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公开(公告)号:DE19843959B4
公开(公告)日:2004-02-12
申请号:DE19843959
申请日:1998-09-24
Applicant: INFINEON TECHNOLOGIES AG
Inventor: DEBOY GERALD , HAEBERLEN OLIVER , STRACK HELMUT , RUEB MICHAEL , FRIZA WOLFGANG
IPC: H01L21/265 , H01L21/336 , H01L29/06 , H01L29/10 , H01L29/78 , H01L21/334 , H01L21/328
Abstract: The invention relates to a method for producing a semiconductor component including semiconductor areas of different conductivity types which are alternately positioned in a semiconductor body. The semiconductor areas of different conductivity types extend at least from one first zone to a position near a second zone. Because of variable doping in trenches and in the trench fillings, an electric field is generated which increases from both the first zone and the second zone.
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公开(公告)号:DE59707158D1
公开(公告)日:2002-06-06
申请号:DE59707158
申请日:1997-01-30
Applicant: INFINEON TECHNOLOGIES AG
Inventor: TIHANYI JENOE , STRACK HELMUT , GEIGER HEINRICH
IPC: H01L21/205 , H01L21/225 , H01L21/331 , H01L21/336 , H01L29/06 , H01L29/10 , H01L29/739 , H01L29/78
Abstract: The device has a drain zone (1,2) of a first conductivity type and a relatively insulated polycrystalline silicon gate electrode (6), with at least one zone of opposite type incorporated in the drain zone within which a source zone of the first conductivity type is formed. The drain zone incorporates a doped region (15) of the first conductivity type, incorporating a number of zones (16) of the opposite type, with the overall doping of the zones corresponding to the doping of the doped region.The relative spacing of the doped zones is less than the width of the spatial charge zone between the region of first conductivity type and the doped zones.
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公开(公告)号:DE10049861A1
公开(公告)日:2002-04-18
申请号:DE10049861
申请日:2000-10-09
Applicant: INFINEON TECHNOLOGIES AG
Inventor: STRACK HELMUT , DEBOV GERALD
IPC: H01L21/336 , H01L29/06 , H01L29/78
Abstract: The semiconductor element includes a semiconductor layer (10), which is arranged in the semiconductor body (11) and is adjacent to the barrier layer (2) of the semiconductor base body (1). A number of doped areas (13,15) are embedded in a first surface (12) of the semiconductor body forming a pattern for a cell field (ZF) of the semiconductor component. The pattern in the semiconductor layer is not adjusted to the pattern of the semiconductor base body. An Independent claim is also included for a method for manufacturing the semiconductor component.
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公开(公告)号:DE102014117700A1
公开(公告)日:2015-06-11
申请号:DE102014117700
申请日:2014-12-02
Applicant: INFINEON TECHNOLOGIES AG
Inventor: SCHULZE HANS-JOACHIM , WEBER HANS , JANTSCHER WOLFGANG , STRACK HELMUT , SCHUSTEREDER WERNER
IPC: H01L21/66 , H01L21/268 , H01L21/336 , H01L29/78
Abstract: Ein Verfahren zum Herstellen einer Halbleitervorrichtung umfasst ein Bilden einer Ladungskompensationsvorrichtungsstruktur in einem Halbleitersubstrat (105). Das Verfahren umfasst weiterhin ein Messen eines Wertes einer elektrischen Eigenschaft (αi), die auf die Ladungskompensationsvorrichtung bezogen ist. Wenigstens ein Parameter aus Protonenbestrahlungsund Ausheilparametern wird aufgrund des gemessenen Wertes eingestellt. Aufgrund des wenigstens einen Parameters der eingestellten Protonenbestrahlungs- und Ausheilparameter wird das Halbleitersubstrat (105) mit Protonen bestrahlt, und danach wird das Halbleitersubstrat (105) ausgeheilt.
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公开(公告)号:DE102009015722A1
公开(公告)日:2009-10-29
申请号:DE102009015722
申请日:2009-03-31
Applicant: INFINEON TECHNOLOGIES AG
Inventor: KROENINGER WERNER , SCHWAIGER JOSEF , SCHNEIDER LUDWIG , GEITNER OTTMAR , BRUNNBAUER MARKUS , MEYER THORSTEN , OTREMBA RALF , HOEGLAUER JOSEF , STRACK HELMUT , SCHLOEGEL XAVER
Abstract: A semiconductor module. One embodiment provides at least two semiconductor chips placed on a carrier. The at least two semiconductor chips are then covered with a molding material to form a molded body. The molded body is thinned until the at least two semiconductor chips are exposed. Then, the carrier is removed from the at least two semiconductor chips. The at least two semiconductor chips are singulated.
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公开(公告)号:DE102004044619B4
公开(公告)日:2009-07-16
申请号:DE102004044619
申请日:2004-09-13
Applicant: INFINEON TECHNOLOGIES AG
Inventor: MAUDER ANTON , SCHULZE HANS-JOACHIM , STRACK HELMUT
IPC: H01L27/08 , H01L21/822 , H01L29/06 , H01L29/739 , H01L29/78 , H01L29/872
Abstract: A capacitor structure in trench structures of a semiconductor device includes conductive regions made of metallic and/or semiconducting materials. The conducting regions are surrounded by a dielectric and form stacked layers in the trench structure of the semiconductor device.
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公开(公告)号:DE102007035608A1
公开(公告)日:2009-02-05
申请号:DE102007035608
申请日:2007-07-30
Applicant: INFINEON TECHNOLOGIES AG
Inventor: MAUDER ANTON , NIEDERNOSTHEIDE FRANZ-JOSEF , SCHULZE HANS-JOACHIM , STRACK HELMUT , HARTUNG HANS , LICHT THOMAS
IPC: H01L23/28 , H01L21/50 , H01L23/15 , H01L23/488
Abstract: The module (1) has a flexible group layer (2) with a semiconductor chip (3) e.g. thyristor, arranged on a circuit substrate (4). A connecting element (5) connects an electrode (7) of the semiconductor chip with a contact connection surface (8) of the substrate. A cover (11) has the flexible group layer in which the chip, connecting element and substrate are embedded. The module includes a diffusion inhibiting protective layer (12) between the flexible group layer and upper side and edge side of the chip, and between the connecting element and substrate. The semiconductor chip is selected from insulated gate bipolar transistor (IGBT), thyristor, gate turn-off thyristor (GTO), free wheel or rectifier diode. An independent claim is also included for a method for fabricating a semiconductor module.
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公开(公告)号:DE102006021959A1
公开(公告)日:2007-11-15
申请号:DE102006021959
申请日:2006-05-10
Applicant: INFINEON TECHNOLOGIES AG
Inventor: OTREMBA RALF , STRACK HELMUT
IPC: H01L23/48 , H01L25/07 , H01L29/739 , H01L29/78
Abstract: The power semiconductor device comprises vertical MOSFETs and insulated gate bipolar transistors as power semiconductor chip component (6), a stack from a vertical junction field effect transistor and the MOSFET, a bridge circuit, a cascade circuit made of stacked semiconductor chips, connecting elements (12) with circuit board segments (27) and through-contacts (25), and a bonding wire to a contact surface of a control electrode. The chip component has electrodes on its upper- and lower side with a large surface area. The power semiconductor device comprises vertical MOSFETs and insulated gate bipolar transistors as power semiconductor chip component (6), a stack from a vertical junction field effect transistor and the MOSFET, a bridge circuit, a cascade circuit made of stacked semiconductor chips, connecting elements (12) with circuit board segments (27) and through-contacts (25), and a bonding wire to a contact surface of a control electrode. The chip component has electrodes on its upper- and lower side with a large surface area. The electrodes extend almost along the entire chip component and are electrically connected over the connecting elements with external contacts (13). The chip component and the connecting elements are embedded in a plastic full package-housing, which has a compacted superimposed plastic layers (15, 16) with parallel and planar upper surfaces. On one of the upper surfaces, the connecting elements are arranged as a structured metal layer in a peripheral wiring layer and are electrically connected with the electrodes and the external contacts over the through-contacts that pass through one of the plastic layers. The metal layer is formed by means of a physical vapor deposition or by means of a galvanic or chemical deposition process, exhibits different layer thicknesses and comprises several connecting elements that are electrically isolated from one another. A further semiconductor chip and/or a passive component are arranged on the circuit board segments. The circuit board segment is intended as a chip-carrier. An upper region of the circuit board segment consists of a connection region for wire bonding. The lower sides of the power semiconductor device are plastic surfaces. An external flat-strip conductor protrudes out of the marginal sides of the plastic housings, which are embedded in a bottom plastic layer of the plastic housing. The second plastic layer encases the first layer of plastic and forms the outer contour of the plastic housing. The flat-strip conductor panel is made of a super SO or a TO 220 or TO 252 type of housing. The chip component is arranged in the lower plastic layer on a chip carrier with its lower-sided electrode and on a counter electrode with a large surface area exhibiting a smaller contact surface. The chip component is mounted on the chip carrier by means of diffusion solder, a soft solder or an electrically conductive adhesive. The circuit board segment with a lower thickness is covered by a second plastic layer. The thicker circuit board segment is held free of the second plastic layer. The connecting elements are embedded in a third plastic layer. Two b switches are arranged on the first plastic layer with the metal layer and two low-side switches are arranged on the circuit board segments and on the second plastic layer. A first semiconductor transistor is electrically connected with the flat-strip conductor over the first connecting element. The drain electrodes of the two high-side switches are mounted on the chip carrier and are electrically interconnected with one another. The two high-side switches are intended in a single semiconductor unit or are intended as separate power semiconductor chip components. An independent claim is included for a procedure for production of a power semiconductor device.
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公开(公告)号:DE10262103B4
公开(公告)日:2007-07-19
申请号:DE10262103
申请日:2002-09-27
Applicant: INFINEON TECHNOLOGIES AG
Inventor: TIHANYI JENOE , SCHULZE HANS-JOACHIM , MAUDER ANTON , STRACK HELMUT
IPC: H01L29/861 , H01L21/328 , H01L29/739 , H01L29/74 , H01L29/78
Abstract: Doping process comprises preparing a semiconductor body (2) with a base dopant of first conductivity, producing crystal defects in the semiconductor body, introducing hydrogen ions from a first surface (3, 4) into the semiconductor body, and heat treating in which temperature and duration are selected so that hydrogen atoms are introduced over the whole crystal defect region of the semiconductor body. An independent claim is also included for a semiconductor component produced by the above process.
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公开(公告)号:AT334480T
公开(公告)日:2006-08-15
申请号:AT99929017
申请日:1999-04-22
Applicant: INFINEON TECHNOLOGIES AG
Inventor: DEBOY GERALD , STENGL JENS-PEER , STRACK HELMUT , WEBER HANS , GRAF HEIMO , RUEB MICHAEL , AHLERS DIRK
IPC: H01L21/336 , H01L29/06 , H01L29/417 , H01L29/423 , H01L29/78
Abstract: A semiconductor component has a semiconductor body comprising a blocking pn junction, a source zone of a first conductivity type connected to a first electrode and bordering on a zone forming the blocking pn junction of a second conductivity type complementary to the first conductivity type, and a drain zone of the first conductivity type connected to a second electrode. The side of the zone of the second conductivity type facing the drain zone forms a first surface, and in the region between the first surface and a second surface located between the first surface and the drain zone, comprises areas of the first and second conductivity type nested in one another. The second surface is positioned at a distance from the drain zone such that the areas of the first and second conductivity type nested in each other do not reach the drain zone.
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