公开(公告)号：DE60315177D1

公开(公告)日：2007-09-06

申请号：DE60315177

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY D ,  BEHAVE MANDER R ,  DESHPANDE SHREERAM V ,  NOWAK KELLY A

IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：AT368060T

公开(公告)日：2007-08-15

申请号：AT03809914

申请日：2003-05-13

Applicant: BREWER SCIENCE INC

Inventor： XU GU ,  MEADOR JIMMY ,  BEHAVE MANDER ,  DESHPANDE SHREERAM ,  NOWAK KELLY

IPC: C08F212/08 ,  C09D101/00 ,  C09D129/08 ,  G02B1/11 ,  G03F7/09 ,  H01L21/768

Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.

公开(公告)号：AU2003263955A8

公开(公告)日：2004-02-16

申请号：AU2003263955

申请日：2003-07-28

Applicant: BREWER SCIENCE INC

Inventor： GUERRERO DOUGLAS J

IPC: C08G64/08 ,  C08G64/16 ,  C08G73/02 ,  C08G75/23 ,  C08L69/00 ,  C08L81/06 ,  G03F7/09 ,  G03C1/492 ,  G03C1/76 ,  G03C1/825

公开(公告)号：AU2003217896A1

公开(公告)日：2003-09-22

申请号：AU2003217896

申请日：2003-03-04

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  LAMB JAMES E

IPC: H01L21/28 ,  B32B3/10 ,  G03C5/00 ,  G03F7/00 ,  G03F7/16 ,  G03F7/40 ,  H01L21/00 ,  H01L21/027 ,  H01L21/312 ,  H01L21/768

公开(公告)号：AU2003217804A1

公开(公告)日：2003-09-09

申请号：AU2003217804

申请日：2003-02-25

Applicant: BREWER SCIENCE INC

Inventor： SNOOK JULIET ANN MINZEY ,  SHIH WU-SHENG ,  LAMB JAMES E ,  DAFFRON MARK G

IPC: G03F7/11 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205

公开(公告)号：AU2002347880A1

公开(公告)日：2003-04-22

申请号：AU2002347880

申请日：2002-10-10

Applicant: BREWER SCIENCE INC

Inventor： LAMB JAMES E III ,  SHIH WU-SHENG ,  DAFFRON MARK

IPC: B29C33/40 ,  B29C33/38 ,  B29C33/42 ,  B29C33/62 ,  B29C59/02 ,  B29K27/12 ,  B81C1/00 ,  G03F7/00 ,  G11B5/855 ,  H01L21/027 ,  B44B5/00

Abstract: Novel nonstick molds and methods of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones, and mixtures thereof. The nonstick mold is imprinted with a negative image of a master mold, where the master mold is designed to have a topography pattern corresponding to that desired on the surface of a microelectronic substrate. The nonstick mold is then used to transfer the pattern or image to a flowable film on the substrate surface. This film is subsequently cured or hardened, resulting in the desired pattern ready for further processing.

公开(公告)号：AU3329001A

公开(公告)日：2001-09-03

申请号：AU3329001

申请日：2001-02-02

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  GUERRERO DOUGLAS ,  SABNIS RAM W ,  SPENCER MARY J

IPC: G03F7/11 ,  C23C16/46 ,  G03F7/09 ,  H01L21/027 ,  G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G11B7/24 ,  G03F7/00

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 mum or smaller) features.

公开(公告)号：CA2330689A1

公开(公告)日：1999-11-04

申请号：CA2330689

申请日：1999-04-20

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY LOWELL ,  SHAO XIE ,  MEADOR JIM D

IPC: G03F7/11 ,  C08B15/06 ,  C08L1/10 ,  C08L1/26 ,  C08L61/32 ,  C09D5/00 ,  C09D101/08 ,  C09D101/14 ,  C09D161/20 ,  G02B1/11 ,  G03F7/09 ,  C08L1/12 ,  C08L1/14

Abstract: Anti-reflective compostions are prepared from cellulosic binders and alkylat ed aminoplast cross-linking agents derived from melamine, urea, benzoguanamine or glycoluril. These compositions are used to form bottom anti-reflective layer s with high plasma etch selectivity when used in multilayer photoresist processes.

公开(公告)号：DE3856007T2

公开(公告)日：1998-02-05

申请号：DE3856007

申请日：1988-01-12

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  HAWLEY DAN ,  LAMB JAMES ,  LATHAM WILLIAM ,  STICHNOTE LYNN

IPC: G02B5/20 ,  G03F7/00 ,  G09F9/00 ,  G09F9/30 ,  H01L31/0216 ,  G03F9/00 ,  G03C5/00

Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.

公开(公告)号：AT157465T

公开(公告)日：1997-09-15

申请号：AT88901669

申请日：1988-01-12

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY L ,  HAWLEY DAN W ,  LAMB JAMES E ,  LATHAM WILLIAM J ,  STICHNOTE LYNN K

IPC: G02B5/20 ,  G03F7/00 ,  G09F9/00 ,  G09F9/30 ,  H01L31/0216 ,  G03F9/00 ,  G03C5/00

Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.