公开(公告)号：NL2002942A

公开(公告)日：2010-03-09

申请号：NL2002942

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  WUISTER SANDER ,  LAFARRE RAYMOND ,  SCHIFFART CATHARINUS ,  JANSEN NORBERT

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL2005265A

公开(公告)日：2011-04-11

申请号：NL2005265

申请日：2010-08-25

Applicant: ASML NETHERLANDS BV

Inventor： LAMMERS JEROEN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  KOOLE ROELOF

IPC: G03F7/00

公开(公告)号：NL2003600A

公开(公告)日：2010-06-07

申请号：NL2003600

申请日：2009-10-06

Applicant: ASML NETHERLANDS BV ,  KONINK PHILIPS ELECTRONICS B V

Inventor： TEMPEL LEENDERT ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  MUTSAERS CORNELIS

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL2003380A

公开(公告)日：2010-04-20

申请号：NL2003380

申请日：2009-08-21

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/30

公开(公告)号：NL2006929A

公开(公告)日：2012-02-13

申请号：NL2006929

申请日：2011-06-14

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  HARDEMAN TOON ,  SCHOTHORST GERARD ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  FOCKERT GEORGE ,  BAARS GREGOR ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：NL2005259A

公开(公告)日：2011-03-30

申请号：NL2005259

申请日：2010-08-24

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BANINE VADIM ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

公开(公告)号：NL2005007A

公开(公告)日：2011-03-01

申请号：NL2005007

申请日：2010-06-30

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM ,  DIJKSMAN JOHAN ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  KOOLE ROLF

IPC: G03F7/00

公开(公告)号：NL2005992A

公开(公告)日：2011-09-23

申请号：NL2005992

申请日：2011-01-12

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM ,  BOEF ARIE ,  KRUIJT-STEGEMAN YVONNE ,  RAKHIMOVA TATYANA ,  LOPAEV DMITRIY ,  GLUSHKOV DENNIS ,  YAKUNIN ANDREI ,  KOOLE ROELOF

IPC: G03F7/00

Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.

公开(公告)号：NL2005975A

公开(公告)日：2011-09-06

申请号：NL2005975

申请日：2011-01-10

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

公开(公告)号：NL2004932A

公开(公告)日：2011-01-31

申请号：NL2004932

申请日：2010-06-21

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00