公开(公告)号：NL2005552A

公开(公告)日：2010-12-07

申请号：NL2005552

申请日：2010-10-20

Applicant: ASML NETHERLANDS BV

Inventor： BLIJ FREDRIK ,  BUIS EDWIN ,  HENNUS PIETER ,  BERG JOHANNES ,  JACOBS JOHANNES

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2004598A

公开(公告)日：2010-11-30

申请号：NL2004598

申请日：2010-04-23

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  DONDERS SJOERD ,  JACOBS JOHANNES ,  KATE NICOLAAS ,  VERMEULEN JOHANNES ,  ZAAL KOEN ,  REMIE MARTIN

IPC: G03F7/20

公开(公告)号：NL2003914A

公开(公告)日：2010-06-09

申请号：NL2003914

申请日：2009-12-07

Applicant: ASML NETHERLANDS BV

Inventor： KNAAPEN THIJS ,  PELLENS RUDY ,  HOEVEN JAN ,  ANSTOTZ DAVID ,  BRANDS GERT-JAN ,  BADAM VIJAY ,  ZANDEN MARCUS ,  GROOT CASPER ,  BRULS RICHARD ,  DOMMELEN YOURI ,  JACOBS JOHANNES ,  KAMPHUIS MARTIJN ,  LIEBREGTS PAULUS ,  MAAS RUDOLF ,  STAVENGA MARCO ,  VERSPAGET COEN

IPC: G03F7/20

Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

公开(公告)号：NL2003258A1

公开(公告)日：2010-02-09

申请号：NL2003258

申请日：2009-07-22

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST ,  JACOBS JOHANNES

IPC: G03F7/20