Process and apparatus for treatment of volatile organic compounds
    7.
    发明授权
    Process and apparatus for treatment of volatile organic compounds 有权
    用于处理挥发性有机化合物的方法和装置

    公开(公告)号:US09504935B2

    公开(公告)日:2016-11-29

    申请号:US14379386

    申请日:2012-11-02

    Inventor: Yi-Cheng Lin

    Abstract: A process and apparatus for treatment of volatile organic compounds and the process comprises an untreated airflow dew point temperature sensing step of sensing a dew point temperature of the untreated airflow as a reference temperature, a humidification and condensation processing step of spraying water mist all over the exhaust gas flow and condensing the exhaust gas flow into condensate contained the volatile organic compounds, a treated exhaust gas flow dew point temperature sensing step of sensing a dew point temperature of the treated exhaust gas flow after the humidification and condensation processing step, a collection step of collecting dropped condensate from the humidification and condensation processing step and then transporting the dropped condensate back to the humidification and condensation processing step for circulation spray, and a control step of controlling the dew point temperature of the treated exhaust gas flow to be close to the reference temperature.

    Abstract translation: 一种用于处理挥发性有机化合物的方法和装置,该方法包括:未处理气流露点温度检测步骤,用于检测未处理气流的露点温度作为参考温度;加湿和冷凝处理步骤, 排气流并将废气流冷凝成含有挥发性有机化合物的处理废气流露点温度检测步骤,其在加湿冷凝处理步骤之后检测经处理的废气流的露点温度;收集步骤 从加湿冷凝处理步骤收集掉的冷凝物,然后将滴下的冷凝物输送到用于循环喷雾的加湿冷凝处理步骤,以及控制处理废气流的露点温度接近于 参考温度。

    SUBSTRATE PROCESSING METHOD
    9.
    发明申请
    SUBSTRATE PROCESSING METHOD 审中-公开
    基板处理方法

    公开(公告)号:US20160089696A1

    公开(公告)日:2016-03-31

    申请号:US14849845

    申请日:2015-09-10

    Inventor: Masahiro KIMURA

    Abstract: A substrate processing method includes the steps of cleaning a substrate in a processing tank, forming an organic solvent vapor atmosphere in a chamber, elevating the substrate to replace a rinse on a surface of the substrate with an organic solvent, draining the rinse from the processing tank, moving the substrate into the processing tank, making the surface of the substrate water-repellent, elevating the substrate and supplying an organic solvent vapor to the substrate to remove water repellent from the surface of the substrate, and drying the substrate with inert gas. The water repellent is removed above the processing tank, and thus the substrate can be dried while contamination of the substrate with particles that can be generated in the processing tank in this step is suppressed.

    Abstract translation: 基板处理方法包括以下步骤:清洗处理槽中的基板,在室内形成有机溶剂蒸气气氛,升高基板,用有机溶剂代替基板表面上的冲洗液,从处理液中排出冲洗液 将基板移动到处理槽中,使基板的表面防水,升高基板并向基板提供有机溶剂蒸气以除去基材表面的斥水性,并用惰性气体干燥基板 。 在处理槽上方除去防水剂,因此能够抑制基板的干燥,同时在该工序中能够在处理槽中产生的颗粒污染基板。

    Cover sleeve and apparatus for loading material into a stent strut
    10.
    发明授权
    Cover sleeve and apparatus for loading material into a stent strut 有权
    用于将材料装入支架支架的套筒和装置

    公开(公告)号:US09253992B2

    公开(公告)日:2016-02-09

    申请号:US14268820

    申请日:2014-05-02

    Abstract: An apparatus for loading material into a stent strut can comprise a cover sleeve. The cover sleeve is elastic so that it can reduce in diameter so as to press against the stent strut, and expand in diameter so as to be spaced apart from the stent strut. The stent strut can include a lumen into which material is injected. When pressed against the stent strut, the cover sleeve seals side openings to the lumen and prevents injected material from leaking out of the side openings during the injection process.

    Abstract translation: 用于将材料装载到支架支柱中的装置可以包括盖套筒。 盖套是弹性的,使得其可以减小直径以便压靠支架支柱,并且直径扩大以与支架支柱间隔开。 支架支架可以包括注射材料的内腔。 当压靠支架支柱时,盖套筒将侧开口密封到内腔,并防止在注射过程中注入材料从侧开口泄漏出来。

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