公开(公告)号：WO2022161726A1

公开(公告)日：2022-08-04

申请号：PCT/EP2021/087611

申请日：2021-12-23

Applicant: ASML NETHERLANDS B.V.

Inventor： THEEUWES, Thomas ,  WILDENBERG, Jochem, Sebastiaan ,  ZHANG, Lei ,  VAN ITTERSUM, Ronald

IPC: G03F7/20

Abstract: Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more structures on a substrate subject to the lithographic process. The method comprises obtaining a probability description distribution comprising a plurality of probability descriptions of the performance parameter, each probability description corresponding to a different position on the substrate and decomposing each probability description into a plurality of component probability descriptions to obtain a plurality of component probability description distributions. A component across-substrate-area model is determined for each of said plurality of component probability descriptions, which models its respective component probability description across a substrate area; and a value for said performance parameter or parameter derived therefrom is determined based on the component across-substrate-area models.

公开(公告)号：WO2019086167A1

公开(公告)日：2019-05-09

申请号：PCT/EP2018/075720

申请日：2018-09-24

Applicant: ASML NETHERLANDS B.V.

Inventor： ONOSE, Alexandru ,  MOSSAVAT, Seyed Iman ,  THEEUWES, Thomas

IPC: G03F7/20

Abstract: Methods and apparatus for estimating an unknown value of at least one of a plurality of sets of data, each set of data comprising a plurality of values indicative of radiation diffracted and/or reflected and/or scattered by one or more features fabricated in or on a substrate, wherein the plurality of sets of data comprises at least one known value, and wherein at least one of the plurality of sets of data comprises an unknown value, the apparatus comprising a processor to estimate the unknown value of the at least one set of data based on: the known values of the plurality of sets of data; a first condition between two or more values within a set of data of the plurality of sets of data; and a second condition between two or more values being part of different sets of data of the plurality of the sets of data.

公开(公告)号：WO2018233966A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/063527

申请日：2018-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： HARUTYUNYAN, Davit ,  JIA, Fei ,  STAALS, Frank ,  WANG, Fuming ,  LOOIJESTIJN, Hugo, Thomas ,  RIJNIERSE, Cornelis, Johannes ,  PISARENCO, Maxim ,  WERKMAN, Roy ,  THEEUWES, Thomas ,  VAN HEMERT, Tom ,  BASTANI, Vahid ,  WILDENBERG, Jochem, Sebastiaan ,  MOS, Everhardus, Cornelis ,  WALLERBOS, Erik, Johannes, Maria

IPC: G03F7/20 ,  G05B13/04 ,  G05B19/418 ,  H01L21/66

Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method comprising: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.

公开(公告)号：WO2017148996A1

公开(公告)日：2017-09-08

申请号：PCT/EP2017/054737

申请日：2017-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LEEST, Adriaan, Johan ,  TSIATMAS, Anagnostis ,  HINNEN, Paul, Christiaan ,  MC NAMARA, Elliott, Gerard ,  VERMA, Alok ,  THEEUWES, Thomas ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

Abstract: A method of configuring a parameter determination process, the method including: obtaining a mathematical model of a structure, the mathematical model configured to predict an optical response when illuminating the structure with a radiation beam and the structure having geometric symmetry at a nominal physical configuration; using, by a hardware computer system, the mathematical model to simulate a perturbation in the physical configuration of the structure of a certain amount to determine a corresponding change of the optical response in each of a plurality of pixels to obtain a plurality of pixel sensitivities; and based on the pixel sensitivities, determining a plurality of weights for combination with measured pixel optical characteristic values of the structure on a substrate to yield a value of a parameter associated with change in the physical configuration, each weight corresponding to a pixel.

Abstract translation: 一种配置参数确定过程的方法，所述方法包括：获得结构的数学模型，所述数学模型被配置为预测用辐射束照射所述结构时的光学响应，并且所述结构具有 在标称物理配置下的几何对称性; 由硬件计算机系统使用数学模型来模拟特定量的结构的物理配置中的扰动以确定多个像素中的每一个中的光学响应的​​对应变化以获得多个像素灵敏度; 并且基于像素灵敏度，确定用于与基板上的结构的测量像素光学特性值组合的多个权重，以产生与物理配置中的变化相关联的参数的值，每个权重对应于像素。 p>

公开(公告)号：WO2017148986A1

公开(公告)日：2017-09-08

申请号：PCT/EP2017/054719

申请日：2017-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LEEST, Adriaan, Johan ,  TSIATMAS, Anagnostis ,  HINNEN, Paul, Christiaan ,  MC NAMARA, Elliott, Gerard ,  VERMA, Alok ,  THEEUWES, Thomas ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

Abstract: A method of determining a parameter of a patterning process, the method including: obtaining a detected representation of radiation redirected by a structure having geometric symmetry at a nominal physical configuration, wherein the detected representation of the radiation was obtained by illuminating a substrate with a radiation beam such that a beam spot on the substrate was filled with the structure; and determining, by a hardware computer system, a value of the patterning process parameter based on optical characteristic values from an asymmetric optical characteristic distribution portion of the detected radiation representation with higher weight than another portion of the detected radiation representation, the asymmetric optical characteristic distribution arising from a different physical configuration of the structure than the nominal physical configuration.

Abstract translation: 确定图案化过程的参数的方法，所述方法包括：获得在标称物理配置下由具有几何对称性的结构重新引导的辐射的检测到的表示，其中所检测到的辐射表示为 通过用辐射束照射衬底获得，使得衬底上的束斑填充有该结构; 以及由硬件计算机系统基于来自检测到的辐射表示的不对称光学特性分布部分中的光学特性值以比所检测到的辐射表示的另一部分更高的权重来确定图案化处理参数的值，所述不对称光学特性分布 由于结构的物理配置不同于名义物理配置。

公开(公告)号：WO2019101447A1

公开(公告)日：2019-05-31

申请号：PCT/EP2018/078591

申请日：2018-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： TSIATMAS, Anagnostis ,  HINNEN, Paul, Christiaan ,  MC NAMARA, Elliott, Gerard ,  THEEUWES, Thomas ,  DE LA FUENTE VALENTIN, Maria, Isabel ,  SHAHRJERDY, Mir, Homayoun ,  DEN BOEF, Arie, Jeffrey ,  WANG, Shu-jin

IPC: G03F7/20

Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.

公开(公告)号：WO2018046265A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070763

申请日：2017-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VERSTRAETEN, Bert ,  CRAMER, Hugo, Augustinus, Joseph ,  THEEUWES, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70625 ,  G03F7/70683

Abstract: A method of evaluating a patterning process, the method including: obtaining the result of a first measurement of a first metrology target; obtaining the result of a second measurement of a second metrology target, the second metrology target having a structural difference from the first metrology target that generates a sensitivity difference and/or an offset, of a process parameter of the patterning process between the first and second metrology targets; and determining, by a computer system, a value pertaining to the patterning process based on the results of the first and second measurements.

Abstract translation: 一种评估构图过程的方法，该方法包括：获得第一度量衡目标的第一测量结果; 获得第二度量衡目标的第二测量结果，第二度量衡目标具有与第一度量衡目标的结构差异，所述第二度量衡量目标产生第一和第二测量目标之间的图案化过程的过程参数的灵敏度差异和/或偏移量 度量衡目标; 以及由计算机系统基于第一和第二测量的结果确定与图案化过程有关的值。

公开(公告)号：WO2018024446A1

公开(公告)日：2018-02-08

申请号：PCT/EP2017/067393

申请日：2017-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： THEEUWES, Thomas ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F7/70508 ,  G03F7/70633

Abstract: Disclosed is a method of reconstructing a characteristic of a structure formed on a substrate by a lithographic process, and an associated metrology apparatus. The method comprises combining measured values of a first parameter associated with the lithographic process to obtain an estimated value of the first parameter; and reconstructing at least a second parameter associated with the characteristic of the structure using the estimated value of the first parameter and a measurement of the structure. The combining step may comprise modeling a variation of the first parameter to obtain a parameter model or fingerprint of the first parameter.

Abstract translation: 公开了一种通过光刻工艺重构形成在衬底上的结构的特性的方法，以及相关的度量装置。 该方法包括组合与光刻过程相关联的第一参数的测量值以获得第一参数的估计值; 以及使用所述第一参数的所述估计值和所述结构的测量来重建与所述结构的所述特性相关联的至少第二参数。 组合步骤可以包括对第一参数的变化进行建模以获得第一参数的参数模型或指纹。

公开(公告)号：WO2017149009A1

公开(公告)日：2017-09-08

申请号：PCT/EP2017/054761

申请日：2017-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LEEST, Adriaan, Johan ,  TSIATMAS, Anagnostis ,  HINNEN, Paul, Christiaan ,  MC NAMARA, Elliott, Gerard ,  VERMA, Alok ,  THEEUWES, Thomas ,  CRAMER, Hugo, Augustinus, Joseph ,  DE LA FUENTE VALENTIN, Maria, Isabel ,  VAN WITTEVEEN, Koen ,  ZAAL, Martijn, Maria ,  WANG, Shu-jin

IPC: G03F7/20

Abstract: A metrology target includes: a first structure arranged to be created by a first patterning process; and a second structure arranged to be created by a second patterning process, wherein the first structure and/or second structure is not used to create a functional aspect of a device pattern, and wherein the first and second structures together form one or more instances of a unit cell, the unit cell having geometric symmetry at a nominal physical configuration and wherein the unit cell has a feature that causes, at a different physical configuration than the nominal physical configuration due to a relative shift in pattern placement in the first patterning process, the second patterning process and/or another patterning process, an asymmetry in the unit cell.

Abstract translation: 度量目标包括：布置成通过第一图案化工艺形成的第一结构; 以及布置成通过第二图案化工艺形成的第二结构，其中第一结构和/或第二结构不用于创建器件图案的功能方面，并且其中第一和第二结构一起形成一个或多个 单位单元，所述单位单元在标称物理配置处具有几何对称性，并且其中所述单位单元具有如下特征：由于所述第一图案化工艺中的图案布置的相对偏移，在与所述标称物理配置不同的物理配置下， 第二次构图工艺和/或其他图案化工艺，单元格中的不对称性。

公开(公告)号：WO2017144379A1

公开(公告)日：2017-08-31

申请号：PCT/EP2017/053700

申请日：2017-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： TEL, Wim, Tjibbo ,  STAALS, Frank ,  MASLOW, Mark, John ,  ANUNCIADO, Roy ,  JOCHEMSEN, Marinus ,  CRAMER, Hugo, Augustinus, Joseph ,  THEEUWES, Thomas ,  HINNEN, Paul, Christiaan

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625

Abstract: A method including: computing a value of a first variable of a pattern of, or for, a substrate processed by a patterning process by combining a fingerprint of the first variable on the substrate and a certain value of the first variable; and determining a value of a second variable of the pattern based at least in part on the computed value of the first variable.

Abstract translation: 一种方法，包括：通过组合所述衬底上的所述第一变量的指纹和所述衬底的特定值来计算由图案化过程处理的衬底的图案的第一变量的值 第一个变量; 以及至少部分地基于所计算的第一变量的值来确定图案的第二变量的值。