公开(公告)号：SG122952A1

公开(公告)日：2006-06-29

申请号：SG200508421

申请日：2005-10-27

Applicant: ASML NETHERLANDS BV

Inventor： BOEF DEN ARIE JEFFREY ,  BURGHOORN JACOBUS ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  SCHAAR VAN DER MAURITS

公开(公告)号：SG122929A1

公开(公告)日：2006-06-29

申请号：SG200507500

申请日：2005-11-25

Applicant: ASML NETHERLANDS BV

Inventor： BUEL VAN HENRICUS WILHELMUS MA ,  BIJNEN FRANCISCUS GODEFRIDUS C ,  BURGHOORN JACOBUS ,  TOLSMA HOITE PIETER THEODOOR ,  BERGE TEN PETER

公开(公告)号：DE60120000D1

公开(公告)日：2006-07-06

申请号：DE60120000

申请日：2001-01-12

Applicant: ASML NETHERLANDS BV

Inventor： GROENEVELD ROGIER HERMAN MATHI ,  LOOPSTRA ERIK ROELOF ,  BURGHOORN JACOBUS ,  LEVASIER LEON MARTIN ,  STRAAIJER ALEXANDER

IPC: G01B11/00 ,  G03F9/00 ,  G01B15/00 ,  G03F7/20 ,  G03F7/213 ,  H01L21/027

Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.

公开(公告)号：SG152898A1

公开(公告)日：2009-06-29

申请号：SG2003056066

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JEUNINK ANDRE BERNARDUS ,  MEGENS HENRY ,  KOREN NAVARRO Y ,  TOLSMA HOITE PIETER THEODOOR ,  SIMONS HUBERTUS JOHANNES GERTRUDUS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  BOK LEE YOUNG ,  DUNBAR ALLAN REUBEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26 ,  G03F7/207

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

公开(公告)号：SG148015A1

公开(公告)日：2008-12-31

申请号：SG2004029625

申请日：2004-05-26

Applicant: ASML NETHERLANDS BV

Inventor： GEORGE RICHARD ALEXANDER ,  CHENG-QUN GUI ,  DE JAGER PIETER WILLEM HERMAN ,  VAN LEEUWEN ROBBERT EDGAR ,  BURGHOORN JACOBUS

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: Lithographic Apparatus and Device Manufacturing Method Lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.