公开(公告)号：DE602004032100D1

公开(公告)日：2011-05-19

申请号：DE602004032100

申请日：2004-10-25

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS JOHANNES MARIA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683

公开(公告)号：DE602006019478D1

公开(公告)日：2011-02-17

申请号：DE602006019478

申请日：2006-11-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ,  SMEULERS JOHANNES PETRUS ,  BECKERS MARCEL ,  SHULEPOV SERGEL ,  RIEPEN MICHEL

IPC: G03F7/20

公开(公告)号：DE60334428D1

公开(公告)日：2010-11-18

申请号：DE60334428

申请日：2003-08-20

Applicant: ASML NETHERLANDS BV

Inventor： HOEKS MARTINUS HENDRICUS HENDRICUS ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  H02N13/00

公开(公告)号：NL1035610A1

公开(公告)日：2008-12-23

申请号：NL1035610

申请日：2008-06-23

Applicant: ASML NETHERLANDS BV

Inventor： COMPEN RENE THEODORUS PETRUS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  OTTENS JOOST JEROEN ,  SMEETS MARTIN FRANS PIERRE

IPC: H01L21/683 ,  B25J15/00

公开(公告)号：DE602004008009T2

公开(公告)日：2008-04-30

申请号：DE602004008009

申请日：2004-10-25

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  DONDERS SJOERD NICHOLAS LAMBER

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; an article support (1) for supporting a flat article to be placed in a beam path of said projection beam of radiation on said article support (1), comprising a plurality of supporting protrusions (2), said plurality of protrusions (2) defining a support zone (3) for providing a flat plane of support; and a backfill gas feed comprising a backfill gas discharge zone (8) arranged in said support zone (3) for feeding backfill gas to a backside of said article when supported by said article support (1), for providing an improved thermal conduction between said article and said article support (1). According to the invention, said backfill gas discharge zone (8) substantially encloses said support zone (3).

公开(公告)号：SG136117A1

公开(公告)日：2007-10-29

申请号：SG2007025513

申请日：2007-04-05

Applicant: ASML NETHERLANDS BV

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  LEENDERS MARTINUS HENDRIKUS AN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

公开(公告)号：DE602004008009D1

公开(公告)日：2007-09-20

申请号：DE602004008009

申请日：2004-10-25

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  DONDERS SJOERD NICHOLAS LAMBER

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; an article support (1) for supporting a flat article to be placed in a beam path of said projection beam of radiation on said article support (1), comprising a plurality of supporting protrusions (2), said plurality of protrusions (2) defining a support zone (3) for providing a flat plane of support; and a backfill gas feed comprising a backfill gas discharge zone (8) arranged in said support zone (3) for feeding backfill gas to a backside of said article when supported by said article support (1), for providing an improved thermal conduction between said article and said article support (1). According to the invention, said backfill gas discharge zone (8) substantially encloses said support zone (3).

公开(公告)号：SG111313A1

公开(公告)日：2005-05-30

申请号：SG200407085

申请日：2004-11-02

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

公开(公告)号：SG108996A1

公开(公告)日：2005-02-28

申请号：SG200404365

申请日：2004-07-22

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  OTTENS JOOST JEROEN ,  HOPMAN JAN

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

公开(公告)号：NL1036843A1

公开(公告)日：2009-11-24

申请号：NL1036843

申请日：2009-04-09

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN MARCUS MARTINUS PETRUS ,  JACOBS JOHANNES HENRICUS WILHEMUS ,  OTTENS JOOST JEROEN

IPC: G03F9/00 ,  H01L21/68