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    레지스트 패턴 형성장치 및 그 방법
    21.
    发明公开
    레지스트 패턴 형성장치 및 그 방법 有权
    电阻图案形成装置及其方法

    公开(公告)号：KR1020020025732A

    公开(公告)日：2002-04-04

    申请号：KR1020010059540

    申请日：2001-09-26

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 오가타구니에 ,  니시무코고키 ,  도미타히로시 ,  기무라요시오 ,  우에무라료이치 ,  다나카미치오

    IPC: H01L21/027

    CPC classification number: H01L21/67253 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/6715

    Abstract: PURPOSE: Provided are a method and an apparatus for forming a resist pattern in which amending operation is facilitated by a reduced workload of an operator and in the same time, the appropriate amendment can be performed. CONSTITUTION: A controller(7) having a controlling portion controls a processing of a coating and developing apparatus(100) with a coating unit(3A) and a developing unit(3B). An inspecting portion(A2) and the like measures at least one of a plurality of measurement items selected from, a reflection ratio and a film thickness of a base film and a resist film, a line width after the development, an accuracy that the base film matches with a resist pattern, a defect after the development, and so on. The measured data is transmitted to the controller(7). At the controller(7), a parameter subject to an amendment is selected based on the corresponding data of each of the measurement item such as the film thickness of the resist and the line width after the development, and the amendment of the parameters subject to the amendment is performed.

    Abstract translation: 目的：提供一种用于形成抗蚀剂图案的方法和装置，其中通过减少操作者的工作量来促进修改操作，并且同时可以进行适当的修改。 构成：具有控制部分的控制器（7）通过涂覆单元（3A）和显影单元（3B）来控制涂覆和显影设备（100）的处理。 检查部（A2）等测量从基膜和抗蚀剂膜的反射率和膜厚选择的多个测量项目中的至少一个，显影后的线宽度，基底 电影与抗蚀剂图案匹配，发展后的缺陷等。 测量数据被传送到控制器（7）。 在控制器（7）中，根据测量项目的各个对象的数据（例如抗蚀剂的膜厚度和开发后的线宽度）来选择修改参数，修改参数 执行修正。

    기판 처리 장치, 기판의 반송 방법, 이상 처리부 판정 방법 및 컴퓨터 기억 매체
    24.
    发明授权
    기판 처리 장치, 기판의 반송 방법, 이상 처리부 판정 방법 및 컴퓨터 기억 매체 有权
    基板处理设备基板传输方法异常处理单元确定方法和计算机存储介质

    公开(公告)号：KR101670940B1

    公开(公告)日：2016-10-31

    申请号：KR1020110106852

    申请日：2011-10-19

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 하야카와마코토 ,  도미타히로시 ,  요시다타츠헤이

    IPC: H01L21/66 ,  G01N21/956 ,  H01L21/027

    CPC classification number: H01L21/67288 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67745

    Abstract: 처리부의이상의유무를리얼타임으로판단하고, 또한불량품웨이퍼가다량으로생산되는것을방지한다. 도포현상처리장치는웨이퍼반송기구와, 결함검사부와, 웨이퍼의반송을제어하는반송제어수단(200)과, 결함의상태에기초하여상기결함의분류를행하는결함분류수단(203)과, 처리유닛에의해웨이퍼가처리될때의웨이퍼반송기구에의한웨이퍼의반송순로를기억하는기억수단(202)과, 결함분류수단(203)에의해분류된결함의종류와기억수단(202)에기억된기판의반송순로에기초하여, 상기분류된결함이발생한처리유닛을특정하는결함처리특정수단(204)과, 결함이발생했다고특정된처리부의이상의유무를판정하는결함처리특정수단을가지고, 반송제어수단(200)은, 결함처리특정수단(204)에의해이상으로판정된처리유닛을우회하여웨이퍼를반송하도록웨이퍼반송기구의제어를행한다.

    주변 노광 장치, 주변 노광 방법, 프로그램, 및 컴퓨터 기억 매체
    25.
    发明公开
    주변 노광 장치, 주변 노광 방법, 프로그램, 및 컴퓨터 기억 매체 审中-实审
    外围曝光装置，外围曝光方法，程序，计算机存储介质

    公开(公告)号：KR1020160103927A

    公开(公告)日：2016-09-02

    申请号：KR1020160016401

    申请日：2016-02-12

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 도미타히로시

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/2028 ,  G03F7/2022

    Abstract: 본발명은주변노광장치에의해적절히더미샷을행하는것을목적으로한다. 레지스트막이도포된웨이퍼의둘레가장자리부를노광하는주변노광장치(42)로서, 웨이퍼(W)의표면을촬상하는촬상부와, 웨이퍼(W)를유지하는웨이퍼척과, 웨이퍼척에유지된웨이퍼의둘레가장자리부를노광하는노광부(130)와, 웨이퍼척을이동및 회전시키는척 구동부와, 노광부(130)를이동시키는노광구동부와, 촬상부에의해촬상된기판화상으로부터, 웨이퍼(W) 상의패턴의샷의배열정보를취득하고, 이취득된배열정보에기초하여웨이퍼(W)의둘레가장자리부를노광하도록, 척구동부및 노광구동부를제어하는제어부(200)를갖는다.

    Abstract translation: 本发明的目的是通过使用周边曝光装置适当地进行虚拟拍摄。 本发明提供了一种外围曝光装置（42），其暴露了涂有抗蚀剂膜的晶片的周围边缘部分。 周边曝光装置包括：用于对晶片（W）的表面进行成像的成像部分; 用于保持晶片（W）的晶片卡盘; 用于暴露保留在晶片卡盘中的晶片的周围边缘部分的曝光部分（130）; 用于移动和旋转晶片卡盘的卡盘驱动部分; 用于移动曝光部分的曝光驱动部分; 以及控制部（200），用于获取晶片（W）上的图案的拍摄的配置信息，并且控制所述卡盘驱动部和曝光驱动部，使得基于所述晶片（W）的周边边缘部分基于 安排信息。

    화상 작성 방법, 기판 검사 방법, 그 화상 작성 방법 또는 그 기판 검사 방법을 실행시키기 위한 프로그램을 기록한 기록 매체 및 기판 검사 장치
    26.
    发明公开
    화상 작성 방법, 기판 검사 방법, 그 화상 작성 방법 또는 그 기판 검사 방법을 실행시키기 위한 프로그램을 기록한 기록 매체 및 기판 검사 장치 有权
    图像创建方法，基板检查方法，用于执行图像创建方法和基板检查方法的存储程序的存储介质和基板检查装置

    公开(公告)号：KR1020120106565A

    公开(公告)日：2012-09-26

    申请号：KR1020120023307

    申请日：2012-03-07

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 도미타히로시 ,  히사노카즈야 ,  니시야마타다시

    IPC: G01N21/88 ,  G01B11/30 ,  G01N21/956 ,  G06T1/00

    CPC classification number: G06T7/0008 ,  G06K9/4609 ,  G06T2207/30141 ,  G01N21/88 ,  G01B11/30 ,  G01N21/956 ,  G06T1/00

    Abstract: PURPOSE: An image generating method, a substrate inspecting method, and a recording media and a substrate inspecting device for performing the image generating method and the substrate inspecting method are provided to reduce the number of intention failure wrongly detected and to detect actual failure. CONSTITUTION: An image generating method having a filter image generating process is as follows. A pixel value of a pixel positioned on the circumference of a circle having a central position of recorded images as a center is converted into a maximum value among the pixel values of a plurality of pixels selected from the pixels positioned on the circumference so that filter images are generated(S14). Position coordinates of the pixel of the recorded images are converted into polar coordinates so that converted images are generated. Maximum data indicating a relation of the maximum value among the pixel values and the diameter of the circle is generated based on the converted images. [Reference numerals] (AA) Start; (BB) Decision process; (CC,DD) Decided that defects are existed on a substrate; (EE) Finish; (S11) Synthetic image process; (S12) Converted image process; (S13) Data process; (S14) Filter image process; (S15) Object image process; (S16) Elimination image process; (S17) Whether or not a pixel value of one pixel is larger than a criterion?

    Abstract translation: 目的：提供图像生成方法，基板检查方法以及用于执行图像生成方法和基板检查方法的记录介质和基板检查装置，以减少错误检测到的意图故障的数量并检测实际故障。 构成：具有滤波图像生成处理的图像生成方法如下。 将位于具有记录图像的中心位置的圆的圆周上的像素的像素值转换为从位于圆周上的像素中选择的多个像素的像素值中的最大值，使得滤波图像 （S14）。 将记录图像的像素的位置坐标转换为极坐标，从而生成转换的图像。 基于转换的图像生成表示像素值中的最大值与圆的直径的关系的最大数据。 （附图标记）（AA）开始; （BB）决策过程; （CC，DD）决定在基板上存在缺陷; （EE）完成; （S11）合成图像处理; （S12）转换图像处理; （S13）数据处理; （S14）过滤图像处理; （S15）对象图像处理; （S16）消除图像处理; （S17）一个像素的像素值是否大于标准？

    결함 검사 장치
    28.
    发明公开
    결함 검사 장치 无效
    缺陷检查装置

    公开(公告)号：KR1020110084092A

    公开(公告)日：2011-07-21

    申请号：KR1020100119865

    申请日：2010-11-29

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 도미타히로시

    IPC: G01N21/88 ,  H01L21/66

    Abstract: PURPOSE: A defect inspection device is provided to implement inspection on a wafer within a smaller space by rotating the wafer when taking an image of the wafer. CONSTITUTION: A defect inspection device(1) comprises a loading table which is able to place a wafer(W) and rotate, a lighting device(21) which is installed directly over the loading table and arranged parallel to the straight area extended from the center of rotation to the peripheral part of the wafer in order to illuminate the wafer, a half mirror(22) which is directly under the lighting device and let the light from the lighting device pass and reflected off the wafer, and a photographing device(20) which acquires the light reflected from the half mirror.

    Abstract translation: 目的：提供缺陷检查装置，以便在拍摄晶片的图像时，通过旋转晶片来在更小的空间内对晶片进行检查。 构成：缺陷检查装置（1）包括能够放置晶片（W）并旋转的装载台，安装在装载台上的照明装置（21），并平行于从 为了照亮晶片，旋转中心到晶片的周边部分，直接在照明装置下方并使来自照明装置的光通过并从晶片反射的半反射镜（22）和拍摄装置（ 20），其获取从半反射镜反射的光。

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