Abstract:
PROBLEM TO BE SOLVED: To provide a light-emitting semiconductor chip 1 which comprises an array 3 of semiconductor layers containing an activity layer 2 which forms electromagnetic radiation, and a passivation layer 12, disposed in the exit side of the array of the layers and which enables radiation emission to be adjusted and set to a target range during the manufacturing period to be more simple and lower cost than in the conventional technology. SOLUTION: The passivation layer has partially absorbing properties, and the transmittance to the radiation emitted from the array of the semiconductor layers during the operation of the semiconductor chip, can be adjusted during the manufacturing period of the passivation layer. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
The invention relates to an optoelectronic semiconductor chip (10), which comprises a semiconductor body (1) made of semiconductor material, a p-contact layer (21a) and an n-contact layer (2). The semiconductor body (1) comprises an active layer (1a) provided for generating radiation. The semiconductor body has a p-side (1c) and an n-side (1b), between which the active layer (1a) is arranged. The p-contact layer (21a) is provided for electrical contacting of the p-side (1c). The n-contact layer (2) is provided for electrical contacting of the n-side (1b). The n-contact layer (2) contains a TCO layer (2a) and a mirror layer (2b), wherein the TCO layer (2a) is arranged between the n-side (1b) of the semiconductor body (1) and the mirror layer (2b).
Abstract:
The invention relates to an optoelectronic semiconductor body (1) having an active semiconductor layer sequence (10) and a reflective layer system (20). The reflective layer system (20) is provided with a first radiation-permeable layer (21) abutting the semiconductor layer sequence (10), and with a metal layer (23) on the side of the first radiation-permeable layer (21) facing away from the semiconductor layer sequence (10). The first radiation-permeable layer (21) includes a first dielectric material. Between the first radiation-permeable layer (21) and the metal layer (23), a second radiation-permeable layer (22) is arranged containing an adhesion-improving material. The metal layer (23) is applied directly on the adhesion-improving material. The adhesion-improving material differs from the first dielectric material and is selected such that the adhesion on the metal layer (23) is improved over the adhesion on the first dielectric material.
Abstract:
The invention relates to a radiation-emitting body, comprising a layer sequence, having an active layer (10) for producing electromagnetic radiation, a reflection layer (50), which reflects the radiation produced, and at least one intermediate layer (40), which is disposed between the active layer (10) and the reflection layer (50). To this end, the active layer (10) on an interface (15) directed toward the reflection layer (50) comprises a rough region, and the reflection layer (50) is substantially planar on an interface (45) directed toward the active layer (10). The invention further relates to a method for producing a radiation-emitting body, wherein a layer sequence is configured on a substrate having an active layer (10) for producing electromagnetic radiation. To this end, an interface (15) is roughened on the active layer (10) and at least one intermediate layer (40) and a reflection layer (50) are configured.
Abstract:
An optoelectronic semiconductor component with a semiconductor body (10) and a current spreading layer (3) is disclosed. The current spreading layer (3) is applied at least on parts of the semiconductor body (10). The current spreading layer (3) contains a metal (1) that forms a transparent, electroconductive metal oxide (2) in the current spreading layer, and the concentration (x) of the metal (1) decreases from the side of the current spreading layer (3) facing the semiconductor body (10) to the side of the current spreading layer (3) away from the semiconductor body (10). Also disclosed is a method for producing this type of semiconductor component.
Abstract:
Es wird ein optoelektronischer Halbleiterchip mit einer Halbleiterschichtenfolge (1) mit einem aktiven Bereich (2) auf einem Substrat (5) und mit einer Spiegelschicht (3) angegeben, die vollständig in einer Schicht (4) mit einem transparenten leitenden Oxid eingebettet ist. Weiterhin wird ein Verfahren zur Herstellung eines optoelektronischen Halbleiterchips angegeben.
Abstract:
Semi-conductor unit has semi-conductor base (10) at least partly laid on a current expansion layer (3). Layer contains metal (1) which forms a transparent conductive metal oxide (2). The concentration of metal decreases moving from the side of the expansion layer facing the semi-conductor base to the side of the layer turned away from the semi-conductor base. Method to make semi-conductor part involves firstly putting on metal layer on the base, secondly putting on a metal oxide on the metal layer and lastly heat treating the layers to produce the current expansion layer.