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    GUIDING CHARGED DROPLETS AND IONS IN AN ELECTROSPRAY ION SOURCE
    41.
    发明申请
    GUIDING CHARGED DROPLETS AND IONS IN AN ELECTROSPRAY ION SOURCE 有权
    引导电荷溅射和离子电离离子源

    公开(公告)号：US20100193679A1

    公开(公告)日：2010-08-05

    申请号：US12699550

    申请日：2010-02-03

    Applicant: Evgenij Nikolaev ,  Jochen Franzen

    Inventor： Evgenij Nikolaev ,  Jochen Franzen

    IPC: H01J27/00 ,  H01J3/14 ,  H01J49/04 ,  H01J49/10 ,  H01J49/06

    CPC classification number: H01J37/248 ,  H01J49/062 ,  H01J49/165 ,  H01J2237/03

    Abstract: Charged spray droplets are guided in a pseudopotential distribution generated by audio frequency voltages at electrodes of a guiding device, focusing the spray droplets toward the axis. An axial electric field profile and an axial flow profile of a drying gas in the guiding device allow the drift of different-sized droplets to be controlled in the longitudinal direction of the guiding device, so that the droplets are roughly equal in size when they leave the guiding device and finally dry up shortly after leaving. As a result, the ions are formed in a relatively small spatial region. Electrostatic potentials guide the analyte ions from this small spatial region to the entrance aperture of the inlet capillary; during this process, very light ions, especially protons and water-proton complexes, can be filtered out by a mobility filter.

    Abstract translation: 带电喷雾液滴由引导装置的电极处的音频电压产生的赝势分布引导，将喷雾液滴聚焦到轴上。 引导装置中的干燥气体的轴向电场分布和轴向流动分布允许不同尺寸的液滴在引导装置的纵向方向上的漂移被控制，使得当它们离开时液滴大小相当大小 引导装置，最后在离开后立即干燥。 结果，离子形成在较小的空间区域。 静电势将分析离子从该小空间区域引导到入口毛细管的入口孔; 在此过程中，非常轻的离子，特别是质子和水 - 质子复合物可以通过迁移率过滤器过滤掉。

    IMPROVED PARTICLE BEAM GENERATOR
    42.
    发明申请
    IMPROVED PARTICLE BEAM GENERATOR 审中-公开
    改进颗粒光束发生器

    公开(公告)号：US20100187433A1

    公开(公告)日：2010-07-29

    申请号：US12523984

    申请日：2008-01-24

    Applicant: Derek Anthony Eastham

    Inventor： Derek Anthony Eastham

    IPC: H01J37/10 ,  H01J3/14

    CPC classification number: H01J37/073 ,  B82Y15/00 ,  H01J37/065 ,  H01J37/12 ,  H01J37/28 ,  H01J2237/03 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/1205 ,  H01J2237/1207

    Abstract: A particle beam generator comprising particle extraction means disposed adjacent a particle source and operable to extract particles from such a source into an extraction aperture of the extraction means to form a particle beam, particle accelerating means operable to accelerate the extracted particles to increase the energy of the beam, and focussing means operable to focus the particle beam, each of said extraction means, accelerating means and focussing means being arranged in sequence and having apertures therethrough and in alignment to define a passageway through which the particles are constrained to move, characterised in that the extraction means comprises a lens structure comprising at least a pair of electrodes separated by a layer of insulating material allowing the application of different potentials to each of the lens structure electrodes, one of said electrodes comprising an extraction plate having an extraction aperture formed therein, by means of which extraction plate particles may be drawn from the particle source and through the extraction aperture by means of a potential difference between the source and said extraction plate.

    Abstract translation: 一种粒子束发生器，其包括与颗粒源相邻设置的颗粒提取装置，可操作以将颗粒从这种源提取到提取装置的提取孔中以形成粒子束，粒子加速装置可操作以加速提取的颗粒以增加能量 所述光束和聚焦装置可操作以聚焦所述粒子束，所述提取装置，加速装置和聚焦装置中的每一个按顺序布置并且具有贯穿其中的孔并且对齐以限定所述颗粒被约束以移动的通道，其特征在于 所述提取装置包括透镜结构，所述透镜结构包括至少一对电极，所述至少一对电极由绝缘材料层隔开，允许对每个所述透镜结构电极施加不同的电位，所述电极中的一个包括在其中形成有提取孔的提取板 ，通过其提取平台 e颗粒可以通过源和所述提取板之间的电位差从颗粒源和抽出孔中抽出。

    Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate
    43.
    发明授权
    Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate 失效
    静电偏转装置，电子束照射装置，基板处理装置，基板处理方法以及基板的制造方法

    公开(公告)号：US07521687B2

    公开(公告)日：2009-04-21

    申请号：US11615588

    申请日：2006-12-22

    Applicant: Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

    Inventor： Takashi Fuse ,  Tadashi Kotsugi ,  Kyo Tsuboi ,  Koji Takeya

    IPC: H01J37/147 ,  H01J3/26

    CPC classification number: H01J37/1474 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/026 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/03 ,  H01J2237/151 ,  H01L21/67017 ,  H01L21/67213 ,  Y10T29/49117 ,  Y10T29/49204 ,  Y10T29/49224 ,  Y10T29/49885

    Abstract: A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

    Abstract translation: 公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。 基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧 第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。 基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

    Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof
    45.
    发明申请
    Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof 有权
    使用多频RF功率的混合RF电容和电感耦合等离子体源及其使用方法

    公开(公告)号：US20080020574A1

    公开(公告)日：2008-01-24

    申请号：US11487999

    申请日：2006-07-18

    Applicant: Alexei Marakhtanov ,  Rajinder Dhindsa ,  Eric Hudson ,  Andreas Fischer

    Inventor： Alexei Marakhtanov ,  Rajinder Dhindsa ,  Eric Hudson ,  Andreas Fischer

    IPC: C23F1/00 ,  H01L21/302 ,  C23C16/00

    CPC classification number: H01J37/321 ,  H01J37/32091 ,  H01J2237/03

    Abstract: A device for inductively confining capacitively coupled RF plasma formed in a plasma processing apparatus. The apparatus includes an upper electrode and a lower electrode that is adapted to support a substrate and to generate the plasma between the substrate and the upper electrode. The device includes a dielectric support ring that concentrically surrounds the upper electrode and a plurality of coil units mounted on the dielectric support ring. Each coil unit includes a ferromagnetic core positioned along a radial direction of the dielectric support ring and at least one coil wound around each ferromagnetic core. The coil units generate, upon receiving RF power from an RF power source, electric and magnetic fields that reduce the number of charged particles of the plasma diffusing away from the plasma.

    Abstract translation: 用于感应地限制在等离子体处理装置中形成的电容耦合RF等离子体等离子体的装置。 该装置包括上电极和下电极，其适于支撑衬底并在衬底和上电极之间产生等离子体。 该装置包括同心地围绕上电极的电介质支撑环和安装在电介质支撑环上的多个线圈单元。 每个线圈单元包括沿着电介质支撑环的径向定位的铁磁芯和缠绕在每个铁磁芯周围的至少一个线圈。 线圈单元在从RF电源接收到RF功率时产生电场和磁场，其减少等离子体的带电粒子的数量远离等离子体扩散。

    Electron beam apparatus having traversing circuit boards
    48.
    发明申请
    Electron beam apparatus having traversing circuit boards 失效
    具有横穿电路板的电子束装置

    公开(公告)号：US20020134912A1

    公开(公告)日：2002-09-26

    申请号：US09814373

    申请日：2001-03-21

    Applicant: Applied Materials, Inc.

    Inventor： Lee Veneklasen ,  Vidhya Krishnamurthi ,  Gil Winograd ,  Mary Veneklasen

    IPC: H01L027/00

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/30 ,  H01J37/3174 ,  H01J2237/03

    Abstract: An electron beam apparatus is capable of registering an image on a substrate. The apparatus comprises a vacuum chamber having a wall. Electron beam source, modulator, and detector components are adapted to generate, modulate and detect an array of electron beams in the vacuum chamber. A circuit board passing through the wall of the vacuum chamber has a plurality of electrical traces to connect to the electron beam source, modulator, and detector components.

    Abstract translation: 电子束装置能够将图像记录在基板上。 该装置包括具有壁的真空室。 电子束源，调制器和检测器组件适于产生，调制和检测真空室中的电子束阵列。 通过真空室的壁的电路板具有多个电迹线以连接到电子束源，调制器和检测器部件。

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