中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

31 records (took 0.023 seconds)

    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND VARIABLE ATTENUATOR
    21.
    发明专利
    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND VARIABLE ATTENUATOR 未知

    公开(公告)号：SG115769A1

    公开(公告)日：2005-10-28

    申请号：SG200501615

    申请日：2005-03-17

    Applicant: ASML NETHERLANDS BV

    Inventor： VOORMA HARM-JAN ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  MICKAN UWE

    IPC: H01L21/027 ,  G03F7/20

    Abstract: A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator A is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator A comprises two parallel mirrors 21 and 22 positioned such that an input beam of radiation is incident on a first of the mirrors 21 by which it is reflected towards a second of the mirrors 22 by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors 21 and 22 such that the mirrors 21 and 22 remain parallel to one another and the angles of incidence of the beams on the mirrors 21 and 22 are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

    ACTUATOR SYSTEM, LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE POSITION OF A COMPONENT AND DEVICE MANUFACTURING METHOD.
    25.
    发明专利
    ACTUATOR SYSTEM, LITHOGRAPHIC APPARATUS, METHOD OF CONTROLLING THE POSITION OF A COMPONENT AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2003751A

    公开(公告)日：2010-06-15

    申请号：NL2003751

    申请日：2009-11-04

    Applicant: ASML NETHERLANDS BV

    Inventor： VRIES GOSSE ,  BUIS EDWIN ,  MICKAN UWE

    IPC: G03F9/00 ,  H01L21/68

    Abstract: An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

    LITHOGRAPHIC METHOD AND APPARATUS.
    27.
    发明专利
    LITHOGRAPHIC METHOD AND APPARATUS. 未知

    公开(公告)号：NL2005958A

    公开(公告)日：2011-08-10

    申请号：NL2005958

    申请日：2011-01-06

    Applicant: ASML NETHERLANDS BV

    Inventor： MICKAN UWE ,  OOSTEN ANTON

    IPC: G03F7/20

    Abstract: A lithographic method for irradiating resist on a substrate, the resist filling a region located between a first element located on the substrate, and a second element located on the substrate, the first element having a first length, a first width, and a first height, the second element having a second length, a second width, and a second height, the first height being substantially equal to the second height, the first length being substantially parallel to the second length, and extending in a first direction, a distance between facing sidewalls of the first element and the second element that defines the region filled with resist being less than a wavelength of radiation used to irradiate the resist, the method including irradiating the resist with elliptically polarized radiation, the elliptically polarized radiation being configured such that, at the first height and second height, the elliptically polarized radiation is polarized perpendicular to the first direction, substantially perpendicular to the first and second lengths.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, AS WELL AS A DEVICE MANUFACTURING THEREBY
    30.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD, AS WELL AS A DEVICE MANUFACTURING THEREBY 未知

    公开(公告)号：SG113566A1

    公开(公告)日：2005-08-29

    申请号：SG200500186

    申请日：2005-01-13

    Applicant: ASML NETHERLANDS BV

    Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  FRANKEN JOHANNES CHRISTIAN LEO ,  MICKAN UWE ,  VOORMA HARM-JAN

    IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

    Abstract: A lithographic apparatus comprising an illumination system (IL) for providing a projection beam of radiation (PB), a support structure (MT) for supporting patterning means (MA), the patterning means (MA) serving to impart the projection beam (PB) with a pattern in its cross-section. The apparatus further comprises a substrate table (WT) for holding a substrate (W), a projection system (PL) for projecting the patterned beam onto a target portion of the substrate (W), and a collector (1; 101; 201) which is arranged for transmitting radiation (R), received from a first radiation source (SO), to the illumination system (IL). The apparatus comprises at least a heater (2; 102; 202) for heating the collector (1; 101; 201) when the collector receives substantially no radiation from the first radiation source (SO). The invention further provides a device manufacturing method as well as a device manufactured thereby.

Patent Agency Ranking