Multipole coils
    31.
    发明申请
    Multipole coils 审中-公开
    多极线圈

    公开(公告)号:US20090079531A1

    公开(公告)日:2009-03-26

    申请号:US12216857

    申请日:2008-07-11

    Abstract: Multipole coils (1, 2, 3, 4, 5, 6) comprise at least two coils (1, 2) which are disposed to concentrically enclose an imaginary axis (10). Multipole coils (1, 2, 3, 4, 5, 6) of this type are designed in such a fashion that effective fields can be generated in the area of an imaginary axis (10) when little installation space is available, and the multipole coils can be reproducibly manufactured with high precision. This is achieved in that, for each coil (1, 2, 3, 4, 5, 6), at least one winding (7) is disposed on a flexible printed circuit board (8) through disposed strip conductors (9), and the printed circuit board (8) is rolled in at least one printed circuit board layer (11, 12, 13, 14).

    Abstract translation: 多极线圈(1,2,3,4,5,6)包括至少两个线圈(1,2),其被设置成同心地包围虚轴(10)。 这种类型的多极线圈(1,2,3,4,5,6)被设计成这样一种方式,即在少的安装空间可用时,在虚轴(10)的区域中可以产生有效的场,而多极线圈 线圈可以高精度地重复制造。 这是通过对于每个线圈(1,2,3,4,5,6)实现的,至少一个绕组(7)通过设置的带状导体(9)设置在柔性印刷电路板(8)上,并且 印刷电路板(8)被卷绕在至少一个印刷电路板层(11,12,13,14)中。

    Controlling the characteristics of implanter ion-beams
    32.
    发明授权
    Controlling the characteristics of implanter ion-beams 有权
    控制注入离子束的特性

    公开(公告)号:US07351984B2

    公开(公告)日:2008-04-01

    申请号:US11784073

    申请日:2007-04-05

    Abstract: A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

    Abstract translation: 一种满足日益增长的要求的方法和装置,用于提高冲击半导体晶片的注入离子入射角的精度以及当离子束通过时晶片的均匀掺杂的带状离子束的精度。 该方法和装置涉及用于植入目的的新型磁离子 - 光学传输元件的设计和组合。 光学元件的设计成为可能:(1)宽幅调节工件上的带状光束的宽度; (2)纠正带状横梁宽度的强度分布不准确; (3)关于X轴和Y轴的独立转向; (4)工件入射角校正; 和(5)空间费用引起的光束膨胀效应的近似补偿。 在实际情况下,这些元件的组合允许源和工件之间的带状光束膨胀到350毫米,具有良好的均匀性和角度精度。 此外,该方法和装置可用于沿着光束线引入四极场。

    Electron beam application apparatus

    公开(公告)号:US11915903B2

    公开(公告)日:2024-02-27

    申请号:US17676386

    申请日:2022-02-21

    Abstract: Provided is a projection electron beam application apparatus suitable for use in semiconductor manufacturing lines. An electron optical system of the electron beam application apparatus includes a mirror aberration corrector 106 disposed perpendicular to an optical axis 109, a plurality of magnetic field sectors 104 by which an orbit of electrons is deviated from the optical axis to make the electrons incident on the mirror aberration corrector 106, and the orbit of the electrons emitted from the mirror aberration corrector 106 is returned to the optical axis, and a doublet lens 105 disposed between adjacent magnetic field sectors along the orbit of the electrons. The plurality of magnetic field sectors have the same deflection angle for deflecting the orbit of the electrons, and the doublet lens is disposed such that an object plane and an image plane thereof are respectively central planes of the adjacent magnetic field sectors along the orbit of the electrons.

    Scanning electron microscope
    36.
    发明授权

    公开(公告)号:US10068746B2

    公开(公告)日:2018-09-04

    申请号:US15380366

    申请日:2016-12-15

    Inventor: Jeonghoi Koo

    Abstract: The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.

    SCANNING ELECTRON MICROSCOPE
    39.
    发明申请

    公开(公告)号:US20170169990A1

    公开(公告)日:2017-06-15

    申请号:US15380366

    申请日:2016-12-15

    Inventor: Jeonghoi KOO

    Abstract: The present invention relates to a scanning electron microscope realized to observe a test sample by detecting back-scattered electrons scattered and emitted from a surface of the test sample in the air without a vacuum chamber which is allowed to observe the test sample in a vacuum state the scanning electron microscope can be useful in minimizing dispersion of electrons of the electron beam passing through the shielding film caused due to electron scattering by focusing the electron beam passing through the shielding film on a top surface of the first back-scattered electron detector disposed between the electron gun and the shielding film to pass an electron beam and configured to detect back-scattered electrons scattered from the test sample since the first back-scattered electron detector is provided with the first planar coil having a magnetic field formed thereon.

    Desktop electron microscope and combined round-multipole magnetic lens thereof
    40.
    发明授权
    Desktop electron microscope and combined round-multipole magnetic lens thereof 有权
    台式电子显微镜及其组合圆形多极磁性透镜

    公开(公告)号:US09343261B2

    公开(公告)日:2016-05-17

    申请号:US14534815

    申请日:2014-11-06

    Abstract: A combined round-multipole magnetic lens comprises a coil bracket, a first pole piece and a second pole piece. At least a first pole shoe of the first pole piece on the coil support and at least a second pole shoe of the second pole piece under the coil support respectively extend towards the central axis. The first pole shoe and the second pole shoe are symmetric according to the central axis, or the first pole shoes and the second pole shoes are respectively symmetrically arranged, and the angle difference between the first pole shoe and the adjacent second pole shoes is 360/2N degrees. A magnetic circuit gap is formed between the first pole shoe and the adjacent second pole shoe, for generating a magnetic field distribution of multi-poles and reducing the volume and the number of power supplies.

    Abstract translation: 组合的圆形多极磁性透镜包括线圈支架,第一极靴和第二极靴。 线圈支撑件上的第一极靴的至少第一极靴和线圈支撑件下方的第二极靴的至少第二极靴分别朝向中心轴线延伸。 第一极靴和第二极靴根据中心轴对称,或第一极靴和第二极靴分别对称布置,第一极靴和相邻的第二极靴之间的角度差为360 / 2N度。 在第一极靴和相邻的第二极靴之间形成磁路间隙,用于产生多极的磁场分布并减小电源的体积和数量。

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