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公开(公告)号:CA1326789C
公开(公告)日:1994-02-08
申请号:CA534156
申请日:1987-04-08
Applicant: IBM
Inventor: ANDERSON HERBERT R JR , DIVAKARUNI RENUKA S , DYNYS JOSEPH M , KANDETZKE STEVEN M , KIRBY DANIEL P , MASTER RAJ N , CASEY JON A
Abstract: METHOD OF FAKING MULTILAYERED CERAMIC STRUCTURES HAVING AN INTERNAL DISTRIBUTION OF COPPER-BASED CONDUCTORS The Present invention provides a method for producing multilayered ceramic structures having copper-based conductors therein, wherein the onset of sintering of the copper-based conductor can be adjusted to approach or match that of the ceramic portion of the structure. In addition, methods are provided whereby the polymeric binder resin used in formation of the ceramic portion of the structure can be removed or burned-off, using oxygen-containing ambients, wherein the oxygen content is greater than 200 ppm, without oxidation of the copper-based conductors therein.
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公开(公告)号:CA2072727A1
公开(公告)日:1993-03-11
申请号:CA2072727
申请日:1992-06-29
Applicant: IBM
Inventor: AOUDE FARID Y , DAVID LAWRENCE D , DIVAKARUNI RENUKA S , FAROOQ SHAJI , HERRON LESTER W , LASKY HAL M , MASTREANI ANTHONY , NATARAJAN GOVINDARAJAN , REDDY SRINIVASA S N , SURA VIVEK M , VALLABHANENI RAO V , WALL DONALD R
Abstract: FI9-90-027 COPPER-BASED PASTE CONTAINING COPPER ALUMINATE FOR MICROSTRUCTURAL AND SHRINKAGE CONTROL OF COPPER-FILLED VIAS A copper-based paste is disclosed for filling vias in, and forming conductive surface patterns on, ceramic substrate packages for semiconductor chip devices. The paste contains copper aluminate powder in proper particle size and weight proportion to achieve grain size and shrinkage control of the via and thick film copper produced by sintering. The shrinkage of the copper material during sintering is closely matched to that of the ceramic substrate.
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公开(公告)号:BR9203415A
公开(公告)日:1993-04-13
申请号:BR9203415
申请日:1992-09-01
Applicant: IBM
Inventor: AOUDE FARID YOUSSIF , DAVID LAWRENCE D , DIVAKARUNI RENUKA S , FAROOQ SHAJI , HERRON LESTER W
Abstract: A copper-based paste is disclosed for filling vias in, and forming conductive surface patterns on, ceramic substrate packages for semiconductor chip devices. The paste contains copper aluminate powder in proper particle size and weight proportion to achieve grain size and shrinkage control of the via and thick film copper produced by sintering. The shrinkage of the copper material during sintering is closely matched to that of the ceramic substrate.
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公开(公告)号:CA1308817C
公开(公告)日:1992-10-13
申请号:CA593138
申请日:1989-03-08
Applicant: IBM
Inventor: BAISE ARNOLD I , CASEY JON A , CLARKE DAVID R , DIVAKARUNI RENUKA S , DUNKEL WERNER E , HUMENIK JAMES N , KANDETZKE STEVEN M , KIRBY DANIEL P , KNICKERBOCKER JOHN U , MATTS AMY T , TAKACS MARK A , WIGGINS LOVELL B
Abstract: The cracking experienced during thermal cycling of metal:dielectric semiconductor packages results from a mismatch in thermal co-efficients of expansion. The non-hermeticity associated with such cracking can be addressed by backfilling the permeable cracks with a flexible material. Uniform gaps between the metal and dielectric materials can similarly be filled with flexible materials to provide stress relief, bulk compressibility and strength to the package. Furthermore, a permeable, skeletal dielectric can be fabricated as a fired, multilayer structure having sintered metallurgy and subsequently infused with a flexible, temperature-stable material to provide hermeticity and strength. FI9-86-046
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