公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004343113A

公开(公告)日：2004-12-02

申请号：JP2004142011

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： REUHMAN-HUISKEN MARIA ELISABET ,  DE MOL CHRISTIANUS GERARDUS MA ,  TOLSMA HOITE PIETER THEODOOR

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70616 ,  G03F7/70633 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a device, by which process steps are characterised and yield is improved, using a lithographic equipment.
SOLUTION: The method is to monitor deformation of a substrate wafer during treatment of a wafer. After each exposure and treatment process, distortion of the substrate wafer is measured by comparing positions of a plurality of reference marks 20 with values of the database.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2009135425A

公开(公告)日：2009-06-18

申请号：JP2008238306

申请日：2008-09-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE MOL CHRISTIANUS GERARDUS MA ,  REUHMAN-HUISKEN MARIA ELISABET

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03F9/7003 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method for efficiently characterizing similarity between measurement values of a plurality of entities.
SOLUTION: The method for characterizing similarity between the measurement values of a plurality of entities including the first entity and the second entity includes a step for receiving measurement values taken at a plurality of measurement points in each entity. A model provided with a probability process, a set of parameters and a model function having values depending on the measurement points is defined. Then a set (β) of parameters is estimated by fitting the model function to the measurement values. In a succeeding step, residual data are determined at least on a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurement values. Then, a correlation coefficient of the first entity (i') and the second entity (i") is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurement values. In the method, the model is defined so that the residual data are expected to have a deterministic component for controlling an estimation value of the correlation coefficient depending on the measurement points. The correlation coefficient is estimated by using an estimation value of an entity average residual averaged by the measurement points of the first entity and an estimation value of an entity average residual averaged by the measurement points of the second entity.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于有效地表征多个实体的测量值之间的相似性的方法。 解决方案：用于表征包括第一实体和第二实体的多个实体的测量值之间的相似度的方法包括用于接收在每个实体中的多个测量点处获取的测量值的步骤。 定义了具有概率过程，一组参数和具有取决于测量点的值的模型函数的模型。 然后通过将模型函数拟合到测量值来估计参数的集合（β）。 在接下来的步骤中，通过从测量值中减去拟合函数，至少在第一实体和第二实体的多个测量点的一部分上确定残差数据。 然后，基于所确定的残差数据来估计第一实体（i'）和第二实体（i“）的相关系数，并且使用估计的相关系数来表征测量值之间的相似度，在该方法中， 模型被定义为使得残差数据被期望具有用于根据测量点来控制相关系数的估计值的确定性分量，通过使用由测量点平均的实体平均残差的估计值来估计相关系数 的第一个实体的平均估计值和由第二个实体的测量点平均的实体平均残差的估计值。版权所有：（C）2009，JPO＆INPIT

公开(公告)号：JP2008211233A

公开(公告)日：2008-09-11

申请号：JP2008104954

申请日：2008-04-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： REUHMAN-HUISKEN MARIA ELISABET ,  DE MOL CHRISTIANUS GERARDUS MA ,  TOLSMA HOITE PIETER THEODOOR

IPC: G03F9/00 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70633 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method that improves the yield.
SOLUTION: Deformation of a substrate wafer is measured by comparing positions of a plurality of reference marks with values of a data base after their exposure and process step. For taking into consideration the measured deformation and the compared results in step S1, the development step of an exposure and development step S2 is controlled using the feedforward loop. Then, a position alignment measurement step S3 is performed, in which the alignment relationship between the continuing two layers deposited on the substrate W during consecutive cycles is measured. If the positional control of a latest layer with respect to its preceding layer is insufficient, the latest layer is removed and a new layer is deposited.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供提高产量的装置制造方法。 解决方案：通过将多个参考标记的位置与其曝光和处理步骤之后的数据库的值相比较来测量衬底晶片的变形。 为了在步骤S1中考虑测量的变形和比较结果，使用前馈回路来控制曝光和显影步骤S2的显影步骤。 然后，进行位置对准测量步骤S3，其中测量在连续循环期间沉积在基板W上的连续两层之间的对准关系。 如果相对于其前一层的最新层的位置控制不足，则移除最新层并且存储新层。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.