公开(公告)号：KR1020070074494A

公开(公告)日：2007-07-12

申请号：KR1020070001565

申请日：2007-01-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아키모토마사미 ,  하야시신이치 ,  이이다나루아키 ,  이나도미히로아키

IPC: H01L21/027

CPC classification number: F27B17/0025 ,  F27B5/04 ,  F27D5/0037 ,  F27D15/02 ,  H01L21/67109 ,  H01L21/67748 ,  H01L21/67784 ,  Y10S414/139 ,  G03F7/168

Abstract: A heating apparatus and a method are provided to reduce the size of the heating apparatus itself by floating a substrate and transferring the floated substrate between a cooling plate and a heating plate. A heating apparatus includes a heating chamber(4) for heating a substrate in a process chamber, a heating plate(6) in the heating chamber, a cooling plate(3) adjacent to an opening side of the heating chamber in the process chamber, a gas projecting hole, a pressing member, and a driving mechanism. The gas projecting hole(6a) is formed at the cooling plate and the heating plate along a substrate moving path. The gas projecting hole is capable of floating the substrate. The pressing member(5) is used for pressing a front side or a rear side of the floated substrate. The driving mechanism is used for controlling the motion of the pressing member.

Abstract translation: 提供一种加热装置和方法，通过漂浮基板并将浮动的基板转移到冷却板和加热板之间来减小加热装置本身的尺寸。 加热装置包括用于加热处理室中的基板的加热室（4），加热室中的加热板（6），与处理室中的加热室的开口侧相邻的冷却板（3） 气体突出孔，按压构件和驱动机构。 气体突出孔6a沿着基板移动路径形成在冷却板和加热板上。 气体突出孔能够漂浮基板。 按压构件（5）用于按压浮动基板的前侧或后侧。 驱动机构用于控制按压部件的运动。

公开(公告)号：KR1020070039889A

公开(公告)日：2007-04-13

申请号：KR1020070013949

申请日：2007-02-09

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 키타노타카히로 ,  모리카와마사테루 ,  에사키유키히코 ,  이시자카노부카즈 ,  코가노리히사 ,  타케시타카즈히로 ,  오오쿠마히로후미 ,  아키모토마사미

IPC: H01L21/027

CPC classification number: H01L21/6715 ,  G03F7/162 ,  Y10S134/902 ,  B05C11/10

Abstract: 본 발명은 도포막 형성장치 및 도포유니트에 관한 것으로서 기판에 도포액을 도포하여 도포막을 형성하는 도포막형성장치는 기판카세트재치부 도포유니트 현상유니트 전처리/후처리유니트 및 각 유니트간에서 기판을 반송하는 주반송기구를 구비한다. 일필휘지의 요령으로 기판상에 레지스트액을 도포하기 위하여 기판을 Y방향으로 간헐적으로 이동시키고 또한 도포액노즐을 X방향으로 이동시키는 도포부를 도포유니트내에 설치한다. 도포후의 기판을 감압하에서 건조시키기 위한 감압건조부를 도포유니트내에 설치하고 또한 기판주연부에 부착하고 있는 도포막을 제거하기 위하여 장치를 도포유니트내에 설치한다. 감압건조부가 도포유니트의 외측에 있는 경우 주반송기구의 암을 커버물로 덮고 상기의 안을 용제의 분위기로 하는 기술이 제시된다.
기판, 도포액, 도포막, 도포 유니트

公开(公告)号：KR1020070026198A

公开(公告)日：2007-03-08

申请号：KR1020060083557

申请日：2006-08-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후쿠오카테츠오 ,  아키모토마사미 ,  키타노타카히로 ,  키무라요시오 ,  하야시신이치 ,  이토우히카루

IPC: H01L21/027 ,  H01L21/324

CPC classification number: C30B33/02 ,  C30B35/00 ,  H01L21/67098 ,  H01L21/67748 ,  G03F7/168 ,  G03F7/70733

Abstract: A heating apparatus and a coating developing apparatus are provided to reduce the particles attached to a substrate by decreasing an overhead time. A heating apparatus includes a process chamber, a heating chamber, a heating plate, a cooling plate, and a transfer unit. The heating chamber(4) is installed in the process chamber. The heating chamber is formed like a flat type structure. The heating chamber has an opening portion capable of loading and unloading a substrate. The heating plate is arranged in the heating chamber. The cooling plate(3) is installed in the process chamber adjacent to the opening portion of the heating chamber in order to cool the substrate. The transfer unit(5) is installed in the process chamber in order to transfer the substrate between an upper side of the cooling plate and the inside of the heating chamber.

Abstract translation: 提供加热装置和涂覆显影装置，通过减少开销时间来减少附着在基板上的颗粒。 加热装置包括处理室，加热室，加热板，冷却板和转印单元。 加热室（4）安装在处理室中。 加热室形成为平坦型结构。 加热室具有能够装载和卸载基板的开口部分。 加热板配置在加热室内。 为了冷却基板，将冷却板（3）安装在与加热室的开口部相邻的处理室中。 传送单元（5）安装在处理室中，以便在冷却板的上侧和加热室的内侧之间传送基板。

公开(公告)号：KR100549886B1

公开(公告)日：2006-02-06

申请号：KR1020000023940

申请日：2000-05-04

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아키모토마사미

IPC: H01L21/027

CPC classification number: H01L21/67178 ,  G03F7/162 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/67184 ,  H01L21/67225

Abstract: 포토리소그래피 프로세스에 의해 기판을 처리하는 기판처리장치는, 기판을 가열하는 복수의 가열부(H1,H2,Rl,R2,25)와, 가열부에서 가열된 기판을 제 1 온도로 될 때까지 냉각하는 제 1 냉각부(C1,C2,Rl,R2,26)와, 이 제 1 냉각부의 수는 가열부의 수보다 적거나 또는 같은 수인 것과, 제 1 냉각부에서 냉각된 기판을 제 1 온도보다 낮은 제 2 온도로 냉각하는 제 2 냉각부(5A∼5D,C3,5)와, 제 2 냉각부에서 냉각된 기판에 대해 처리액을 공급하여, 처리액의 액막을 기판 상에 형성하는 복수의 액처리부(6A∼6D,24)를 가진다.

Abstract translation: 用于通过光刻工艺处理衬底，在多个加热元件（H1，H2，RL，R2,25）冷却直到被加热的衬底照片的基板处理装置，以及用于将基板加热到第一温度的加热单元 第一冷却部的数量小于或等于加热部的数量，并且第一冷却部的数量小于或等于加热部的数量， 用于将基板冷却至第二温度的第二冷却部（5A至5D和C3以及5）;以及用于在基板上形成处理液的液膜的多种液体 处理单元6A至6D和24分别。

公开(公告)号：KR100439608B1

公开(公告)日：2004-07-12

申请号：KR1019990003880

申请日：1999-02-05

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아키모토마사미

IPC: H01L21/027

CPC classification number: G03F7/3021 ,  G03D5/06 ,  Y10S414/135 ,  Y10S414/137

Abstract: A resist coating-developing system includes two transporting devices each for transporting a substrate, a relay section arranged between the two transporting devices for temporarily retaining a substrate thereon, a coating unit to and from which a substrate is transferred by one of the two transporting devices, the coating unit subjecting the substrate transferred thereto to a resist coating process, and a developing unit to and from which a substrate is transferred by the other of the two transporting devices, the developing unit subjecting an exposed resist of the substrate transferred thereto to a developing process, wherein the coating unit and the developing unit are arranged opposite to each other with the two transporting devices and the relay section interposed therebetween.

Abstract translation: 抗蚀剂涂布显影系统包括两个输送装置，每个输送装置用于输送衬底;中继部分，布置在两个输送装置之间用于临时保持衬底;涂布单元，通过两个输送装置中的一个输送衬底 ，将转印后的基板进行抗蚀剂涂布处理的涂布单元和通过两个输送装置中的另一个输送基板的显影单元，显影单元使转印的基板的曝光后的抗蚀剂成为 其中，所述涂布单元和所述显影单元通过所述两个输送装置和所述中继部分设置在彼此相对的位置。

公开(公告)号：KR100421349B1

公开(公告)日：2004-03-06

申请号：KR1020020050830

申请日：2002-08-27

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 요네미즈아키라 ,  구도우히로유키 ,  아키모토마사미

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for processing a target processing substrate is provided to prevent the atmosphere in a process chamber from leaking through a window portion for transferring the target processing substrate or through an inlet port for inducing outside air by using a very simple structure. CONSTITUTION: The apparatus for processing the target processing substrate includes an openable window portion for transferring the target processing substrate and an inlet port for introducing the outer atmosphere. The processing apparatus further includes a closed processing chamber for performing predetermined processing for the target processing substrate transferred via the window portion, an exhaust unit for evacuating the interior of the processing chamber, and an opening/closing mechanism for closing the inlet port and opening the inlet port when the pressure in the processing chamber is negative.

公开(公告)号：KR100386130B1

公开(公告)日：2003-08-25

申请号：KR1019970001966

申请日：1997-01-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야에가시히데타미 ,  도시마다카유키 ,  아키모토마사미 ,  야마구치에이지 ,  가타노준이치 ,  기타노다카유키 ,  신야히로시 ,  이이다나루아키

IPC: H01L21/68

CPC classification number: H01L21/67178 ,  H01L21/67196 ,  H01L21/67225 ,  H01L21/67742 ,  Y10T29/41

Abstract: A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.

Abstract translation: 1。一种处理装置，其特征在于，具有：多个处理单元组（G1〜G5），其分别具有对被处理体（w）进行一系列处理的多个处理单元，该多个处理单元以多个阶段进行垂直配置， 22）被定义在处理单元组（G1到G5）中; 用于传送物体（w）的传送装置（21），所述传送装置（21）具有可在物体传送空间（22）中垂直移动的传送构件（73,78a，78b，78c），所述传送构件（73,78a ，78b，78c）能够将物体（w）转移到每个所述处理单元; 和用于减少所述物体转移空间（22）的状态变化的装置（20b，50至62,84,95,95a，96,114,114a，115,115a），所述处理装置还包括至少一个第一处理 单元组（G1，G2），其中包括用于涂覆抗蚀剂的抗蚀剂涂布单元和用于显影抗蚀剂图案的显影单元的处理单元垂直堆叠; 以及至少一个第二处理单元组（G3，G4，G5），其中用于对准待处理对象的对准单元，用于烘烤对象的烘烤单元，用于冷却所述对象的冷却单元， 用于对物体进行粘合处理的粘合单元和延伸单元垂直地堆叠，其中所述第一处理单元组（G1，G2）具有这样的布置，即涂覆单元位于显影单元下方。

公开(公告)号：KR100379649B1

公开(公告)日：2003-07-22

申请号：KR1019970056977

申请日：1997-10-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아키모토마사미 ,  데구치요이치

IPC: H01L21/027

CPC classification number: H01L21/67178 ,  H01L21/6715 ,  Y10S414/135

Abstract: Disclosed is an apparatus for processing a substrate in which a processing consisting of a plurality of process steps is applied to a substrate to be processed. The apparatus comprises a transfer zone extending in a vertical direction, a plurality of process groups arranged to surround the transfer zone for processing the substrate, each process group consisting of a plurality of process units stacked one upon the other, and each process unit having an opening communicating with the transfer zone for transferring the substrate into and out of the process unit, a main arm mechanism movably mounted in the transfer zone for transferring the substrate into and out of the process unit through the opening, and down flow forming means for forming a down flow of a clean air within the transfer zone. At least one of the plural process groups includes a plurality of thermal units for heating or cooling the substrate, a transfer unit for transferring the substrate into and out of the transfer zone, and a gas process unit for processing the substrate with a gas, the opening of the gas process unit being positioned lower than the openings of the thermal units and the transfer unit.

Abstract translation: 公开了一种用于处理衬底的设备，其中由多个处理步骤组成的处理被应用于待处理的衬底。 该设备包括在垂直方向上延伸的转移区域，多个处理组被布置为围绕处理衬底的转移区域，每个处理组由多个彼此堆叠的处理单元组成，并且每个处理单元具有 与输送区域连通，用于将衬底输入和输出处理单元;主臂机构，可移动地安装在输送区域中，用于通过开口将衬底输入和输出处理单元;以及下流形成装置，用于形成 清洁空气在传送区域内向下流动。 多个工艺组中的至少一个工艺组包括用于加热或冷却基板的多个热单元，用于将基板传送进出传送区域的传送单元以及用气体处理基板的气体处理单元， 气体处理单元的打开位置低于热单元和转印单元的开口。

公开(公告)号：KR100376321B1

公开(公告)日：2003-06-09

申请号：KR1019970045484

申请日：1997-09-02

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 아키모토마사미

IPC: H01L21/027

CPC classification number: H01L21/67173 ,  H01L21/67109 ,  H01L21/67178 ,  H01L21/67781

Abstract: The process system of the present invention has a cooling process portion, a siding portion, and transfer means. The cooling process portion is responsible for applying cooling process to a heated substrate. The siding portion is positioned in an upper side of the cooling process portion and used for temporarily storing the substrate before being subjected to the cooling process. The transfer means loads/unloads the substrate into/from the cooling process portion and the siding portion.

Abstract translation: 本发明的处理系统具有冷却处理部分，侧壁部分和传送装置。 冷却过程部分负责将冷却过程应用于加热的基板。 旁路部分位于冷却处理部分的上侧，并用于在经受冷却处理之前临时存储基板。 传送装置将基板从冷却处理部分和侧壁部分装载/卸载。

公开(公告)号：KR1020010082581A

公开(公告)日：2001-08-30

申请号：KR1020000076997

申请日：2000-12-15

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 기타노다카히로 ,  모리카와마사테루 ,  에사키유키히코 ,  이시자카노부카즈 ,  고가노리히사 ,  다케시타가즈히로 ,  오쿠마히로후미 ,  아키모토마사미

IPC: H01L21/027

CPC classification number: H01L21/6715

Abstract: PURPOSE: A film forming unit is provided to apply the resist solution linearly on the wafer when it moves along the guide shaft. Meanwhile the wafer which is supported horizontally is moved by another drive mechanism in a direction perpendicular to the direction in which the discharge nozzle slides. CONSTITUTION: The film forming unit comprises moving means(86) for moving a discharge nozzle(85), wherein the moving means(86) includes a support member for supporting the discharge nozzle(85), a moving member for moving support member, a guide shaft passing through bearing portion formed in the supporting member, and a gas supplying part for supplying gas into a space between the bearing portion and guide shaft.

Abstract translation: 目的：提供一种成膜单元，当其沿着导向轴移动时，将抗蚀剂溶液线性地施加到晶片上。 同时水平支撑的晶片在垂直于排出喷嘴滑动方向的另一驱动机构上移动。 构成：成膜单元包括用于移动排放喷嘴（85）的移动装置（86），其中移动装置（86）包括用于支撑排放喷嘴（85）的支撑构件，用于移动支撑构件的移动构件， 引导轴穿过形成在支撑构件中的支承部分，以及气体供应部分，用于将气体供应到轴承部分和引导轴之间的空间中。