公开(公告)号：NL2006004A

公开(公告)日：2011-09-27

申请号：NL2006004

申请日：2011-01-14

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM

IPC: G03F7/00

公开(公告)号：NL2005464A

公开(公告)日：2011-06-21

申请号：NL2005464

申请日：2010-10-06

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  WAGNER CHRISTIAN

IPC: G01N21/94 ,  G03F7/20

Abstract: A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.

公开(公告)号：NL2006647A

公开(公告)日：2011-06-15

申请号：NL2006647

申请日：2011-04-20

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  FRIJNS OLAV

IPC: G03F7/20

公开(公告)号：NL2006692A

公开(公告)日：2011-06-09

申请号：NL2006692

申请日：2011-04-29

Applicant: ASML NETHERLANDS BV

Inventor： VAINIR YURI ,  BANINE VADIM ,  BOEF ARIE ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：NL2006563A

公开(公告)日：2011-05-17

申请号：NL2006563

申请日：2011-04-07

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  KAMPEN MAARTEN

IPC: G03F7/20

公开(公告)号：NL2005189A

公开(公告)日：2011-03-28

申请号：NL2005189

申请日：2010-08-02

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  HERPEN MAARTEN ,  SOER WOUTER ,  JAK MARTIN

IPC: G03F7/20 ,  G21K1/06

Abstract: A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

公开(公告)号：NL2004949A

公开(公告)日：2011-02-22

申请号：NL2004949

申请日：2010-06-23

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BANINE VADIM ,  WUISTER SANDER ,  SCACCABAROZZI LUIGI

IPC: G03F7/00

Abstract: In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.

公开(公告)号：NL2005021A

公开(公告)日：2011-02-07

申请号：NL2005021

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  IVANOV VITALII ,  BOEF ARIE ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G01N21/64 ,  G03F1/00 ,  H01L21/66

公开(公告)号：NL2005699A

公开(公告)日：2011-01-06

申请号：NL2005699

申请日：2010-11-16

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  BANINE VADIM ,  SOER WOUTER ,  YAKUNIN ANDREI ,  KAMPEN MAARTEN ,  SCHASFOORT AD

IPC: G03F7/20 ,  G21K1/06

公开(公告)号：NL2003310A1

公开(公告)日：2010-02-16

申请号：NL2003310

申请日：2009-07-30

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  MOORS ROEL

IPC: H05G2/00 ,  G03F7/20