公开(公告)号：EP2484751A2

公开(公告)日：2012-08-08

申请号：EP12158025.2

申请日：2003-04-16

Applicant: Princeton University

Inventor： Cao, Han ,  Tegenfeldt, Jonas ,  Chou, Stephen Y.

IPC: C12M1/34 ,  B01L3/00 ,  B81C1/00 ,  B82Y30/00 ,  G03F7/20 ,  G01N33/487

CPC classification number: G01N21/6486 ,  B01L3/502707 ,  B01L3/502715 ,  B01L3/502746 ,  B01L3/502761 ,  B01L2200/027 ,  B01L2200/0663 ,  B01L2200/12 ,  B01L2300/0654 ,  B01L2300/0896 ,  B01L2400/0415 ,  B01L2400/086 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/0157 ,  B81C2201/0159 ,  B82Y30/00 ,  G01N33/48721 ,  G03F7/2008 ,  Y10T436/143333

Abstract: The present invention relates to a device for interfacing nanofluidic and microfluidic components suitable for use in performing high throughput macromolecular analysis. Diffraction gradient lithography (DGL) is used to form a gradient interface between a microfluidic area and a nanofluidic area. The gradient interface area reduces the local entropic barrier to anochannels formed in the nanofluidic area. In one embodiment, the gradient interface area is formed of lateral spatial gradient structures for narrowing the cross section of a value from the micron to the nanometer length scale. In another embodiment, the gradient interface area is formed of a vertical sloped gradient structure. Additionally, the gradient structure can provide both a lateral and vertical gradient.

公开(公告)号：EP1572860A2

公开(公告)日：2005-09-14

申请号：EP03751748.9

申请日：2003-04-16

Applicant: PRINCETON UNIVERSITY

Inventor： CAO, Han ,  TEGENFELDT, Jonas ,  CHOU, Stephen, Y.

IPC: C12M1/34

CPC classification number: G01N21/6486 ,  B01L3/502707 ,  B01L3/502715 ,  B01L3/502746 ,  B01L3/502761 ,  B01L2200/027 ,  B01L2200/0663 ,  B01L2200/12 ,  B01L2300/0654 ,  B01L2300/0896 ,  B01L2400/0415 ,  B01L2400/086 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/0157 ,  B81C2201/0159 ,  B82Y30/00 ,  G01N33/48721 ,  G03F7/2008 ,  Y10T436/143333

Abstract: The present invention relates to a device for interfacing nanofluidic and microfluidic components suitable for use in performing high throughput macromolecular analysis. Diffraction gradient lithography (DGL) is used to form a gradient interface between a microfluidic area and a nanofluidic area. The gradient interface area reduces the local entropic barrier to anochannels formed in the nanofluidic area. In one embodiment, the gradient interface area is formed of lateral spatial gradient structures for narrowing the cross section of a value from the micron to the nanometer length scale. In another embodiment, the gradient interface area is formed of a vertical sloped gradient structure. Additionally, the gradient structure can provide both a lateral and vertical gradient.

公开(公告)号：EP1572860B1

公开(公告)日：2018-12-05

申请号：EP03751748.9

申请日：2003-04-16

Applicant: PRINCETON UNIVERSITY

Inventor： CAO, Han ,  TEGENFELDT, Jonas ,  CHOU, Stephen, Y.

IPC: B01L3/00 ,  G01N33/487 ,  B82Y30/00 ,  B81C1/00 ,  G03F7/20 ,  G01N21/64

CPC classification number: G01N21/6486 ,  B01L3/502707 ,  B01L3/502715 ,  B01L3/502746 ,  B01L3/502761 ,  B01L2200/027 ,  B01L2200/0663 ,  B01L2200/12 ,  B01L2300/0654 ,  B01L2300/0896 ,  B01L2400/0415 ,  B01L2400/086 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/0157 ,  B81C2201/0159 ,  B82Y30/00 ,  G01N33/48721 ,  G03F7/2008 ,  Y10T436/143333

Abstract: The present invention relates to a device for interfacing nanofluidic and microfluidic components suitable for use in performing high throughput macromolecular analysis. Diffraction gradient lithography (DGL) is used to form a gradient interface between a microfluidic area and a nanofluidic area. The gradient interface area reduces the local entropic barrier to anochannels formed in the nanofluidic area. In one embodiment, the gradient interface area is formed of lateral spatial gradient structures for narrowing the cross section of a value from the micron to the nanometer length scale. In another embodiment, the gradient interface area is formed of a vertical sloped gradient structure. Additionally, the gradient structure can provide both a lateral and vertical gradient.

公开(公告)号：EP2484751B1

公开(公告)日：2018-11-28

申请号：EP12158025.2

申请日：2003-04-16

Applicant: Princeton University

Inventor： Cao, Han ,  Tegenfeldt, Jonas ,  Chou, Stephen Y.

IPC: B01L3/00 ,  B81C1/00 ,  G01N33/487 ,  B82Y30/00 ,  G01N21/64 ,  G03F7/20

CPC classification number: G01N21/6486 ,  B01L3/502707 ,  B01L3/502715 ,  B01L3/502746 ,  B01L3/502761 ,  B01L2200/027 ,  B01L2200/0663 ,  B01L2200/12 ,  B01L2300/0654 ,  B01L2300/0896 ,  B01L2400/0415 ,  B01L2400/086 ,  B81B2201/058 ,  B81C1/00119 ,  B81C2201/0157 ,  B81C2201/0159 ,  B82Y30/00 ,  G01N33/48721 ,  G03F7/2008 ,  Y10T436/143333

Abstract: The present invention relates to a device for interfacing nanofluidic and microfluidic components suitable for use in performing high throughput macromolecular analysis. Diffraction gradient lithography (DGL) is used to form a gradient interface between a microfluidic area and a nanofluidic area. The gradient interface area reduces the local entropic barrier to anochannels formed in the nanofluidic area. In one embodiment, the gradient interface area is formed of lateral spatial gradient structures for narrowing the cross section of a value from the micron to the nanometer length scale. In another embodiment, the gradient interface area is formed of a vertical sloped gradient structure. Additionally, the gradient structure can provide both a lateral and vertical gradient.

公开(公告)号：EP2412665A1

公开(公告)日：2012-02-01

申请号：EP11175428.9

申请日：2011-07-26

Applicant: STMicroelectronics S.r.l.

Inventor： Ferrera, Marco ,  Perletti, Matteo ,  Varisco, Igor ,  Zanotti, Luca

IPC: B81C1/00 ,  B01L3/00 ,  G03F7/00 ,  B01D71/02

CPC classification number: B81C1/00119 ,  B01D67/0062 ,  B01D71/02 ,  B01D2325/021 ,  B01D2325/028 ,  B01L3/502707 ,  B01L3/502753 ,  B01L2300/0681 ,  B81B2201/10 ,  B81C1/00071 ,  B81C1/00087 ,  B81C2201/0133 ,  B81C2201/0157 ,  F04B19/006

Abstract: A process for manufacturing a micromechanical structure (25) envisages: forming a buried cavity (10) within a body (1, 12) of semiconductor material, separated from a top surface (12a) of the body by a first surface layer (12); and forming an access duct (18a) for fluid communication between the buried cavity (10) and an external environment. The method envisages: forming an etching mask (14) on the top surface (12a) at a first access area (17a); forming a second surface layer (15) on the top surface (12a) and on the etching mask (14); carrying out an etch such as to remove, in a position corresponding to the first access area, a portion of the second surface layer (15), and an underlying portion of the first surface layer (12) not covered by the etching mask (14) until the buried cavity is reached, thus forming both the first access duct (18a) and a filter element (20), set between the first access duct and the same buried cavity.

Abstract translation: 一种用于制造微机械结构（25）设想过程：半导体材料的主体（1，12）内形成掩埋空腔（10），由第一表面层与所述主体的顶面（12a）的分离（12） ; 以及形成到埋入腔（10）之间，并与外部环境中访问管道（18）流体连通。 该方法设想：在在第一接入区域（17a）的蚀刻顶表面（12A）上掩模（14）成形; 形成所述顶面（12A）上的第二表面层（15）和在蚀刻掩模（14）; 进行蚀刻：如以除去，在对应于所述第一接入区，第二表面层（15）的一部分的位置，并在第一表面层（12）未包括的蚀刻掩模的下层部分（14 ）达到掩埋空腔直到，从而形成两个第一接入管道（18a）和一个过滤器元件（20），所述第一进出管道和相同的掩埋空腔之间。

公开(公告)号：US11932529B2

公开(公告)日：2024-03-19

申请号：US16814001

申请日：2020-03-10

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Patrick Ian Oden ,  James Carl Baker ,  Sandra Zheng ,  William C. McDonald

IPC: B81B3/00 ,  G02B26/08 ,  G03F7/00 ,  G03F7/16

CPC classification number: B81B3/001 ,  G02B26/0833 ,  G03F7/0035 ,  G03F7/16 ,  B81B2201/042 ,  B81C2201/0157

Abstract: In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.

公开(公告)号：US11731164B2

公开(公告)日：2023-08-22

申请号：US17449235

申请日：2021-09-28

Applicant: The Board of Trustees of the Leland Stanford Junior University

Inventor： Bo Ma ,  Kamyar Firouzi ,  Butrus T. Khuri-Yakub ,  Jose Joseph

IPC: B06B1/02 ,  B06B1/06 ,  B81B3/00 ,  B81C1/00 ,  G01N29/06 ,  G01N29/24 ,  G01N29/22

CPC classification number: B06B1/0215 ,  B06B1/0292 ,  B06B1/0651 ,  B06B1/0662 ,  B81B3/0021 ,  B81C1/00166 ,  G01N29/0654 ,  G01N29/2406 ,  B06B2201/55 ,  B81B2201/0271 ,  B81B2203/04 ,  B81C2201/0157 ,  B81C2201/0178 ,  G01N29/22

Abstract: Aspects of this disclosure relate to driving a capacitive micromachined ultrasonic transducer (CMUT) with a pulse train of unipolar pulses. The CMUT may be electrically excited with a pulse train of unipolar pulses such that the CMUT operates in a continuous wave mode. In some embodiments, the CMUT may have a contoured electrode.

公开(公告)号：US20160118265A1

公开(公告)日：2016-04-28

申请号：US14988895

申请日：2016-01-06

Applicant: The Board of Trustees of the University of Illinois

Inventor： Lynford Goddard ,  Kaiyuan Wang ,  Chris Edwards ,  Lonna Edwards ,  Xin Yu ,  Gang Logan Liu ,  Samuel Washington ,  Shailendra Srivastava ,  Terry Koker ,  Julianne Lee ,  Catherine Britt Carlson

IPC: H01L21/306 ,  H01L31/0236 ,  H01L21/768 ,  H01L31/0232

CPC classification number: H01L21/30604 ,  B81C1/00103 ,  B81C1/00111 ,  B81C1/00119 ,  B81C1/00214 ,  B81C1/00484 ,  B81C1/00539 ,  B81C1/00595 ,  B81C2201/0114 ,  B81C2201/0139 ,  B81C2201/0157 ,  C25F3/12 ,  C25F3/14 ,  G01B11/2441 ,  H01L21/30617 ,  H01L21/3063 ,  H01L21/76886 ,  H01L22/12 ,  H01L31/02327 ,  H01L31/02363

Abstract: Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.

Abstract translation: 用于相对于衬底的表面相对地制造三维结构并用于在表面上相加地沉积金属和掺杂剂原子并将其扩散到本体中的方法和装置。 将化学溶液施加到半导体衬底的表面，并且通过将在特定强度，波长和持续时间上的特定的照明的空间图案投影在多个像素的每个像素上来产生电子 - 空穴对的空间图案 表面。 相对于照明的空间模式的时间分布，电势跨越半导体和解决方案的界面以特定的时间分布被施加。 这种方法适用于与抛物面反射器，单元尺寸分选芯片，三维光子带隙芯片，光子集成电路和集成光子微流体电路集成的光电检测器的制造。

公开(公告)号：US08482088B2

公开(公告)日：2013-07-09

申请号：US12678903

申请日：2008-09-18

Applicant: Richard Ian Laming ,  Colin Robert Jenkins ,  Anthony Bernard Traynor

Inventor： Richard Ian Laming ,  Colin Robert Jenkins ,  Anthony Bernard Traynor

IPC: H01L29/84

CPC classification number: B81B3/0072 ,  B81B2201/0257 ,  B81B2201/0264 ,  B81B2203/0127 ,  B81B2203/019 ,  B81C1/00103 ,  B81C2201/0108 ,  B81C2201/0157 ,  H04R19/005 ,  H04R19/04

Abstract: A MEMS device comprises a membrane layer and a back-plate layer formed over the membrane layer. The membrane layer comprises an outer portion and an inner portion raised relative to the outer portion and a sidewall for connecting the inner portion and the outer portion. The sidewall is non-orthogonal to the outer portion.

Abstract translation: MEMS器件包括膜层和形成在膜层上的背板层。 膜层包括外部部分和相对于外部部分凸起的内部部分和用于连接内部部分和外部部分的侧壁。 侧壁与外部部分不正交。

公开(公告)号：US20090155728A1

公开(公告)日：2009-06-18

申请号：US12127352

申请日：2008-05-27

Applicant: Laurie E. Locascio ,  Francisco Javier Atencia-Fernandez ,  Susan Barnes ,  Jack F. Douglas

Inventor： Laurie E. Locascio ,  Francisco Javier Atencia-Fernandez ,  Susan Barnes ,  Jack F. Douglas

IPC: G03F7/20

CPC classification number: B01F5/0646 ,  B01F5/0647 ,  B01F13/0059 ,  B01L3/502707 ,  B01L2300/0874 ,  B81B2201/058 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/0157 ,  B81C2201/019 ,  G03F1/50

Abstract: A method for microfabrication of a microfluidic device having sub-millimeter three dimensional relief structures is disclosed. In this method, homogeneous surfaces, which do not exhibit apparent pixel geometry, emerge from the interaction of the overlapping of diffracted light under opaque pixels and the nonlinear polymerization properties of the photoresist material. The method requires a single photolithographic step and allows for the fabrication of microstructures over large areas (centimeters) with topographic modulation of features smaller than 100 micrometers. The method generates topography that is useful in a broad range of microfluidic applications.

Abstract translation: 公开了一种具有亚毫米三维浮雕结构的微流体装置的微细加工方法。 在这种方法中，不表现出明显的像素几何形状的均匀表面从不透明像素处的衍射光的重叠与光致抗蚀剂材料的非线性聚合性质的相互作用中出现。 该方法需要单个光刻步骤，并且允许在大面积（厘米）上制造具有小于100微米的特征的地形调制的微结构。 该方法产生在广泛的微流体应用中有用的形貌。