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    ABERRATION MEASUREMENT IN A CHARGED PARTICLE MICROSCOPE
    21.
    发明申请
    ABERRATION MEASUREMENT IN A CHARGED PARTICLE MICROSCOPE 审中-公开

    公开(公告)号：US20180254168A1

    公开(公告)日：2018-09-06

    申请号：US15448445

    申请日：2017-03-02

    Applicant: FEI Company

    Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

    IPC: H01J37/26 ,  H01J37/147 ,  H01J37/08

    CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/153 ,  H01J2237/1534

    Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles; Passing said beam through an illuminator comprising: A source lens, with an associated particle-optical axis; A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen; Irradiating the specimen with the beam emerging from said illuminator; Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image, specifically comprising the following steps: Choosing a set of emission angles from said source; For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles; Analyzing said set of test images to evaluate illuminator aberrations generated prior to said condenser aperture.

    Electron Microscope and Method of Controlling Same
    28.
    发明申请
    Electron Microscope and Method of Controlling Same 审中-公开

    公开(公告)号：US20170330723A1

    公开(公告)日：2017-11-16

    申请号：US15591331

    申请日：2017-05-10

    Applicant: JEOL Ltd.

    Inventor： Masaki Mukai

    IPC: H01J37/24 ,  H01J37/06 ,  H01J37/05 ,  H01J37/147 ,  H01J37/26

    CPC classification number: H01J37/24 ,  H01J37/05 ,  H01J37/06 ,  H01J37/147 ,  H01J37/26 ,  H01J37/265 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/057

    Abstract: There is provided an electron microscope in which a crossover position can be kept constant. The electron microscope (100) includes: an electron source (110) for emitting an electron beam; an acceleration tube (170) having acceleration electrodes (170a-170f) and operative to accelerate the electron beam; a first electrode (160) operative such that a lens action is produced between this first electrode (160) and the initial stage of acceleration electrode (170a); an accelerating voltage supply (112) for supplying an accelerating voltage to the acceleration tube (170); a first electrode voltage supply (162) for supplying a voltage to the first electrode (160); and a controller (109b) for controlling the first electrode voltage supply (162). The lens action produced between the first electrode (160) and the initial stage of acceleration electrode (170a) forms a crossover (CO2) of the electron beam. The controller (109b) controls the first electrode voltage supply (162) such that, if the accelerating voltage is modified, the ratio between the voltage applied to the first electrode (160) and the voltage applied to the initial stage of acceleration electrode (170a) is kept constant.

    Analysis method using electron microscope, and electron microscope
    30.
    发明授权
    Analysis method using electron microscope, and electron microscope 有权

    公开(公告)号：US09748073B2

    公开(公告)日：2017-08-29

    申请号：US15247133

    申请日：2016-08-25

    Applicant: FUJITSU LIMITED

    Inventor： Takashi Yamazaki

    IPC: H01J37/00 ,  H01J37/22 ,  H01J37/21 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/222 ,  H01J37/21 ,  H01J37/22 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/228 ,  H01J2237/2802

    Abstract: An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the second and first electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the second and first electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.

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