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    Lithographic apparatus and method
    1.
    发明专利
    Lithographic apparatus and method 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2011192991A

    公开(公告)日：2011-09-29

    申请号：JP2011049270

    申请日：2011-03-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

    IPC: H01L21/027

    CPC classification number: G03F7/70875 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a heater 400 and/or a temperature sensor 500 on a surface. The surface is a surface of at least one selected from the substrate table structured to support the substrate on a substrate support area, a liquid handling system, a projection system, a surface of a lattice of a positional measurement device or a sensor, and/or an exchange bridge. A nodal plate 600 is further included so as to support the substrate. The surface, on which the heater and/or temperature sensor are formed, is a surface of the nodal plate. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备在表面上包括加热器400和/或温度传感器500。 该表面是选自被构造成将基板支撑在基板支撑区域上的至少一个表面，液体处理系统，投影系统，位置测量装置或传感器的格子表面和/ 或交换桥。 还包括节点板600以支撑衬底。 形成加热器和/或温度传感器的表面是节点板的表面。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and method
    2.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2011192992A

    公开(公告)日：2011-09-29

    申请号：JP2011049279

    申请日：2011-03-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  VOOGD ROBBERT JAN ,  NINO GIOVANNI FRANCISCO ,  REMIE MARINUS JAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LAURENT THIBAULT SIMON MATHIEU ,  KUNNEN JOHAN GERTRUDIS CORNELIS

    IPC: H01L21/027

    CPC classification number: G03F7/70875 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To reduce effect of thermal expansion and thermal contraction in a liquid-immersion system using a supply system for supplying an immersion liquid to a substrate and/or a local area of a substrate table. SOLUTION: The lithographic apparatus includes a substrate table configured to support the substrate on a substrate supporting area and including a plurality of heaters 400 and/or temperature sensors 500 arranged adjacently to a center part of the substrate supporting area. The plurality of heaters and/or sensors are elongated in a parallel direction substantially, and extend over the substrate support area from one edge end part to an opposite edge end part. A time when they are under a projection system during a period of imaging becomes shorter than a case where an elongated direction of the heaters and/or sensors are perpendicularly oriented to a first direction. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少使用供给系统的浸液系统中的热膨胀和热收缩的影响，所述供给系统将浸没液体供应到基板和/或基板台的局部区域。 光刻设备包括：衬底台，其被配置为将衬底支撑在衬底支撑区域上，并且包括多个与衬底支撑区域的中心部分相邻布置的加热器400和/或温度传感器500。 多个加热器和/或传感器基本上在平行方向上伸长，并且在基板支撑区域上从一个边缘端部延伸到相对边缘端部。 在成像期间它们处于投影系统下方的时间比加热器和/或传感器的细长方向垂直地朝向第一方向的情况变短。 版权所有（C）2011，JPO＆INPIT

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