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    RADIATION BEAM APPARATUS
    31.
    发明申请
    RADIATION BEAM APPARATUS 审中-公开
    辐射光束装置

    公开(公告)号：WO2016083120A2

    公开(公告)日：2016-06-02

    申请号：PCT/EP2015/076179

    申请日：2015-11-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DEKKERS, Jeroen ,  NIENHUYS, Han-Kwang ,  RENKENS, Michael, Jozef, Mathijs ,  AKKERMANS, Johannes, Antonius, Gerardus ,  DE VRIES, Gosse, Charles ,  LOOPSTRA, Erik, Roelof

    IPC: G03F7/20 ,  G02B6/293 ,  G02B5/18

    CPC classification number: G03F7/70158 ,  G02B5/1828 ,  G02B6/29314 ,  G03F7/70266

    Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.

    Abstract translation: 可调节衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个闭合通道，每个闭合通道上方，光学表面由材料膜形成。 变形机构包括一个或多个致动器，其可操作以使膜在闭合通道上变形，以便控制光学表面的形状并且在作为衍射光栅的光学表面上形成周期性结构，使得输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。

    AN UNDULATOR
    32.
    发明申请
    AN UNDULATOR 审中-公开
    一个解决方案

    公开(公告)号：WO2015150315A1

    公开(公告)日：2015-10-08

    申请号：PCT/EP2015/056873

    申请日：2015-03-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIKIPELOV, Andrey, Alexandrovich ,  AKKERMANS, Johannes, Antonius, Gerardus ,  GRIMMINCK, Leonardus, Adrianus, Gerardus ,  LOOPSTRA, Erik, Roelof ,  RENKENS, Michael, Jozef, Mathijs ,  TOMA, Adrian ,  NIENHUYS, Han-Kwang

    IPC: G03F7/20 ,  F17C3/08 ,  F25D19/00 ,  H01F1/055 ,  H01F6/04 ,  H01F7/02 ,  H01S3/09 ,  H05H7/04

    CPC classification number: G03F7/70025 ,  G03F7/70008 ,  H01F6/04 ,  H01F7/0273 ,  H01F7/0278 ,  H01S3/0903 ,  H05H7/04 ,  H05H2007/041

    Abstract: An undulator (24b) for a free electron laser comprises a pipe (140) for an electron beam and one or more periodic magnetic structures (142) extending axially along the pipe. Each periodic magnetic structure comprises a plurality of magnets (144) and a plurality of passive ferromagnetic elements (148), the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element (146) may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.

    Abstract translation: 用于自由电子激光器的波动器（24b）包括用于电子束的管道（140）和沿管道轴向延伸的一个或多个周期性磁性结构（142）。 每个周期性磁性结构包括多个磁体（144）和多个无源铁磁元件（148），所述多个磁体与沿着轴向方向延伸的线中的多个无源铁磁元件交替布置。 多个磁体中的每一个在空间上与管分离，并且每个被动铁磁元件从相邻的磁体径向地延伸到管道。 可以在磁体和管之间设置间隔元件（146），以为磁体提供辐射屏蔽和/或用于管道的冷却。

    METHOD AND APPARATUS FOR IMPROVING ACCURACY OF SOFT X-RAY METROLOGY
    35.
    发明公开
    METHOD AND APPARATUS FOR IMPROVING ACCURACY OF SOFT X-RAY METROLOGY 审中-公开

    公开(公告)号：EP4488754A1

    公开(公告)日：2025-01-08

    申请号：EP23183484.7

    申请日：2023-07-05

    Applicant: ASML Netherlands B.V.

    Inventor： NIENHUYS, Han-Kwang ,  SMORENBURG, Petrus, Wilhelmus ,  TAO, Yin ,  EDWARD, Stephen

    IPC: G03F7/00 ,  G01N21/956 ,  G02F1/37 ,  H05G2/00

    Abstract: A method for improving accuracy of SXR metrology, comprising: obtaining a first diffraction spectrum comprising a plurality of periodic discrete peaks and relating to a target structure having been illuminated with a first source spectrum; obtaining a second diffraction spectrum relating to said target structure having been illuminated with a second source spectrum, the second source spectrum being complementary to the first source spectrum; determining a first response spectrum of the target structure based on the first source spectrum and the first diffraction spectrum; determining a second response spectrum of the target structure on the second source spectrum and the second diffraction spectrum; combining the first response spectrum with the second response spectrum to construct an improved response spectrum having fewer gaps than the first response spectrum; and determining a property of interest of the target structure using the improved response spectrum.

    METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES
    36.
    发明公开
    METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES 审中-公开

    公开(公告)号：EP4242744A1

    公开(公告)日：2023-09-13

    申请号：EP22161160.1

    申请日：2022-03-09

    Applicant: ASML Netherlands B.V.

    Inventor： NIENHUYS, Han-Kwang

    IPC: G03F7/20 ,  G01N21/25 ,  G01N21/95 ,  G01N21/956

    Abstract: Disclosed is a method of correcting a measured spectrum for the effects of a source spectrum resulting from an illumination source. The method comprises obtaining a measured spectrum in terms of a measurement parameter, the measured spectrum being obtained from captured diffracted radiation from a periodic structure following illumination of said periodic structure using source radiation from said illumination source, the periodic structure being the spectrometer grating and an object being measured; determining an estimate of the source spectrum from the measured spectrum; and correcting the measured spectrum using the estimate of the source spectrum.

    OPTICAL ELEMENT
    38.
    发明公开
    OPTICAL ELEMENT 审中-公开

    公开(公告)号：EP4194937A1

    公开(公告)日：2023-06-14

    申请号：EP21213794.7

    申请日：2021-12-10

    Applicant: ASML Netherlands B.V.

    Inventor： VAN ZWOL, Adriaan, Roelof ,  WANG, Jiun-Cheng ,  NIENHUYS, Han-Kwang

    IPC: G02F1/01 ,  G02F1/19

    Abstract: An optical element comprising a temperature-sensitive layer, the temperature-sensitive layer configured to: increase in temperature, due to heat received from a laser beam; and transition from a first state to a second state at or above a threshold temperature, wherein: in the first state, the temperature-sensitive layer is substantially reflective at a first wavelength and in the second state the temperature-sensitive layer is substantially non-reflective at the first wavelength; or in the first state, the temperature-sensitive layer is substantially non-reflective at the first wavelength and in the second state the temperature-sensitive layer is substantially reflective at the first wavelength; and the transition from the first state to the second state occurs over less than a microsecond.

    METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES
    39.
    发明公开
    METHOD FOR CORRECTING MEASUREMENTS IN THE MANUFACTURE OF INTEGRATED CIRCUITS AND ASSOCIATED APPARATUSES 审中-公开

    公开(公告)号：EP3851915A1

    公开(公告)日：2021-07-21

    申请号：EP20151585.5

    申请日：2020-01-14

    Applicant: ASML Netherlands B.V.

    Inventor： NIENHUYS, Han-Kwang ,  COENEN, Teis Johan ,  ROOBOL, Sander Bas

    IPC: G03F7/20

    Abstract: Disclosed is a method of metrology. The method comprises obtaining measurement data relating to at least one measurement of each of one or more structures on a substrate. The measurement data is dependent upon one or more drift parameters, said drift parameters comprising at least one interdependent drift parameter for which each measurement is dependent on a structure response metric which varies with an illumination setting and said at least one interdependent drift parameter interdependently. The measurement data is corrected based on an approximately invariant transformation of said structure response metric or related metric.

    MANUFACTURING A REFLECTIVE DIFFRACTION GRATING
    40.
    发明公开
    MANUFACTURING A REFLECTIVE DIFFRACTION GRATING 审中-公开

    公开(公告)号：EP3719545A1

    公开(公告)日：2020-10-07

    申请号：EP19167133.8

    申请日：2019-04-03

    Applicant: ASML Netherlands B.V.

    Inventor： NIENHUYS, Han-Kwang ,  VAN DER POST, Sietse Thijmen

    IPC: G02B5/18

    Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β'=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β'≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.

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