公开(公告)号：NL2005021A

公开(公告)日：2011-02-07

申请号：NL2005021

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  IVANOV VITALII ,  BOEF ARIE ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G01N21/64 ,  G03F1/00 ,  H01L21/66

公开(公告)号：NL2004815A

公开(公告)日：2010-12-20

申请号：NL2004815

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2012694A

公开(公告)日：2014-11-10

申请号：NL2012694

申请日：2014-04-25

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  MATHIJSSEN SIMON ,  TINNEMANS PATRICIUS

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2010259A

公开(公告)日：2013-10-16

申请号：NL2010259

申请日：2013-02-07

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： KREUZER JUSTIN ,  BOEF ARIE ,  MATHIJSSEN SIMON

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2005992A

公开(公告)日：2011-09-23

申请号：NL2005992

申请日：2011-01-12

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM ,  BOEF ARIE ,  KRUIJT-STEGEMAN YVONNE ,  RAKHIMOVA TATYANA ,  LOPAEV DMITRIY ,  GLUSHKOV DENNIS ,  YAKUNIN ANDREI ,  KOOLE ROELOF

IPC: G03F7/00

Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.

公开(公告)号：NL2006131A

公开(公告)日：2011-09-13

申请号：NL2006131

申请日：2011-02-03

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  KHUAT DUY LAURENT ,  SARRI DIMITRA

IPC: G03F7/20

Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.

公开(公告)号：NL2005975A

公开(公告)日：2011-09-06

申请号：NL2005975

申请日：2011-01-10

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

公开(公告)号：NL2004656A

公开(公告)日：2010-11-15

申请号：NL2004656

申请日：2010-05-04

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  CRAMER HUGO ,  HINNEN PAUL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2004405A

公开(公告)日：2010-10-11

申请号：NL2004405

申请日：2010-03-16

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE

IPC: H01L21/66 ,  H01L23/544

公开(公告)号：NL2003404A

公开(公告)日：2010-03-17

申请号：NL2003404

申请日：2009-08-28

Applicant: ASML NETHERLANDS BV

Inventor： BHATTACHARYYA KAUSTUVE ,  SCHAAR MAURITS ,  BOEF ARIE ,  KERKHOF MARCUS

IPC: G01N21/47 ,  G03F7/20