: C23C16/45504 ,  B05D1/60 ,  C23C16/455 ,  C23C16/482 ,  C23C16/488 ,  C30B25/105 ,  C30B25/14 ,  B05D3/061

Abstract: A gas-phase growth process for growing films of uniform thickness or having a prescribed pattern form or growing films sequentially onto a substrate and an apparatus related thereto. The films are grown by allowing an inert gas to flow over a reaction gas flow in parallel to the surface of the substrate. Optionally, the substrate surface could be irradiated by a UV light source which is directed from above the inert gas toward the substrate surface.

Abstract translation: 用于生长均匀厚度的膜或具有规定图案形式的膜或顺序生长膜到基板上的气相生长工艺和与其相关的装置。 通过使惰性气体平行于衬底的表面流过反应气体流而生长膜。 任选地，可以通过从惰性气体上方向衬底表面引导的UV光源照射衬底表面。

公开(公告)号：US20240012354A1

公开(公告)日：2024-01-11

申请号：US18348453

申请日：2023-07-07

Applicant: CANON KABUSHIKI KAISHA

Inventor： KYOHEI KIKUCHI ,  MASAMI HANO ,  YOSHIRO TSUKADA ,  TOSHIYUKI YAMADA ,  SHINGO HIROTA ,  TARO HANAZATO ,  DAISUKE KATAYAMA

IPC: G03G15/20 ,  G03G9/09 ,  G03G9/12 ,  G03G15/04 ,  B05D3/06

CPC classification number: G03G15/2098 ,  G03G9/0904 ,  G03G9/122 ,  G03G15/04018 ,  B05D3/061 ,  G03G2215/2074 ,  B05D2501/00

Abstract: An image forming system includes an image forming unit including a first photosensitive member, a first developing unit, a second photosensitive member, a second developing unit, a third photosensitive member, a third developing unit, a fourth photosensitive member, and a fourth developing unit, a varnish applying unit; an irradiation unit; and a controller configured to control image formation by the image forming unit to form a black image, on which the varnish is superimposed, with the yellow toner, the magenta toner, and the cyan toner.

公开(公告)号：US11660379B2

公开(公告)日：2023-05-30

申请号：US17701421

申请日：2022-03-22

Applicant: Cardiac Pacemakers, Inc.

Inventor： David R. Wulfman ,  Danielle Frankson ,  Adeniyi O. Aremu ,  Angelo Fruci ,  Gregory J. Sherwood ,  Mary M. Byron ,  Joseph T. Delaney, Jr. ,  Adam McGraw

IPC: A61L24/00 ,  B05D3/00 ,  A61L29/16 ,  A61L31/06 ,  A61L31/04 ,  A61L31/10 ,  B05D3/06 ,  B05D3/10 ,  A61F2/30 ,  A61L27/28 ,  B05D3/02

CPC classification number: A61L29/16 ,  A61F2/30767 ,  A61L27/28 ,  A61L31/046 ,  A61L31/06 ,  A61L31/10 ,  B05D3/007 ,  B05D3/061 ,  B05D3/108 ,  A61F2002/30677 ,  A61L2300/606 ,  A61L2400/12 ,  A61L2420/02 ,  A61M2207/00 ,  B05D3/0254 ,  B05D2518/00 ,  A61L31/10 ,  C08L71/02 ,  A61L31/06 ,  C08L75/04 ,  A61L31/046 ,  C08L27/12

Abstract: An implantable medical device includes a polymer substrate and at least one nanofiber. The polymer substrate includes a surface portion extending into the polymer substrate from a surface of the substrate. The at least one nanofiber includes a first portion and a second portion. The first portion is interpenetrated with the surface portion of the substrate, and mechanically fixed to the substrate. The second portion projects from the surface of the substrate.

公开(公告)号：US10018920B2

公开(公告)日：2018-07-10

申请号：US15061860

申请日：2016-03-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Shu-Hao Chang ,  Kuo-Chang Kau ,  Kevin Huang ,  Jeng-Horng Chen

IPC: G03F7/004 ,  G03F7/11 ,  G03F7/20 ,  G03F7/16 ,  G03F7/38 ,  G03F7/40 ,  B05D1/00 ,  B05D3/06 ,  H01L21/027 ,  H01L21/311 ,  H01L21/687 ,  H01L21/02

CPC classification number: G03F7/70341 ,  B05D1/60 ,  B05D3/06 ,  B05D3/061 ,  B05D3/068 ,  G03F7/0042 ,  G03F7/038 ,  G03F7/11 ,  G03F7/167 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2037 ,  G03F7/2039 ,  G03F7/38 ,  G03F7/40 ,  G03F7/70325 ,  H01L21/02118 ,  H01L21/02277 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/0277 ,  H01L21/31111 ,  H01L21/31133 ,  H01L21/31144 ,  H01L21/687 ,  H01L21/68764

Abstract: Disclosed is a method for lithography patterning. The method includes providing a substrate, forming a deposition enhancement layer (DEL) over the substrate, and flowing an organic gas near a surface of the DEL. During the flowing of the organic gas, the method further includes irradiating the DEL and the organic gas with a patterned radiation. Elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL. The method further includes etching the DEL with the resist pattern as an etch mask, thereby forming a patterned DEL.

公开(公告)号：US20180126415A1

公开(公告)日：2018-05-10

申请号：US15863222

申请日：2018-01-05

Applicant: Airbus Defence and Space GmbH

Inventor： Tobias STROBL ,  Dominik RAPS ,  Khalid ZAHOUILY ,  Gerard RIESS

IPC: B05D3/06 ,  C09D5/00 ,  B05D5/08 ,  C09D4/06

CPC classification number: B05D3/061 ,  B05D5/08 ,  B64D15/00 ,  C08F2222/1086 ,  C09D4/00 ,  C09D4/06 ,  C09D5/00 ,  C09D7/63 ,  F03D80/40 ,  C08F220/18

Abstract: The disclosure herein provides an active anti-ice coating, which is capable of releasing an anti-ice agent, which includes anti-ice agent reservoirs, which are embedded in a UV curable matrix material, for providing an effective anti-ice coating with an active anti-ice agent release over a long period of time.

公开(公告)号：US20180108444A1

公开(公告)日：2018-04-19

申请号：US15294972

申请日：2016-10-17

Applicant: Ultra V Coating, LLC

Inventor： Shawn A. Coons

IPC: G21F3/00 ,  B05D3/06

CPC classification number: B05D3/061 ,  E04F15/12 ,  F26B3/28 ,  G02B6/00 ,  G05D1/0236

Abstract: An Ultraviolet light inhibiting apparatus is adapted to be attached to a UV curing device on a front-right or front-left portion of the UV curing device. When attached, the UV light inhibiting apparatus shields at least a portion of UV light illuminated from UV bulbs of the UV curing device.