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    Micro-column electron beam apparatus
    31.
    发明授权
    Micro-column electron beam apparatus 失效
    微柱电子束装置

    公开(公告)号：US07375351B2

    公开(公告)日：2008-05-20

    申请号：US11257244

    申请日：2005-10-24

    Applicant: Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    Inventor： Sang Kuk Choi ,  Dae Jun Kim ,  Jin Woo Jeong ,  Dae Yong Kim

    IPC: G21G5/00

    CPC classification number: H01J37/067 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1502 ,  H01J2237/2818

    Abstract: Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens module can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module that is mounted over the base, supports the electron beam source tip module at a central portion thereof, and includes a three-coupling pan spring plate portion including first through third spring units that are coupled to the electron beam source tip module in three directions on a plane perpendicular to the vertical axis, which vertically passes the center of the electron beam source tip module, to elastically support the electron beam source tip module in three directions; a first piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a first axis perpendicular to the vertical axis; and a second piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a second axis perpendicular to the vertical axis and the first axis.

    Abstract translation: 本发明提供一种微柱电子束装置，包括：基底; 电子透镜支架，其上可以固定电子透镜模块，安装在基座的中心部分; 垂直设置在电子透镜模块上的电子束源头模块; 安装在基座上方的平板弹簧板台模块在其中心部分处支撑电子束源头模块，并且包括三联盘盘弹簧板部分，其包括耦合到电子束源的第一至第三弹簧单元 尖端模块在垂直于垂直轴线的平面上垂直通过电子束源头模块的中心，在三个方向弹性支撑电子束源头模块; 第一压电致动器，其联接到所述盘簧板模块以沿着垂直于所述垂直轴线的第一轴线移动所述电子束源尖端模块; 以及耦合到盘簧级模块的第二压电致动器，用于沿垂直于垂直轴线和第一轴线的第二轴线移动电子束源尖端模块。

    Ion beam device
    38.
    发明授权
    Ion beam device 有权
    离子束装置

    公开(公告)号：US09508521B2

    公开(公告)日：2016-11-29

    申请号：US14328754

    申请日：2014-07-11

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Hiroyasu Shichi ,  Shinichi Matsubara ,  Norihide Saho ,  Masahiro Yamaoka ,  Noriaki Arai

    IPC: H01J27/00 ,  H01J27/02 ,  H01J27/26 ,  H01J37/02 ,  H01J37/067 ,  H01J37/08 ,  H01J37/28 ,  H01J37/26

    CPC classification number: H01J27/26 ,  H01J27/022 ,  H01J37/023 ,  H01J37/067 ,  H01J37/08 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/2803

    Abstract: An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.

    Abstract translation: 根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15） 构造成围绕发射器尖端（21），以及气体供应管（25）。 引出电极（24）的中心轴线与离​​子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座 （64）相对于所述电离室（15）的中心轴线是可倾斜的。 因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

    CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS
    39.
    发明申请
    CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS 有权
    充电颗粒光束发生装置，充电颗粒光束装置，高电压发生装置和高电位装置

    公开(公告)号：US20150179387A1

    公开(公告)日：2015-06-25

    申请号：US14406909

    申请日：2013-05-08

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Takashi Onishi ,  Shunichi Watanabe ,  Minoru Kaneda

    IPC: H01J29/48 ,  H01J27/02

    CPC classification number: H01J37/04 ,  H01J27/024 ,  H01J29/485 ,  H01J37/026 ,  H01J37/067 ,  H01J37/073 ,  H01J37/16 ,  H01J37/241 ,  H01J37/248 ,  H01J2237/16

    Abstract: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

    Abstract translation: 根据本发明的产生带电粒子束的仪器具有：带电粒子源; 多个第一电极，其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成，并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个，所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

    High brightness electron gun with moving condenser lens
    40.
    发明授权
    High brightness electron gun with moving condenser lens 有权
    高亮度电子枪与移动聚光透镜

    公开(公告)号：US08921804B2

    公开(公告)日：2014-12-30

    申请号：US13621720

    申请日：2012-09-17

    Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik GmbH

    Inventor： Jürgen Frosien

    IPC: H01J3/20

    CPC classification number: H01J37/067 ,  H01J37/141 ,  H01J2237/06325 ,  H01J2237/1501

    Abstract: A condenser lens arrangement for an electron beam system is described. The condenser lens arrangement includes a magnetic condenser lens adapted for generating a magnetic condenser lens field, the condenser lens having a symmetry axis, and a magnetic deflector adapted for generating a magnetic deflector field. The deflector is configured so that the superposition of the magnetic condenser lens field and the magnetic deflector field results in an optical axis of the condenser lens arrangement being movable relative to the symmetry axis. Further, an electron beam optical system including a condenser lens arrangement and a method for moving a condenser lens are described.

    Abstract translation: 描述了一种用于电子束系统的聚光透镜装置。 聚光透镜装置包括适于产生磁聚焦透镜场的聚光透镜，具有对称轴的聚光透镜，以及适于产生磁偏转器场的磁偏转器。 偏转器被配置为使得磁聚光透镜场和磁偏转器场的叠加导致聚光透镜装置的光轴相对于对称轴线是可移动的。 此外，描述了包括聚光透镜布置的电子束光学系统和用于移动聚光透镜的方法。

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