公开(公告)号：WO2014095266A3

公开(公告)日：2014-09-18

申请号：PCT/EP2013074742

申请日：2013-11-26

Applicant: ASML NETHERLANDS BV

Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70908

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450') disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

Abstract translation: 公开了一种用于将EUV辐射束投射到基板（400）的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块（420）和设置在衬底台周围的盖板（450'）。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元（430）位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。

公开(公告)号：NL2011237A

公开(公告)日：2014-02-04

申请号：NL2011237

申请日：2013-07-30

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  MINNAERT ARTHUR ,  MUITJENS MARCEL ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI ,  MALLMANN HANS ,  BAL KURSAT ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG ,  HUIJBERTS ALEXANDER ,  GASSELING PAULUS ,  RIZO DIAGO PEDRO ,  KAMPEN MAARTEN ,  AERLE NICK

IPC: G03F7/20

公开(公告)号：NL2010575A

公开(公告)日：2013-06-03

申请号：NL2010575

申请日：2013-04-05

Applicant: ASML NETHERLANDS BV

Inventor： LUIJTEN CARLO

IPC: G03F7/20

公开(公告)号：NL2011327A

公开(公告)日：2014-04-14

申请号：NL2011327

申请日：2013-08-22

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  DIRECKS DANIEL ,  LUIJTEN CARLO ,  MESTROM WILBERT

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2011909A

公开(公告)日：2014-06-19

申请号：NL2011909

申请日：2013-12-06

Applicant: ASML NETHERLANDS BV

Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

IPC: G03F7/20 ,  H01L21/683

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450′) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

公开(公告)号：NL2009618A

公开(公告)日：2012-11-13

申请号：NL2009618

申请日：2012-10-12

Applicant: ASML NETHERLANDS BV

Inventor： RANJAN MANISH ,  LUIJTEN CARLO ,  JANSSEN FRANCISCUS ,  CHERNYSHOV MAKSYM

IPC: G03F7/20