公开(公告)号：JP2005142566A

公开(公告)日：2005-06-02

申请号：JP2004319980

申请日：2004-11-04

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can satisfactorily supply filler gas, and to provide a method of manufacturing device. SOLUTION: The lithographic apparatus comprises a lighting system which provides a projected radiant beam; an article support which supports a flat article to be disposed in the optical path of the projected radiant beam, and comprises a plurality of supporting projections for demarcating a supporting area for providing a flat supporting surface; and a filler gas feeder which is disposed in the supporting area and, when the article is supported by the article support, provides a flow of the filler gas to the back of the article for improving the thermal conduction between the article and article support. Since the supporting area is surrounded by a boundary area which is lower in height than the flat supporting surface, the flow of the filler gas is not restrained by the supporting area. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供可以令人满意地供应填充气体的光刻设备，并提供一种制造装置的方法。 光刻设备包括提供投射的辐射束的照明系统; 一种支撑物件，其支撑待投影的辐射束的光路中的平坦物品，并且包括多个用于划定用于提供平坦支撑表面的支撑区域的支撑突起; 以及填充气体供给器，其布置在支撑区域中，并且当制品由物品支撑件支撑时，将填充气体流提供到制品的背面，以改善物品和物品支撑件之间的热传导。 由于支撑区域被高度比平坦支撑表面低的边界区域包围，所以填充气体的流动不受支撑区域的约束。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343097A

公开(公告)日：2004-12-02

申请号：JP2004125677

申请日：2004-04-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： GILLISEN NOUD JAN ,  OTTENS JOOST JEROEN ,  VEN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a carrier which supports a lithographic substrate separately from a lithography patterning device. SOLUTION: A carrier (10) is equipped with a first member (11). An open hollow structure that is open toward at least one side of the first member (11) is provided. The carrier (10) also has a second member (12) connected to the first member (11). Thus, a closed, hollow inside structure is formed between the first and second members (11 and 12). COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：WO2005057280A3

公开(公告)日：2006-02-02

申请号：PCT/NL2004000826

申请日：2004-11-29

Applicant: ASML NETHERLANDS BV ,  VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

Inventor： VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

CPC classification number: H01L21/67259 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/7075

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

Abstract translation: 公开了一种光刻设备。 光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。 物品处理器包括电极和电介质层，以便形成用于静电夹紧物品的静电夹。

公开(公告)号：WO2005064400A3

公开(公告)日：2006-03-09

申请号：PCT/EP2004014481

申请日：2004-12-20

Applicant: ASML NETHERLANDS BV ,  SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

Inventor： SMITS PETER ,  SMULDERS PATRICK JOHANNES CORN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  COX HENRIKUS HERMAN MARIE ,  OTTENS JOOST JEROEN ,  GILISSEN NOUD JAN ,  STARREVELD JEROEN

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

CPC classification number: G03F7/70783

Abstract: A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system (100) for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck (120) for supporting the object, a frame (110) for supporting the chuck, and a chuck support structure (114) for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element (130), which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

Abstract translation: 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统（100）。 卡盘系统包括用于支撑物体的卡盘（120），用于支撑卡盘的框架（110）和用于相对于框架支撑卡盘的卡盘支撑结构（114）。 卡盘支撑结构包括至少一个挠曲元件（130），该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。

公开(公告)号：NL2008272A

公开(公告)日：2012-09-11

申请号：NL2008272

申请日：2012-02-10

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

IPC: G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

公开(公告)号：NL2006714A

公开(公告)日：2011-12-08

申请号：NL2006714

申请日：2011-05-04

Applicant: ASML NETHERLANDS BV

Inventor： RIJDT HANS ,  OTTENS JOOST JEROEN ,  VERMEULEN MARCUS ,  MANDERS ERIK JOHANNES ANTONIUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：DE60319087T2

公开(公告)日：2009-02-05

申请号：DE60319087

申请日：2003-10-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).

公开(公告)号：SG143241A1

公开(公告)日：2008-06-27

申请号：SG2007184781

申请日：2007-12-10

Applicant: ASML NETHERLANDS BV

Inventor： HENNUS PIETER RENAAT MARIA ,  FRITS VAN DER MEULEN ,  OTTENS JOOST JEROEN ,  STEIJAERT PETER PAUL ,  STEIJNS HUBERT MATTHIEU RICHAR ,  PETER SMITS

Abstract: Substrate support and lithographic process A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler, arranged in the peripheral part, configured to arranged to decrease heat transport between the central part and the peripheral part.

公开(公告)号：DE60319087D1

公开(公告)日：2008-03-27

申请号：DE60319087

申请日：2003-10-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).

公开(公告)号：SG133580A1

公开(公告)日：2007-07-30

申请号：SG2006090682

申请日：2006-12-27

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN

Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.