公开(公告)号：AT489619T

公开(公告)日：2010-12-15

申请号：AT08723915

申请日：2008-03-21

Applicant: ASML NETHERLANDS BV

Inventor： SNEL ROBERT ,  BLEEKER ARNO JAN ,  VAN BRUG HEDSER

IPC: G01N21/94 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

Abstract: A method of imaging radiation from an object on a detection device. The method includes directing a beam of coherent radiation to the object, scanning the beam of radiation over an angle in or out of a plane of incidence relative to the object, and imaging scattered radiation from the object on the detection device.

公开(公告)号：NL1036614A1

公开(公告)日：2009-09-22

申请号：NL1036614

申请日：2009-02-23

Applicant: ASML NETHERLANDS BV

Inventor： KRIVTSUN VLADIMIR MIHAILOVITCH ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  CHURILOV SERGEY ,  GLUSHKOV DENIS

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：NL1035743A1

公开(公告)日：2009-02-10

申请号：NL1035743

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR VITALEVICH ,  BANINE VADIM YEVGENYEVICH ,  BLEEKER ARNO JAN ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  ANTSIFEROV PAVEL STANISLAVOVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027 ,  G03F7/20

公开(公告)号：SG146614A1

公开(公告)日：2008-10-30

申请号：SG2008065708

申请日：2006-12-15

Applicant: ASML NETHERLANDS BV

Inventor： TROOST KARS ZEGER ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  GREENEICH JAMES SHERWOOD

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided. Figure 14b

公开(公告)号：SG139763A1

公开(公告)日：2008-02-29

申请号：SG2008007890

申请日：2005-08-12

Applicant: ASML NETHERLANDS BV

Inventor： DEN BOEF ARIE JEFFREY ,  BLEEKER ARNO JAN ,  VAN DOMMELEN YOURI JOHANNES LA ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  LUEHRMANN PAUL FRANK ,  PELLEMANS HENRICUS PETRUS MARI ,  VAN DER SCHAAR MAURITS ,  GROUWSTRA CEDRIC DESIRE ,  VAN KRAAIJ MARKUS GERARDUS MAR

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference. The apparatus according to the invention may be used for calculating variations in substrate tilt by putting a shaped obscuration in the radiation beam and detecting changes in the width and shape of the shaped obscuration on the substrate caused by variations in the substrate tilt. The shaped obscuration may be a cross-hair or any other shape. The idea of measuring wafer tilt is based on the fundamental relation that a tilt in the wafer plane causes a shift in the pupil plane.

公开(公告)号：SG130007A1

公开(公告)日：2007-03-20

申请号：SG2003034709

申请日：2003-06-10

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARI ,  BLEEKER ARNO JAN ,  LOOPSTRA ERIK ROELOF ,  BORGGREVE HARRY

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus uses the control signal from a computer 10 to drive two spatial light modulators 11, 12 to pattern two separate projection beams 13, 14 for projection onto two substrates 19, 20.

公开(公告)号：SG129369A1

公开(公告)日：2007-02-26

申请号：SG200604590

申请日：2006-07-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  BLEEKER ARNO JAN ,  MULDER HEINE MELLE ,  NOORDMAN OSCAR FRANCISCUS JOSZ ,  SENGERS TIMOTHEUS FRANCISCUS ,  JORRITSMA LAURENTIUS CATRINUS ,  TRENTELMAN MARK ,  STREUTKER GERRIT

Abstract: In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.

公开(公告)号：SG123713A1

公开(公告)日：2006-07-26

申请号：SG200508043

申请日：2005-12-13

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BLEEKER ARNO JAN ,  BASELMANS JOHANNES JACOBUS MAT ,  DIERICHS MARCEL MATHIJS THEODO ,  WAGNER CHRISTIAN ,  RYZHIKOB LEV ,  SMIRNOV STANISLAV Y ,  TROSST KARS ZEGER

Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

公开(公告)号：SG122902A1

公开(公告)日：2006-06-29

申请号：SG200507115

申请日：2005-11-18

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BLEEKER ARNO JAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  NELSON MICHAEL L ,  ROUX STEPHEN

Abstract: A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus (400) has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system (408) having a projection element (442-2) for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator (468) for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

公开(公告)号：DE60025303D1

公开(公告)日：2006-03-30

申请号：DE60025303

申请日：2000-02-09

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN

IPC: G03F7/20 ,  H01L21/027 ,  H01J37/317

Abstract: A lithographic projection device according to the present invention includes a first radiation source which supplies a projection beam of radiation of a first type, a mask table for holding a mask, a substrate table for holding a substrate and a projection system for imaging a portion of the mask, irradiated by the projection beam, onto a target portion of the substrate. Further, a second radiation source supplies a second beam of radiation of a second type which can be directed onto the substrate and a controller which patterns the second beam of radiation so that it impinges on the substrate in a particular pattern. The two radiation beams are controlled such that the sum of the fluxes of the radiation of the first and second type on the substrate causes an elevation of the substrate temperature which is substantially constant across at least a given area of the substrate.