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    IMPRINT LITHOGRAPHY.
    11.
    发明专利
    IMPRINT LITHOGRAPHY. 未知

    公开(公告)号：NL2003871A

    公开(公告)日：2010-08-05

    申请号：NL2003871

    申请日：2009-11-26

    Applicant: ASML NETHERLANDS BV

    Inventor： BOEF ARIE

    IPC: H01L21/30 ,  G03F7/00

    Abstract: A method of determining the location of a lithographic substrate relative to an imprint template is disclosed. The method includes positioning the substrate adjacent to the imprint template such that an alignment grating on the substrate and an alignment grating on the imprint template form a composite diffraction grating, directing alignment radiation beam comprising radiation at a first wavelength and radiation at a second wavelength, the second wavelength being longer than the first wavelength, at the composite diffraction grating, detecting radiation diffracted from the composite grating during relative lateral movement between the imprint template and the substrate, using the detected radiation at the second wavelength to obtain information regarding a separation between the substrate alignment grating and the imprint template alignment grating, and using the detected radiation at the first wavelength to obtain information regarding the lateral position of the substrate alignment grating relative to the imprint template alignment grating.

    IMPRINT LITHOGRAPHY METHOD AND APPARATUS.
    14.
    发明专利
    IMPRINT LITHOGRAPHY METHOD AND APPARATUS. 未知

    公开(公告)号：NL2006454A

    公开(公告)日：2011-11-07

    申请号：NL2006454

    申请日：2011-03-23

    Applicant: ASML NETHERLANDS BV

    Inventor： DIJKSMAN JOHAN ,  BOEF ARIE ,  WUISTER SANDER ,  MARK MARTINUS

    IPC: G03F7/00

    Abstract: A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    15.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2006130A

    公开(公告)日：2011-09-13

    申请号：NL2006130

    申请日：2011-02-03

    Applicant: ASML NETHERLANDS BV

    Inventor： BOEF ARIE

    IPC: G03F7/20

    Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.

    TUNABLE WAVELENGTH ILLUMINATION SYSTEM.
    18.
    发明专利
    TUNABLE WAVELENGTH ILLUMINATION SYSTEM. 未知

    公开(公告)号：NL2004400A

    公开(公告)日：2010-10-12

    申请号：NL2004400

    申请日：2010-03-16

    Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

    Inventor： BOEF ARIE ,  SEWELL HARRY ,  ANDRESEN KEITH ,  EBERT EARL ,  SINGH SANJEEV

    IPC: G03F7/20

    Abstract: A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.

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