公开(公告)号：DE69611563T2

公开(公告)日：2001-06-21

申请号：DE69611563

申请日：1996-02-13

Applicant: IBM

Inventor： CHIU GEORGE L ,  CIPPOLA THOMAS M ,  DOANY FUAD E ,  DOVE DEREK B ,  ROSENBLUTH ALAN E ,  SINGH RAMA N ,  WILCZYNSKI JANUSZ S

IPC: G02F1/13 ,  G02F1/1335 ,  G03B21/00 ,  H04N5/74 ,  H04N9/31

Abstract: An optical system is described consisting of reflection birefringent light valves, polarizing beam splitter, color image combining prisms, illumination system, projection lens, filters for color and contrast control, and screen placed in a configuration offering advantages for a high resolution color display. The system includes a quarter wave plate positioned to suppress stray reflection from the projection lens. The system also includes a second quarter wave plate disposed on the screen and a polarizing film disposed on the second quarter wave plate to suppress ambient light from illuminating the screen and entering the system.

公开(公告)号：CA1285664C

公开(公告)日：1991-07-02

申请号：CA567723

申请日：1988-05-26

Applicant: IBM

Inventor： LIN BURN J ,  MORUZZI ANNE M ,  ROSENBLUTH ALAN E

IPC: G03F1/00 ,  G03F7/20 ,  H01L21/027

Abstract: LITHOGRAPHIC PROCESS USING MASK WITH SMALL OPAQUE OR TRANSPARENT ELEMENTS A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lithography to be employed in order to control the transmittance of the actinic light exposure area.

公开(公告)号：DE112011100241T5

公开(公告)日：2012-12-27

申请号：DE112011100241

申请日：2011-03-16

Applicant: IBM

Inventor： MUTA HIDEMASA ,  SAKAMOTO MASAHURA ,  BAGHERI SAEED ,  INOUE TADANOBU ,  MELVILLE DAVID O ,  TIAN KEHAN ,  ROSENBLUTH ALAN E

IPC: G06F17/50

Abstract: Lichtwellendaten für den Entwurf einer Halbleitereinheit werden in Bereiche eingeteilt (102). Für die Wellendaten jedes Bereichs wird eine erste Gestaltung der Wellenfront durchgeführt, wobei nur die Wellendaten jedes Bereichs und nicht die Wellendaten benachbarter Bereiche jedes Bereichs berücksichtigt werden (104). Die Lichtwellendaten jedes Bereichs werden auf der Grundlage der ersten Gestaltung der Wellenfront normalisiert (106). Für die Wellendaten jedes Bereichs wird eine zweite Gestaltung der Wellenfront auf der Grundlage zumindest der normalisierten Wellendaten jedes Bereichs durchgeführt (108). Bei der zweiten Gestaltung der Wellenfront werden die Wellendaten jedes Bereichs und eines Sicherheitsstreifens um jeden Bereich herum berücksichtigt, der die Wellendaten der benachbarten Bereiche jedes Bereichs beinhaltet. Die zweite Gestaltung der Wellenfront kann nacheinander erfolgen, indem die Bereiche in Gruppen aufgeteilt (110) werden und nacheinander die zweite Gestaltung der Wellenfront für die Bereiche jeder Gruppe parallel durchgeführt wird (110).

公开(公告)号：DE60128953D1

公开(公告)日：2007-07-26

申请号：DE60128953

申请日：2001-11-30

Applicant: IBM

Inventor： CALLEGARI ALESSANDRO C ,  CHAUDHARI PRAVEEN ,  DOANY FUAD E ,  DOYLE JAMES P ,  GALLIGAN EILEEN A ,  HOUGHAM GARETH G ,  GLOWNIA JAMES H ,  LACEY JAMES A ,  LIEN SHUI-CHIH ,  LU MINHAU ,  ROSENBLUTH ALAN E ,  YANG KEI-HSIUNG

IPC: G02F1/1337 ,  B01J19/12 ,  C01B31/02 ,  C23C14/48 ,  C23C14/58

Abstract: A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.

公开(公告)号：CA2429905A1

公开(公告)日：2002-07-25

申请号：CA2429905

申请日：2001-11-30

Applicant: IBM

Inventor： YANG KEI-HSIUNG ,  DOANY FUAD E ,  GALLIGAN EILEEN A ,  HOUGHAM GARETH G ,  CHAUDHARI PRAVEEN ,  LACEY JAMES A ,  LU MINHAU ,  LIEN SHUI-CHIH ,  GLOWNIA JAMES H ,  DOYLE JAMES P ,  ROSENBLUTH ALAN E ,  CALLEGARI ALESSANDRO C

IPC: B01J19/12 ,  C01B31/02 ,  C23C14/48 ,  C23C14/58 ,  G02F1/1337

Abstract: A method for preparing a alignment layer surface provides a surface on the alignment layer. A chemically modified surfae [117] is formed as a result of quenching and/or ion beam treatment in accordance with the present invention, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Layer [117] is now substantially free from dangling bonds and free radicals which could degrade properties of a liquid crystal display. Now, a substrate [101] is formed for use in a liquid crystal displax device. Another method for preparing an alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.

公开(公告)号：AT519169T

公开(公告)日：2011-08-15

申请号：AT07844831

申请日：2007-11-02

Applicant: IBM

Inventor： LAI KAFAI ,  ROSENBLUTH ALAN E ,  GALLATIN GREGG M ,  MUKHERJEE MAHARAJ

IPC: G06F17/50

Abstract: A fast method of verifying a lithographic mask design is provided wherein catastrophic errors are identified by iteratively simulating and verifying images for the mask layout using progressively more accurate image models, including optical and resist models. Progressively accurate optical models include SOCS kernels that provide successively less influence. Corresponding resist models are constructed that may include only SOCS kernel terms corresponding to the optical model, or may include image trait terms of varying influence ranges. Errors associated with excessive light, such as bridging, side-lobe or SRAF printing errors, are preferably identified with bright field simulations, while errors associated with insufficient light, such as necking or line-end shortening overlay errors, are preferably identified with dark field simulations.

公开(公告)号：DE60128953T2

公开(公告)日：2008-02-14

申请号：DE60128953

申请日：2001-11-30

Applicant: IBM

Inventor： CALLEGARI ALESSANDRO C ,  CHAUDHARI PRAVEEN ,  DOANY FUAD E ,  DOYLE JAMES P ,  GALLIGAN EILEEN A ,  HOUGHAM GARETH G ,  GLOWNIA JAMES H ,  LACEY JAMES A ,  LIEN SHUI-CHIH ,  LU MINHAU ,  ROSENBLUTH ALAN E ,  YANG KEI-HSIUNG

IPC: G02F1/1337 ,  B01J19/12 ,  C01B31/02 ,  C23C14/48 ,  C23C14/58

Abstract: A method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions, and reactive gas is introduced to the ion beam to saturate dangling bonds on the surface. Another method for preparing an alignment layer surface provides a surface on the alignment layer. The surface is bombarded with ions and quenched with a reactive component to saturate dangling bonds on the surface.

公开(公告)号：DE69611561T2

公开(公告)日：2001-06-21

申请号：DE69611561

申请日：1996-02-13

Applicant: IBM

Inventor： CHIU GEORGE LIANG-TAI ,  CIPOLLA THOMAS M ,  DOANY FUAD E ,  DOVE DEREK B ,  ROSENBLUTH ALAN E ,  SINGH RAMA N ,  WILCZYNSKI JANUSZ S

IPC: G02F1/13 ,  G02F1/1335 ,  H04N5/74 ,  H04N9/31

Abstract: An optical system is described consisting of reflection birefringent light valves, polarizing beam splitter, color image combining prisms, illumination system, projection lens, filters for color and contrast control, and screen placed in a configuration offering advantages for a high resolution color display. The illumination system includes a light tunnel having a cross-sectional shape corresponding to the geometrical shape of the spacial light modulator to optimize the amount of light projected onto the screen.

公开(公告)号：DE69113715D1

公开(公告)日：1995-11-16

申请号：DE69113715

申请日：1991-08-05

Applicant: IBM

Inventor： GOODMAN DOUGLAS S ,  ROSENBLUTH ALAN E ,  TIBBETTS RAYMOND E ,  WILCZYNSKI JANUSZ S

IPC: G02B17/00 ,  G02B17/02 ,  G02B17/08 ,  G02B19/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01S3/101 ,  G03B41/00 ,  G02B27/00 ,  G11B7/135

Abstract: An optical system having a plurality of substantially planar reflecting surfaces (10, 20, 36) and a plurality of curved reflecting surfaces (26, 28) providing an optical projection system which can scan a mask object (2) onto an image plane by having the mask (2) and copy substrate (42) substantially fixed in position relative to each other and either simultaneously moving the mask (2) and copy substrate (42) in the same direction or maintaining the mask (2) and image plane substantially stationary and fixed with respect to each other while scanning the optical system. The optical system uses one wavelength of an electromagnetic radiation to align the mask (2) to the copy substrate (42) and another wavelength of electromagnetic radiation to form the image of the mask (2) on the copy substrate (42). The apparatus can be used as a laser ablation optical tool to laser ablate the image of a mask (2) onto the copy substrate (42), as an inspection tool, as a photolithographic and for other related applications. The projection lens is a modified Dyson type lens.

公开(公告)号：DE112014000486B4

公开(公告)日：2021-08-19

申请号：DE112014000486

申请日：2014-05-09

Applicant: IBM

Inventor： INOUE TADANOBU ,  MELVILLE DAVID OZMOND ,  ROSENBLUTH ALAN E ,  SAKAMOTO MASAHARU ,  TIAN KEHAN

IPC: G03F1/36 ,  G03F1/70 ,  H01L21/027

Abstract: Computerimplementiertes Verfahren für das Entwerfen einer Quelle und einer Maske für die Lithographie, das aufweist:einen Schritt (S1) des Auswählens eines Satzes von Strukturen (10);einen Schritt (S2) des Durchführens einer Quellen-Masken-Optimierung (SMO), die den Satz von Strukturen (10) verwendet, unter einer Beschränkungsregel der optischen Lagekorrektur (OPC), die für ein selektives Beschränken eines Verschiebens (40) einer Kantenposition eines Polygons (20) verwendet wird, wenn die OPC auf den Satz von Strukturen (10) angewendet wird; undeinen Schritt (S4) des Festlegens eines Layouts der Maske für die Lithographie mittels Anwendens (S3) der OPC auf sämtliche Strukturen (10), welche die Maske für die Lithographie bilden, wobei die durch die SMO optimierte Quelle verwendet wird.