公开(公告)号：WO2008010777A1

公开(公告)日：2008-01-24

申请号：PCT/SG2007/000218

申请日：2007-07-20

Applicant: NATIONAL UNIVERSITY OF SINGAPORE ,  KHURSHEED, Anjam

Inventor： KHURSHEED, Anjam

IPC: H01J37/26 ,  G01N23/22 ,  H01J49/00

CPC classification number: H01J49/142 ,  H01J37/05 ,  H01J37/15 ,  H01J37/256 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/057 ,  H01J2237/0825 ,  H01J2237/2527 ,  H01J2237/31749

Abstract: This invention is a multi-beam charged particle instrument that can simultaneously focus electrons and a variety of positive and negative ions, such as Gallium, Oxygen and Cesium ions, onto the same material target. In addition, the instrument has provision to simultaneously capture the spectrum of both secondary electrons and ions. The highly dispersive, high resolution mass spectrometer portion of the instrument is expected to detect and identify secondary ion species across the entire range of the periodic table, and also record a portion of their emitted energy spectrum. The electron energy spectrometer part of the instrument is designed to acquire the entire range of scattered electrons, from the low energy secondary electrons through to the elastic backscattered electrons.

Abstract translation: 本发明是一种多光束带电粒子仪器，可以将电子和各种正离子和负离子（如镓，氧和铯离子）聚焦在同一材料靶上。 此外，仪器还规定同时捕获二次电子和离子的光谱。 仪器的高分散，高分辨率质谱仪部分预计将在周期表的整个范围内检测和识别二次离子物种，并记录其发射的能谱的一部分。 仪器的电子能谱仪部分设计用于从低能二次电子到弹性背散射电子获取散射电子的全部范围。

公开(公告)号：WO2007100978A2

公开(公告)日：2007-09-07

申请号：PCT/US2007/062101

申请日：2007-02-14

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  TROMP, Rudolf, M.

Inventor： TROMP, Rudolf, M.

IPC: H01J37/05 ,  H01J37/153 ,  G01N23/20 ,  G01N23/227

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/252 ,  H01J37/295 ,  H01J2237/055 ,  H01J2237/1534 ,  H01J2237/2538 ,  H01J2237/2544

Abstract: An aberration-correcting microscopy instrument is provided. The instrument has a first magnetic deflector disposed for reception of a first non-dispersed electron diffraction pattern. The first magnetic deflector is also configured for projection of a first energy dispersed electron diffraction pattern in an exit plane of the first magnetic deflector. The instrument also has an electrostatic lens disposed in the exit plane of a first magnetic deflector, as well as a second magnetic deflector substantially identical to the first magnetic deflector. The second magnetic deflector is disposed for reception of the first energy dispersed electron diffraction pattern from the electrostatic lens. The second magnetic deflector is also configured for projection of a second non-dispersed electron diffraction pattern in a first exit plane of the second magnetic deflector. The instrument also has an electron mirror configured for correction of one or more aberrations in the second non-dispersed electron diffraction pattern. The electron mirror is disposed for reflection of the second non-dispersed electron diffraction patter to the second magnetic deflector for projection of a second energy dispersed electron diffraction pattern in a second exit plane of the second magnetic deflector.

Abstract translation: 提供了一种像差校正显微镜仪器。 仪器具有设置用于接收第一非分散电子衍射图案的第一磁偏转器。 第一磁偏转器还被配置用于在第一磁偏转器的出射平面中投射第一能量分散电子衍射图案。 仪器还具有设置在第一磁偏转器的出射平面中的静电透镜以及与第一磁偏转器基本相同的第二磁偏转器。 第二磁偏转器被设置用于从静电透镜接收第一能量分散电子衍射图案。 第二磁偏转器还被配置用于在第二磁偏转器的第一出射平面中投射第二非分散电子衍射图案。 仪器还具有配置用于校正第二非分散电子衍射图案中的一个或多个像差的电子反射镜。 电子反射镜设置成用于将第二非分散电子衍射图案反射到第二磁偏转器，用于在第二磁偏转器的第二出射平面中投射第二能量分散电子衍射图案。

公开(公告)号：WO2006060378A2

公开(公告)日：2006-06-08

申请号：PCT/US2005043103

申请日：2005-11-30

Applicant: PURSER KENNETH H ,  TURNER NORMAN L

Inventor： PURSER KENNETH H ,  TURNER NORMAN L

IPC: H01J1/50

CPC classification number: H01J37/05 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/31701

Abstract: A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.

Abstract translation: 一种满足日益增长的要求的方法和装置，其用于提高在半导体晶片通过离子束时冲击半导体晶片的注入离子的强度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合在一起以抵抗离子束诱导的空间电荷力的破坏性影响。 新型光学元件的设计成为可能：（1）当光束通过均匀或不均匀的磁场时，对带状离子束进行聚焦; （2）减少包含直流电的离子的损失。 当带状光束被磁场偏转时，带状光束到达磁极。

公开(公告)号：WO2005024888A3

公开(公告)日：2005-04-28

申请号：PCT/EP2004009801

申请日：2004-09-02

Applicant: INTEGRATED CIRCUIT TESTING ,  FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

Inventor： FROSIEN JUERGEN ,  DEGENHARDT RALF ,  LANIO STEFAN

IPC: H01J37/05 ,  H01J37/153 ,  H01J37/28 ,  H01J49/28 ,  H01J49/46 ,  H01J49/48

CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

Abstract translation: 本发明涉及例如 具有沿着光轴的z轴以及第一和第二平面的带电粒子束的带电粒子束能量宽度减小系统，包括：以聚焦和色散方式作用的第一元件（110），第二元件（ 112）以聚焦和散射方式作用，第一四极元件（410）被定位成使得在操作中第一四极元件的场与第一元件的聚焦和散射方式的场重叠，第二 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和色散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）以束 在第一元件以聚焦和色散方式作用之前，以及第二带电粒子选择元件（616; 716）在光束方向上定位在第一元件作用于聚焦和分散方式之后 d分散的方式。 由此，可以实现没有固有色散限制的虚拟色散源位置。

公开(公告)号：WO2005024890A1

公开(公告)日：2005-03-17

申请号：PCT/EP2004/009802

申请日：2004-09-02

Applicant: ICT INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

Inventor： FROSIEN, Jürgen ,  DEGENHARDT, Ralf ,  LANIO, Stefan

IPC: H01J37/153

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J2237/057 ,  H01J2237/1534

Abstract: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

Abstract translation: 本发明提供一种带电粒子束能量减少系统。 该系统包括以x-z平面聚焦和分散的方式起作用的第一元件（110） 在x-z平面中以聚焦和分散方式起作用的第二元件（112）; 位于第一和第二元件之间的带电粒子选择元件（116; 116a; 116b）以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件（114; 314,712; 714）。

公开(公告)号：WO2005022581A2

公开(公告)日：2005-03-10

申请号：PCT/GB2004/003637

申请日：2004-08-25

Applicant: SHIMADZU RESEARCH LABORATORY (EUROPE) LIMITED ,  CUBRIC, Dane ,  KRUIT, Pieter

Inventor： CUBRIC, Dane ,  KRUIT, Pieter

IPC: H01J37/00

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/263 ,  H01J2237/045 ,  H01J2237/0453 ,  H01J2237/0455 ,  H01J2237/0456 ,  H01J2237/0458

Abstract: A particle optical apparatus including an aperture plate for shaping a particle beam before the particle beam enters a monochromator filter assembly. The aperture plate has at least one aperture and is adjustable with respect to the monochromator filter assembly, in normal operating conditions, so that the size of the aperture used to shape the particle beam can be varied, and therefore the beam current entering the filter assembly can be varied.

Abstract translation: 包括用于在粒子束进入单色器过滤器组件之前用于成形粒子束的孔板的粒子光学设备。 孔板具有至少一个孔并且在正常操作条件下相对于单色器过滤器组件可调整，使得用于成形粒子束的孔的尺寸可以变化，并且因此进入过滤器组件的束电流 可以变化。

公开(公告)号：WO2004111604A2

公开(公告)日：2004-12-23

申请号：PCT/US2004/016590

申请日：2004-05-26

Applicant: IMAGO SCIENTIFIC INSTRUMENTS ,  GRIBB, Tye, Travis

Inventor： GRIBB, Tye, Travis

IPC: G01N

CPC classification number: H01J37/285 ,  B82Y15/00 ,  H01J37/05 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0492 ,  H01J2237/053 ,  H01J2237/244

Abstract: An atom probe includes one or more intermediate electrodes between its local electrode and its detector, wherein the intermediate electrode(s) are charged to potentials such that they filter spurious ions and prevent them from reaching the detector, and/or adapt (focus) the flight cone of the ions to have a narrower or wider angle, thereby adjusting the magnification and field of view of the image provide by the atom probe. A preferred arrangement is to provide both filtering electrodes and focusing electrodes which are movable with respect to each other, and which may be telescopically interfit, so as to provide a range of filtering and focusing effects.

Abstract translation: 原子探针在其局部电极和其检测器之间包括一个或多个中间电极，其中中间电极被充电到电位，使得它们过滤杂散离子并防止它们到达检测器，和/或适应（聚焦） 飞行锥体的离子具有更窄或更宽的角度，从而调整由原子探针提供的图像的放大倍数和视场。 优选的布置是提供可相对于彼此移动并且可以可伸缩地相互配合的滤波电极和聚焦电极，以便提供一系列的滤波和聚焦效果。

公开(公告)号：WO2004042770A3

公开(公告)日：2004-07-15

申请号：PCT/EP0312283

申请日：2003-11-04

Applicant: OMICRON NANO TECHNOLOGY GMBH ,  FOCUS GMBH ,  FUNNEMANN DIETMAR ,  ESCHER MATTHIAS

Inventor： FUNNEMANN DIETMAR ,  ESCHER MATTHIAS

IPC: H01J37/05 ,  H01J37/295 ,  H01J49/48

CPC classification number: H01J37/05 ,  H01J37/295 ,  H01J49/48

Abstract: The invention relates to an energy filter image generator for filtering electrically charged particles. The inventive energy filter comprises at least two toroidal energy analysers (30, 40) arranged one inside the other. A transfer lens device (20) is disposed between the plane of emergence (5) of the first energy analyser (30) and the plane of incidence of the second energy analyser (40), thereby making it possible to obtain the perfect energy filtered reproduction of the surface (1') of a sample on a detector (10).

Abstract translation: 它是环形的，用于电的带电粒子的成像能量过滤器与所描述的至少两个相继布置的能量分析仪（30，40）。 在第二能量分析仪（40），一个传递透镜装置（20）的入射面（6）的第一能量分析仪（30）的出射平面（5）之间布置。 因此，它是允许检测器（10）对样品（1）的表面（1“）的能量过滤，无差错的图像。

公开(公告)号：WO2002086941A1

公开(公告)日：2002-10-31

申请号：PCT/US2002/012473

申请日：2002-04-18

Applicant: MULTIBEAM SYSTEMS, INC.

Inventor： PARKER, Norman, William ,  YIN, Edward, M. ,  TSAI, Frank, Ching-Feng

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/057

Abstract: An electron beam column includes an electron gun (186), an accelerating region (170), scaning deflectors (160), focusing lenses (150), secondary electron detectors (130), and an asymmetrical detector which is defined by a field-free tube (140) and a voltage contrast plate (120).

Abstract translation: 电子束柱包括电子枪（186），加速区域（170），扫描偏转器（160），聚焦透镜（150），二次电子检测器（130）以及由无场区定义的不对称检测器 管（140）和电压对比板（120）。

公开(公告)号：WO01033603A1

公开(公告)日：2001-05-10

申请号：PCT/JP1999/006054

申请日：1999-10-29

IPC: G01N23/00 ,  G01Q30/02 ,  H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/05 ,  H01J37/153 ,  H01J2237/1536 ,  H01J2237/2817

Abstract: An electron beam (4) applied to a specimen (10) is two-dimensionally scanned by a scanning coil (9), and secondary electrons produced from the specimen (10) are detected by a secondary electron detector (13). A deflecting coil (15) for image shifting electrically deflects a primary electron beam to shift the visual field in a given direction by a given distance by image shifting. This image shifting causes energy dispersion of the primary electron beam (4) applied to the specimen, thereby degrading the resolution. However, an ExB field generator (30) for dispersion control provides energy dispersion whose direction is opposite to that caused by the primary electron beam and whose magnitude is equal to that caused by the same, so that the energy dispersion caused by the primary electron beam is automatically corrected by image shifting.

Abstract translation: 通过扫描线圈（9）对被检体（10）施加的电子束（4）进行二维扫描，二次电子检测器（13）检测从试样（10）产生的二次电子。 用于图像偏移的偏转线圈（15）使一次电子束电偏转，以通过图像偏移将给定方向的视场移动给定距离。 该图像偏移引起施加到样本的一次电子束（4）的能量分散，从而降低分辨率。 然而，用于色散控制的ExB场发生器（30）提供能量色散，其方向与由一次电子束引起的能量色散相反，其幅度等于由其引起的能量色散，使得由一次电子束 通过图像转换自动校正。