公开(公告)号：US20190185991A1

公开(公告)日：2019-06-20

申请号：US16273037

申请日：2019-02-11

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Allen R. Kirkpatrick ,  Michael J. Walsh

IPC: C23C14/58 ,  H01J37/05 ,  G02B1/12 ,  G02B1/02 ,  H01J37/32 ,  H01J37/317

CPC classification number: C23C14/5833 ,  G02B1/02 ,  G02B1/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/3171 ,  H01J37/32816 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  Y10T428/30

Abstract: A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

公开(公告)号：US20190027340A1

公开(公告)日：2019-01-24

申请号：US15997899

申请日：2018-06-05

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Satoru Hirose ,  Rieko Nishimura ,  Ryosuke Ueba

IPC: H01J37/302 ,  H01J37/20 ,  H01J37/147 ,  H01J37/317

CPC classification number: H01J37/3026 ,  G03F1/78 ,  H01J37/147 ,  H01J37/20 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/31762 ,  H01J2237/31774 ,  H01J2237/31776 ,  H01J2237/31798

Abstract: A charged particle beam writing apparatus includes a writing data generation circuitry to input character information or information of an item selected, for specifying an apparatus quality check pattern used for evaluating apparatus quality of a charged particle beam writing apparatus, and to generate writing data of the apparatus quality check pattern based on the character information or the information of the item selected, and a combination circuitry to input writing data of an actual chip pattern to be written on a target object, and to combine the writing data of the actual chip pattern and the writing data of the apparatus quality check pattern such that the actual chip pattern and the apparatus quality check pattern do not overlap with each other.

公开(公告)号：US20180321583A1

公开(公告)日：2018-11-08

申请号：US16040385

申请日：2018-07-19

Applicant: Laurence B. Tarrant ,  Richard C. Svrluga ,  Sean R. Kirkpatrick

Inventor： Laurence B. Tarrant ,  Richard C. Svrluga ,  Sean R. Kirkpatrick

IPC: G03F1/80 ,  H01L21/265 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01L21/02 ,  H05H3/02 ,  H01L21/311 ,  B24B37/04 ,  H01L29/36

CPC classification number: G03F1/80 ,  B24B37/04 ,  G03F1/82 ,  H01J37/05 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H01L21/02115 ,  H01L21/02274 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26566 ,  H01L21/31105 ,  H01L21/31111 ,  H01L29/36 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A bone implantable medical device made from a biocompatible material, preferably comprising titania or zirconia, has at least a portion of its surface modified to facilitate improved integration with bone. The implantable device may incorporate a surface infused with osteoinductive agent and/or may incorporate holes loaded with a therapeutic agent. The infused surface and/or the holes may be patterned to determine the distribution of and amount of osteoinductive agent and/or therapeutic agent incorporated. The rate of release or elation profile of the therapeutic agent may be controlled. Methods for producing such a bone implantable medical device are also disclosed and employ the use of accelerated Neutral Beam irradiation, wherein the Neutral Beam is derived from an accelerated gas cluster ion beam irradiation for improving bone integration.

公开(公告)号：US20180211813A1

公开(公告)日：2018-07-26

申请号：US15933121

申请日：2018-03-22

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga

IPC: H01J37/05 ,  H05H3/02 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  A61F2/82 ,  A61F2/90 ,  A61F2240/001 ,  A61F2250/0068 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A medical device for surgical implantation adapted to serve as a drug delivery system has one or more drug loaded holes with barrier layers to control release or elution of the drug from the holes or to control inward diffusion of fluids into the holes. The barrier layers are non-polymers and are formed from the drug material itself by beam processing. The holes may be in patterns to spatially control drug delivery. Flexible options permit combinations of drugs, variable drug dose per hole, multiple drugs per hole, temporal control of drug release sequence and profile. Methods for forming such a drug delivery system are also disclosed. Gas cluster ion beam and/or accelerated Neutral Beam derived from an accelerated gas cluster ion beam may be employed.

公开(公告)号：US20180174798A1

公开(公告)日：2018-06-21

申请号：US15897954

申请日：2018-02-15

Applicant: Dimitry BOGUSLAVSKY ,  Mark KOVLER

Inventor： Dimitry BOGUSLAVSKY ,  Mark KOVLER

IPC: H01J37/305 ,  G01N1/32 ,  H01J37/147 ,  H01J37/20

CPC classification number: H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2873 ,  H01J37/147 ,  H01J37/20 ,  H01J2237/0827 ,  H01J2237/1505 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods, apparatuses, systems and software for ion beam milling or machining are disclosed. The apparatus includes a specimen holder, a table, one or more ion sources, rotatable ion optics, and an imaging device. The specimen holder is configured to hold a specimen in a stationary position during milling or machining. The table is configured to change the stationary position of the specimen holder in any of three orthogonal linear directions and an angular direction. The rotatable ion optics are configured to emit an ion beam towards a predetermined location on the specimen from any of the one or more ion sources at any angle around an axis that is orthogonal to a horizontal surface of the table when the angular direction of the table is 0°. The imaging device is configured to generate an image of the specimen including the predetermined location, thereby enabling real-time monitoring of the milling or machining process.

公开(公告)号：US10002740B2

公开(公告)日：2018-06-19

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Ryo Tajima ,  Kenichi Suematsu ,  Kenji Watanabe ,  Yasushi Toma ,  Kenji Terao ,  Takeshi Murakami

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0268 ,  H01J2237/16 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US20180158646A1

公开(公告)日：2018-06-07

申请号：US15830304

申请日：2017-12-04

Applicant: JEOL Ltd.

Inventor： Akiho Nakamura

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/20 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2804 ,  H01J2237/2809

Abstract: There is provided a method of image acquisition capable of reducing the effects of diffraction contrast. This method of image acquisition is implemented in an electron microscope for generating electron microscope images with electrons transmitted through a sample. The method starts with obtaining the plural electron microscope images while causing relative variations in the direction of incidence of an electron beam with respect to the sample. An image is generated by accumulating the plural electron microscope images.

公开(公告)号：US20180151326A1

公开(公告)日：2018-05-31

申请号：US15364163

申请日：2016-11-29

Applicant: FEI Company

Inventor： Erik René Kieft

IPC: H01J37/04 ,  H01J37/244 ,  H01J37/147 ,  H01J37/22

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0432 ,  H01J2237/152 ,  H01J2237/2802

Abstract: A method of investigating a specimen using charged particle microscopy, comprising the following steps: Using a primary source to produce a pulsed beam of charged particles that propagate along a beam path; Providing a specimen at an irradiation position in said beam path; Using a secondary source to produce repetitive excitations of the specimen; Using a detector to register charged particles in said beam that traverse the specimen after each said excitation, wherein: Said primary source is configured to produce a train of multiple pulses per excitation by said secondary source; Said detector is configured to comprise an integrated array of pixels, each with an individual readout circuit, to register a time-of-arrival of individual particles in said train.

公开(公告)号：US20180138013A1

公开(公告)日：2018-05-17

申请号：US15806576

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/147 ,  H01J37/244 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/24542 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/3045 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an aperture plate forming multiple beams, a stage on which a writing target substrate is placed, a stage position detector detecting the position of the stage, an inspection aperture plate provided in the stage, the inspection aperture plate permitting one of the multiple beams to pass through the inspection aperture plate, a deflector deflecting the multiple beams, a current detector detecting a beam current of each of the multiple beams scanned over the inspection aperture plate in X and Y directions and passed through the inspection aperture plate, and a control computer generating a beam image based on the detected beam currents and calculating positions of the beams based on the beam image and the position of the stage.

公开(公告)号：US09941094B1

公开(公告)日：2018-04-10

申请号：US15422454

申请日：2017-02-01

Applicant: FEI Company

Inventor： Leon van Kouwen ,  Gerard Nicolaas Anne van Veen

IPC: H01J37/08 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/08 ,  H01J37/147 ,  H01J37/261

Abstract: A source assembly for producing an ion beam and comprising a collision ionization ion source having: A pair of stacked plates, sandwiched about an intervening gap; An ionization space between said plates, connected to a gas supply duct; An input zone, provided in a first of said plates, to admit an input beam of charged particles to said ionization space; An output aperture, located opposite said input zone and provided in the second of said plates, to allow emission of a flux of ions produced in said ionization space by said input beam, which source assembly comprises: A carrier provided with a plurality of different collision ionization ion sources that mutually differ in respect of a gap height d between said plates; A selecting device, which allows a given one of said ion sources to be individually selected for production of said ion beam. The various sources in said plurality preferably have a scattering quotient QS=d/li with a value in a range 1-500, preferably in a range 1-200, where li is an ionic mean free path length in said ionization space.