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    High-speed multiframe dynamic transmission electron microscope image acquisition system with arbitrary timing
    42.
    发明授权
    High-speed multiframe dynamic transmission electron microscope image acquisition system with arbitrary timing 有权
    高速多帧动态透射电子显微镜图像采集系统随意定时

    公开(公告)号：US09165743B2

    公开(公告)日：2015-10-20

    申请号：US14181321

    申请日：2014-02-14

    Applicant: Lawrence Livermore National Security, LLC

    Inventor： Bryan W. Reed ,  William J. DeHope ,  Glenn Huete ,  Thomas B. LaGrange ,  Richard M. Shuttlesworth

    IPC: H01J37/075 ,  H01J37/26 ,  H01J37/147

    CPC classification number: H01J37/075 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/15 ,  H01J2237/151 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2449 ,  H01J2237/24495

    Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses of a predefined pulse duration and waveform, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has two pairs of plates arranged perpendicular to one another. A control system controls the laser and a plurality of switching components synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to be provided with an independently set duration and independently set inter-pulse spacings.

    Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生预定的脉冲持续时间和波形的时间激光脉冲串，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有彼此垂直布置的两对板。 控制系统控制激光器和与激光器同步的多个切换部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，并且被提供有独立设置的持续时间并且独立设置脉冲间隔。

    INSPECTION APPARATUS
    43.
    发明申请
    INSPECTION APPARATUS 有权
    检查装置

    公开(公告)号：US20140319345A1

    公开(公告)日：2014-10-30

    申请号：US14258607

    申请日：2014-04-22

    Applicant: EBARA CORPORATION

    Inventor： Masahiro HATAKEYAMA ,  Yasushi TOMA ,  Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO

    IPC: H01J37/28

    CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

    Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

    Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。

    ELECTRON BEAM DEVICE AND ELECTRON BEAM APPLICATION DEVICE USING THE SAME
    45.
    发明申请
    ELECTRON BEAM DEVICE AND ELECTRON BEAM APPLICATION DEVICE USING THE SAME 有权
    电子束装置和使用其的电子束应用装置

    公开(公告)号：US20110240855A1

    公开(公告)日：2011-10-06

    申请号：US13133947

    申请日：2009-12-04

    Applicant: Takashi Ohshima ,  Satoshi Tomimatsu

    Inventor： Takashi Ohshima ,  Satoshi Tomimatsu

    IPC: H01J9/02 ,  H01J19/02 ,  H01J37/073

    CPC classification number: H01J37/28 ,  H01J37/065 ,  H01J37/075 ,  H01J37/256 ,  H01J2237/06316

    Abstract: To obtain a SEM capable of both providing high resolution at low acceleration voltage and allowing high-speed elemental distribution measurement, a SE electron source including Zr—O as a diffusion source is shaped so that the radius r of curvature of the tip is more than 0.5 μm and less than 1 μm, and the cone angle α of a conical portion at a portion in the vicinity of the tip at a distance of 3r to 8r from the tip, is more than 5° and less than (8/r)°. Another SE electron source uses Ba—O and includes a barium diffusion supply means composed of a sintered metal and a barium diffusion source containing barium oxide.

    Abstract translation: 为了获得能够在低加速电压下提供高分辨率并允许高速元素分布测量的SEM，包括Zr-O作为扩散源的SE电子源被成形为使得尖端的曲率半径r大于 0.5μm以上且小于1μm，顶端附近的3r〜8r的尖部附近的圆锥部的锥角α大于5°且小于（8 / r） °。 另一个SE电子源使用Ba-O，并且包括由烧结金属和含有氧化钡的钡扩散源组成的钡扩散供给装置。

    Electron beam patterning with a heated electron source
    46.
    发明授权
    Electron beam patterning with a heated electron source 失效
    用加热的电子源进行电子束图案化

    公开(公告)号：US06828996B2

    公开(公告)日：2004-12-07

    申请号：US09888256

    申请日：2001-06-22

    Applicant: Glen E. Howard ,  William J. DeVore

    Inventor： Glen E. Howard ,  William J. DeVore

    IPC: B41J2435

    CPC classification number: H01J37/075 ,  H01J2237/3175

    Abstract: An electron source has an anode and a cathode that is capable of being negatively biased relative to the anode, the cathode having an electron emitting portion and a cathode axis. An electromagnetic radiation source is adapted to generate an electromagnetic radiation beam to heat the cathode. A lens is adapted to direct the electromagnetic radiation beam onto the cathode, the lens having a lens axis that forms an acute angle with, or is substantially parallel to, the cathode axis of the electron emitting portion.

    Abstract translation: 电子源具有能够相对于阳极被负偏置的阳极和阴极，阴极具有电子发射部分和阴极轴线。 电磁辐射源适于产生电磁辐射束以加热阴极。 透镜适于将电磁辐射束引导到阴极上，透镜具有与电子发射部分的阴极轴形成锐角或基本平行的透镜轴。

    Electron beam source, electron optical apparatus using such beam source and method of operating an electron beam source
    47.
    发明申请
    Electron beam source, electron optical apparatus using such beam source and method of operating an electron beam source 有权
    电子束源，使用这种光束源的电子光学装置和操作电子束源的方法

    公开(公告)号：US20040124365A1

    公开(公告)日：2004-07-01

    申请号：US10670556

    申请日：2003-09-26

    Applicant: LEO Elektronenmikroskopie GmbH

    Inventor： Michael Steigerwald

    IPC: H01J027/00

    CPC classification number: H01J37/075 ,  H01J37/073 ,  H01J37/243 ,  H01J2237/06316 ,  H01J2237/065

    Abstract: An electron beam source comprises a source surface illuminated with a photon beam of adjustable intensity. The photon beam assists emission of electrons from the source surface due to a photo effect. An electric extraction field further assists in electron emission. Further, a heater is provided for further assisting in electron emission by a thermionic effect. An electron beam current is measured, and the intensity of the photon beam is adjusted based on the measured electron beam current.

    Abstract translation: 电子束源包括用可调强度的光子束照射的源表面。 由于光照效应，光子束有助于来自源表面的电子的发射。 电提取场进一步有助于电子发射。 此外，提供加热器以进一步辅助电子发射通过热离子效应。 测量电子束电流，并且基于测量的电子束电流来调整光子束的强度。

    Electron gun and electron beam exposure device
    48.
    发明授权
    Electron gun and electron beam exposure device 失效
    电子枪和电子束曝光装置

    公开(公告)号：US06707240B1

    公开(公告)日：2004-03-16

    申请号：US09890959

    申请日：2001-09-28

    Applicant: Mamoru Nakasuji ,  Kazuya Okamoto

    Inventor： Mamoru Nakasuji ,  Kazuya Okamoto

    IPC: H01J115

    CPC classification number: H01J3/024 ,  H01J37/075 ,  H01J2237/3175

    Abstract: An electron gun includes a plate-like main cathode 77 having an electron emitting surface 79 and a sub-cathode 81 provided toward the rear surface of the main cathode to heat the main cathode 77 by imparting an electron bombardment. The sub-cathode 81 is constituted of filaments 83 and 85 coiled in a double helix structure and the diameter of the sub-cathode 81 is larger than the diameter of the main cathode 77. As a result, the temperature at the peripheral area of the electron emitting surface 79 can be set higher than the temperature at the center, to achieve an electron beam with a uniform intensity distribution.

    Abstract translation: 电子枪包括具有电子发射表面79的板状主阴极77和朝向主阴极的后表面设置的副阴极81，以通过施加电子轰击来加热主阴极77。 副阴极81由以双螺旋结构卷绕的细丝83和85构成，并且副阴极81的直径大于主阴极77的直径。因此， 电子发射表面79可以被设置为高于中心处的温度，以实现具有均匀强度分布的电子束。

    Metal wire cathode for electron beam apparatus
    49.
    发明授权
    Metal wire cathode for electron beam apparatus 失效
    金属线阴极电子束装置

    公开(公告)号：US4419561A

    公开(公告)日：1983-12-06

    申请号：US217885

    申请日：1981-12-18

    Applicant: Heico J. Frima ,  Jan B. Le Poole

    Inventor： Heico J. Frima ,  Jan B. Le Poole

    IPC: H01J3/02 ,  H01J37/06 ,  H01J37/075 ,  H01L21/027 ,  B23K15/00

    CPC classification number: H01J37/075

    Abstract: An electron beam source including a longitudinally-displaceable cathode wire having one side disposed nearby an apertured anode for emitting electrons through the aperture during heating of the wire by an energy beam. The emitting side is flattened to limit divergence of the emitted electrons.

    Abstract translation: PCT No.PCT / NL80 / 00030 Sec。 371日期1981年5月19日 102（e）1980年12月18日PCT PCT申请日1980年9月18日PCT公布。 公开号WO81 / 00929 日期：1981年4月2日。一种电子束源，包括纵向可位移的阴极线，其一侧设置在孔径阳极附近，用于通过能量束加热线期间通过孔径发射电子。 发射侧被平坦化以限制所发射的电子的发散。

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