公开(公告)号：US09123500B2

公开(公告)日：2015-09-01

申请号：US13436916

申请日：2012-03-31

Applicant: Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

Inventor： Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

IPC: H01J37/08 ,  H01J37/302 ,  H01J37/24 ,  H01J37/04

CPC classification number: H01J37/08 ,  H01J37/045 ,  H01J37/243 ,  H01J37/302 ,  H01J2237/043 ,  H01J2237/0805 ,  H01J2237/0817 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.

Abstract translation: 一种用于在离子束系统中关闭和还原离子束的改进的方法和装置。 优选实施例提供了一种用于改进聚焦离子束源的功率控制的系统，其利用对带电粒子束系统何时空闲（束本身不使用）的自动检测，然后自动将束电流减小至 在离子柱中的任何孔径平面处都发生很少或没有离子研磨。 优选的实施例包括可操作以在检测到带电粒子束系统的离子源的空闲状态时，将电压修改为提取器电极和/或降低对源电极的电压的控制器。

公开(公告)号：US20150228443A1

公开(公告)日：2015-08-13

申请号：US14616658

申请日：2015-02-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenichi MORITA ,  Sayaka TANIMOTO ,  Makoto SAKAKIBARA ,  Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Kenji OBARA

IPC: H01J37/141 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

Abstract translation: 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少

公开(公告)号：US09035269B2

公开(公告)日：2015-05-19

申请号：US14349499

申请日：2012-10-03

Applicant: ION BEAM SERVICES

Inventor： Frank Torregrosa ,  Laurent Roux

IPC: H01J37/24 ,  H01J37/32 ,  G01R19/00

CPC classification number: H01J37/243 ,  G01R19/0061 ,  H01J37/32174 ,  H01J37/32311 ,  H01J37/32412 ,  H01J37/32422 ,  H01J37/32917 ,  H01J37/32972

Abstract: A control module for an ion implanter having a power supply, the power supply comprising: an electricity generator HT having its positive pole connected to ground; a first switch SW1 having its first pole connected to the negative pole of the generator HT and having its second pole connected to the outlet terminal S of the power supply; and a second switch SW2 having its first pole connected to the outlet terminal S and having its second pole connected to a neutralization terminal N. The control module also comprises a current measurement circuit AMP for measuring the current that flows between the second pole of the second switch SW2 and the neutralization terminal N.

Abstract translation: 一种用于具有电源的离子注入机的控制模块，所述电源包括：发电机HT，其正极连接到地; 第一开关SW1，其第一极连接到发电机HT的负极，并且其第二极连接到电源的出口端子S; 以及第二开关SW2，其第一极连接到出口端S并且其第二极连接到中和端N.控制模块还包括电流测量电路AMP，用于测量在第二极之间流动的电流 开关SW2和中和端N.

公开(公告)号：US20130256553A1

公开(公告)日：2013-10-03

申请号：US13436916

申请日：2012-03-31

Applicant: Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

Inventor： Tom Miller ,  Sean Kellogg ,  Jiri Zbranek

IPC: H01J3/18 ,  H05H1/03

CPC classification number: H01J37/08 ,  H01J37/045 ,  H01J37/243 ,  H01J37/302 ,  H01J2237/043 ,  H01J2237/0805 ,  H01J2237/0817 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.

Abstract translation: 一种用于在离子束系统中关闭和还原离子束的改进的方法和装置。 优选实施例提供了一种用于改进聚焦离子束源的功率控制的系统，其利用对带电粒子束系统何时空闲（束本身不使用）的自动检测，然后自动将束电流减小至 在离子柱中的任何孔径平面处都发生很少或没有离子研磨。 优选的实施例包括可操作以在检测到带电粒子束系统的离子源的空闲状态时，将电压修改为提取器电极和/或降低对源电极的电压的控制器。

公开(公告)号：US08405025B2

公开(公告)日：2013-03-26

申请号：US12244188

申请日：2008-10-02

Applicant: Toshifumi Honda ,  Hiroshi Makino

Inventor： Toshifumi Honda ,  Hiroshi Makino

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/21 ,  H01J37/243 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

Abstract: A scanning electron microscope includes an electron beam source which emits an electron beam, a beam current controller which controls a beam current of the electron beam, an electron beam converger which converges the electron beam on a surface of a sample, an electron beam scanner which scans the electron beam on the surface of the sample, a table which mounts the sample and moves at least in one direction, a detector which detects a secondary electron or a reflected electron emanated from the sample by the scan of the electron beam, an image former which forms an image of the sample based on a detection value of the detector, an image processor which processes the image formed by the image former. The beam current controller controls the beam current of the electron beam by changing transmittance of the electron beam in an irradiation path of the electron beam.

Abstract translation: 扫描电子显微镜包括发射电子束的电子束源，控制电子束的束电流的束流控制器，将电子束会聚在样品的表面上的电子束会聚器，电子束扫描器 扫描样品表面上的电子束，安装样品并至少沿一个方向移动的台面;检测器，其通过扫描电子束检测从样品发射的二次电子或反射电子;图像 前者，其基于检测器的检测值形成样本的图像，处理由图像形成器形成的图像的图像处理器。 束电流控制器通过改变电子束的照射路径中的电子束的透射率来控制电子束的束流。

公开(公告)号：US20120138815A1

公开(公告)日：2012-06-07

申请号：US13328326

申请日：2011-12-16

Applicant: Raymond Hill ,  John Notte, IV

Inventor： Raymond Hill ,  John Notte, IV

IPC: H01J27/02

CPC classification number: H01J37/26 ,  H01J37/06 ,  H01J37/08 ,  H01J37/241 ,  H01J37/243 ,  H01J2237/08 ,  H01J2237/24564

Abstract: Charged particle system are disclosed and include a first voltage source, a second voltage source electrically isolated from the first voltage source, a charged particle source electrically connected to the first voltage source, and an extractor electrically connected to the second voltage source. Methods relating to the charged particle systems are also disclosed.

Abstract translation: 公开了带电粒子系统，并且包括第一电压源，与第一电压源电隔离的第二电压源，电连接到第一电压源的带电粒子源，以及电连接到第二电压源的提取器。 还公开了与带电粒子系统有关的方法。

公开(公告)号：US07968855B2

公开(公告)日：2011-06-28

申请号：US12366390

申请日：2009-02-05

Applicant: Juergen Frosien

Inventor： Juergen Frosien

IPC: H01J27/02

CPC classification number: H01J37/08 ,  H01J27/26 ,  H01J37/241 ,  H01J37/243 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/0827 ,  H01J2237/28 ,  H01J2237/317

Abstract: A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

Abstract translation: 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱，其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳，用于从气体离子源发射器提取离子的电极，适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域，用于聚焦由第一气体或第二气体产生的离子束的物镜，用于在电极和气体离子源发射器之间提供电压的电压源，以及 控制器，用于在电压源的第一电压和第二电压之间切换，用于产生第一气体的离子离子束或第二气体的离子离子束。

公开(公告)号：US20080017796A1

公开(公告)日：2008-01-24

申请号：US11643008

申请日：2006-12-19

Applicant: Ahmed Zewail ,  Vladimir Lobastov

Inventor： Ahmed Zewail ,  Vladimir Lobastov

IPC: G01N23/00

CPC classification number: H01J37/26 ,  H01J37/065 ,  H01J37/073 ,  H01J37/24 ,  H01J37/243 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/06341 ,  H01J2237/206 ,  H01J2237/2065 ,  H01J2237/24585 ,  H01J2237/2482 ,  H01J2237/2803 ,  H01J2237/2809 ,  H01J2237/2813 ,  H01J2237/2855

Abstract: An ultrafast system (and methods) for characterizing one or more samples. The system includes a stage assembly, which has a sample to be characterized. The system has a laser source that is capable of emitting an optical pulse of less than 1 ps in duration. The system has a cathode coupled to the laser source. In a specific embodiment, the cathode is capable of emitting an electron pulse less than 1 ps in duration. The system has an electron lens assembly adapted to focus the electron pulse onto the sample disposed on the stage. The system has a detector adapted to capture one or more electrons passing through the sample. The one or more electrons passing through the sample is representative of the structure of the sample. The detector provides a signal (e.g., data signal) associated with the one or more electrons passing through the sample that represents the structure of the sample. The system has a processor coupled to the detector. The processor is adapted to process the data signal associated with the one or more electrons passing through the sample to output information associated with the structure of the sample. The system has an output device coupled to the processor. The output device is adapted to output the information associated with the structure of the sample.

Abstract translation: 用于表征一个或多个样品的超快系统（和方法）。 该系统包括具有要表征的样品的载物台组件。 该系统具有能够发射持续时间小于1ps的光脉冲的激光源。 该系统具有耦合到激光源的阴极。 在具体实施例中，阴极能够发射持续时间小于1ps的电子脉冲。 该系统具有适于将电子脉冲聚焦到设置在载物台上的样品上的电子透镜组件。 该系统具有适于捕获穿过样品的一个或多个电子的检测器。 通过样品的一个或多个电子代表样品的结构。 检测器提供与通过样品的一个或多个电子相关联的信号（例如，数据信号），其表示样品的结构。 该系统具有耦合到检测器的处理器。 处理器适于处理与通过样本的一个或多个电子相关联的数据信号，以输出与样本的结构相关联的信息。 该系统具有耦合到处理器的输出设备。 输出设备适于输出与样本结构相关联的信息。

公开(公告)号：US07122805B2

公开(公告)日：2006-10-17

申请号：US10729839

申请日：2003-12-06

Applicant: Kurt Hoffmann

Inventor： Kurt Hoffmann

IPC: H01T23/00

CPC classification number: G09G3/22 ,  G09G3/06 ,  G09G2300/0842 ,  G09G2310/0248 ,  G09G2310/061 ,  G09G2320/0233 ,  G09G2320/0295 ,  G09G2320/043 ,  G09G2320/0693 ,  H01J3/022 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/0635 ,  H01J2237/31774

Abstract: The present invention refers to a field emitter beam source (10) comprising at least one emitter (11); at least one extracting electrode (19) to extract a beam current (IE) from the emitter (11); a current source (12) for providing a predetermined beam current (IE0); a first voltage source (13) for providing a first voltage (UA) between the emitter (11) and the extracting electrode (19) to switch on the beam current (IE); and a first switch (S1) for disconnecting the first voltage source (13). With such a field emitter beam source, the emitter voltage (UE) necessary to emit a predetermined beam current (IE0) can be determined. This in turn enables the field emitter beam source (10) to generate beam current pulses with a fast rise time and a well defined beam current pulse charge Q.

Abstract translation: 本发明涉及包括至少一个发射极（11）的场致发射束源（10）。 至少一个提取电极（19），用于从发射器（11）提取射束电流（I SUB）; 用于提供预定的束电流（I OUT）的电流源（12）; 用于在所述发射极（11）和所述提取电极（19）之间提供第一电压（U SUB）的第一电压源（13）以接通所述射束电流（I SUB） SUB>）; 以及用于断开第一电压源（13）的第一开关（S SUB1＆lt; 1＆gt;）。 利用这种场致发射束源，可以确定发射预定射束电流（I E0））所需的发射极电压（U SUB）。 这又使得场发射器束源（10）能够产生具有快速上升时间和良好限定的束电流脉冲电荷Q的束电流脉冲。

公开(公告)号：US06639219B2

公开(公告)日：2003-10-28

申请号：US10045445

申请日：2001-11-09

Applicant: Rodney A. Kendall ,  Christopher F. Robinson

Inventor： Rodney A. Kendall ,  Christopher F. Robinson

IPC: G01N2300

CPC classification number: H01J37/243 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/24507

Abstract: An electron beam system employs a non-saturating detector for measuring total beam current that comprises a thin membrane of only a few microns thickness placed before a detector and separated from the detector by a drift space of about 10 mm, so that electrons in the beam are not absorbed to any significant extent, but are scattered transversely to spread the beam and avoid local saturation of the detector.

Abstract translation: 电子束系统采用非饱和检测器来测量总束电流，其包括放置在检测器之前只有几微米厚度的薄膜，并与检测器分离约10mm的漂移空间，使得光束中的电子 不被任何显着程度地吸收，而是被横向分散以扩展光束，并避免检测器的局部饱和。