Abstract:
Multipole coils (1, 2, 3, 4, 5, 6) comprise at least two coils (1, 2) which are disposed to concentrically enclose an imaginary axis (10). Multipole coils (1, 2, 3, 4, 5, 6) of this type are designed in such a fashion that effective fields can be generated in the area of an imaginary axis (10) when little installation space is available, and the multipole coils can be reproducibly manufactured with high precision. This is achieved in that, for each coil (1, 2, 3, 4, 5, 6), at least one winding (7) is disposed on a flexible printed circuit board (8) through disposed strip conductors (9), and the printed circuit board (8) is rolled in at least one printed circuit board layer (11, 12, 13, 14).
Abstract:
A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.
Abstract:
Provided is a projection electron beam application apparatus suitable for use in semiconductor manufacturing lines. An electron optical system of the electron beam application apparatus includes a mirror aberration corrector 106 disposed perpendicular to an optical axis 109, a plurality of magnetic field sectors 104 by which an orbit of electrons is deviated from the optical axis to make the electrons incident on the mirror aberration corrector 106, and the orbit of the electrons emitted from the mirror aberration corrector 106 is returned to the optical axis, and a doublet lens 105 disposed between adjacent magnetic field sectors along the orbit of the electrons. The plurality of magnetic field sectors have the same deflection angle for deflecting the orbit of the electrons, and the doublet lens is disposed such that an object plane and an image plane thereof are respectively central planes of the adjacent magnetic field sectors along the orbit of the electrons.
Abstract:
This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
Abstract:
The object of the present invention provides a scanning transmission electron microscope with the ability to formed at least one diffraction pattern. The scanning electron microscope comprises an electron source, which is configured to provide primary electron beam, a condenser lens system, an objective electromagnetic system, a projection lens system and a detection system, in addition, the objective electromagnetic lens consists of an upper pole piece and a lower pole piece, wherein each pole piece comprises a pole piece face, which is a flat surface oriented towards a sample plane. A salient feature of the present invention is to form at least one diffraction pattern located in the distance from the lower pole piece face outside the pole piece gap, wherein the pole piece gap is the space between the upper pole piece face and the lower pole piece face.
Abstract:
The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.
Abstract:
This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
Abstract:
An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.
Abstract:
The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.
Abstract:
A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.